Integrating method of working temperature controllable multi-chip component
A technology of multi-chip components and integration methods, applied in electrical components, electric solid-state devices, semiconductor devices, etc., can solve the problems of restricting the wide use of multi-chip components, heat dissipation design, difficult heat dissipation environment for heat dissipation methods, and high requirements for the use environment. , to achieve good temperature stability and regulation, good temperature protection function, and the effect of improving long-term reliability
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Embodiment 1
[0017] Embodiment 1: the original integrated process such as Figure 4 As shown, the process is briefly described as follows:
[0018] ⑴ Casting: By changing the material type and ratio, the substrate with expected design requirements (such as thermal conductivity, dielectric constant, loss factor, insulation resistance, breakdown voltage, etc.) can be obtained. According to the design requirements, the proportioning of the slurry is completed, and the slurry is cast on the tape casting machine along the substrate film into a thin sheet; at this time, it becomes a raw porcelain material, which is rolled into a roll after pre-drying, and is ready for use;
[0019] ⑵Cutting pieces: The rolled green ceramic sheets after casting are inspected on the surface and cut into ceramic blocks of specified size, that is, blocks;
[0020] (3) Punching: In order to make the interconnection structure of each layer of LTCC, it is necessary to punch through holes or positioning holes of variou...
Embodiment 2
[0035] Example 2 Process flow of the present invention such as Figure 5 Shown; The present invention, on the basis of original flow process, increases thick-film thermistor slurry screen printing and sintering, LTCC substrate back side thick-film conductor slurry screen printing and curing, the preparation and processing of TEC substrate ceramic substrate The printing and sintering of thick film conduction tape, the preparation of N-type and P-type semiconductor grains required by TEC, the integration of PTCC and TEC, etc. The overall process flow is briefly described as follows:
[0036] (1) Casting: By changing the material type and ratio, the substrate with design requirements (such as thermal conductivity, dielectric constant, loss factor, insulation resistance, breakdown voltage, etc.) can be obtained. According to the design requirements, the proportioning of the slurry is completed, and the slurry is cast on the tape casting machine along the substrate film into a th...
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