Efficient and energy saving laminated thin-film solar cell and manufacturing method
A solar cell, high-efficiency and energy-saving technology, applied in the direction of final product manufacturing, sustainable manufacturing/processing, circuits, etc., can solve problems such as battery failure, and achieve the effect of simple manufacturing process, reduced production cost, and easy mass production
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[0051] example 1, figure 2 with diagram 2-1 Is a diagram of embodiment 1 of the present invention
[0052] Ultra-white glass is used as the substrate, the copper indium gallium selenium bottom cell is prepared by a multi-element co-evaporation three-step method, the cadmium telluride intermediate cell is prepared by magnetron sputtering, and the amorphous silicon top cell is prepared by plasma enhanced chemical vapor deposition technology. , Among them, the first intermediate layer uses a BZO transparent conductive film, and the second intermediate layer uses a low-conductivity silicon oxide transparent film.
[0053] Made as follows:
[0054] Ultra-white glass is used as the deposition substrate 1 of the three-layer thin-film battery of the present invention. After ultrasonic cleaning and automatic optical detection of defects, a DC magnetron sputtering method is adopted on one side of it, and the argon pressure is adjusted in turn at high pressure. Deposit a layer of high-resist...
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[0078] Example 2
[0079] Ultra-white glass is used as the substrate 1, the bottom battery 6 is prepared by the two-step method of multi-element co-evaporation, the middle battery 10, the cadmium telluride battery is prepared by magnetron sputtering, and the amorphous silicon top battery is prepared by plasma enhanced chemistry It is prepared by vapor deposition technology, wherein the first intermediate layer adopts a low-conductivity silicon oxide transparent film, and the second intermediate layer adopts an AZO transparent conductive film.
[0080] After the deposition substrate 1, after ultrasonic cleaning and automatic optical detection of defects, a DC magnetron sputtering method is used on one side of the substrate 1, and a layer of high-resistance molybdenum (Mo) layer is sequentially deposited under high pressure by adjusting the argon pressure. Deposit a low-resistance molybdenum (Mo) layer under low pressure with a total thickness of 1.5 μm to form the back contact layer...
Example
[0101] Example 3
[0102] Stainless steel is used as a flexible substrate, copper indium gallium selenium bottom battery 6, prepared by electrodeposition, cadmium telluride intermediate battery 10, prepared by magnetron sputtering method, amorphous silicon top battery 19 is prepared by plasma enhanced chemical vapor deposition method In preparation, the first intermediate layer 7 adopts an AZO transparent conductive film, and the second intermediate layer 11 adopts a low-conductivity transparent silicon oxide film.
[0103] The substrate 1 of the three-stack thin film battery of the present invention is made of stainless steel, ultrasonically cleaned, and a DC magnetron sputtering method is used on one side. By adjusting the argon pressure, a layer of high-resistance molybdenum (Mo ) Layer, and then deposit a low-resistance molybdenum (Mo) layer under low pressure with a total thickness of 2 μm to form the bottom battery back contact layer 2;
[0104] The bottom cell is on the back ...
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