Preparation method of copper indium gallium diselenide thin film solar cell absorbing layer
A technology of thin-film solar cells and copper indium gallium selenide, which is applied in coatings, circuits, electrical components, etc., can solve the problems of low film performance of the absorbing layer, difficult control of the film composition of the absorbing layer, and low performance of thin-film solar cells. The effect of controllability, performance improvement and process simplification
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[0016] Put the substrate with the bottom electrode into the vacuum sputtering equipment, when the equipment is evacuated to 1Pa and the temperature reaches 350 °C, Ar gas is introduced to deposit Cu(In,Ga)Se 2 Compound target at 2W / cm 2 RF magnetron sputtering was performed on the bottom electrode under the target power density, and Cu(In,Ga)Se with a thickness of 1.5 microns was obtained on the bottom electrode. 2 layer; then a bottom electrode Mo and Cu(In,Ga)Se will be deposited 2 The substrate of the first layer is placed in a vacuum annealing furnace, and the temperature is raised at a rate of 30°C / min. The substrate temperature reaches 400°C, and the temperature is maintained for 15 minutes. Ga)Se 2 The thin film is the absorbing layer of the copper indium gallium selenium thin film solar cell prepared in the present invention.
[0017] Process principle of the present invention:
[0018] What the present invention adopts is to form the CuIn of chalcopyrite phase 1-...
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