Preparation of three-dimensional dendritic titania arrays with fast electron transport properties
A three-dimensional dendritic, transmission performance technology, applied in the direction of titanium dioxide, titanium oxide/hydroxide, circuits, etc., can solve the problems of difficult crystal growth, reduce the electron transmission rate, etc., to improve short-circuit current, high electron transmission performance, improve The effect of specific surface area
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[0035] In a more typical embodiment of the present invention, the three-dimensional dendritic TiO with fast electron transport properties 2 The preparation method of the array may include the following steps:
[0036] (1) Deposit TiO on the cleaned transparent conductive glass by dipping and pulling method 2 For the seed layer, the sol used is a tetrabutyl titanate ethanol solution with a concentration of 0.4M, and then sintered in an air atmosphere.
[0037] Preferably, the transparent conductive glass used is fluorine-doped tin oxide (FTO) glass, the pulling rate is 100 mm / s, and the sintering temperature is 550 o C, the sintering time is 30min.
[0038] (2) Preparation of one-dimensional TiO by solvothermal method 2 array, put the cleaned transparent conductive glass deposited with the seed layer obtained in step (1) into a high-pressure reactor, and then add a certain proportion of Ti-containing reactants, hydrochloric acid and ketone solvents, and keep it at a certain te...
Embodiment 1
[0048] TiO will be deposited 2 The FTO glass of the seed layer was put into an autoclave, and 6mL of hydrochloric acid (37wt%), 6mL of 2-butanone and 0.4mL of tetrabutyl titanate were added, at 200 o C for 60 minutes, after cooling, the sample was taken out, rinsed with ethanol, soaked in a mixed solution of hydrogen peroxide and ammonia water at a volume ratio of 10:1 for 10 minutes, taken out and rinsed with deionized water. Put the processed sample into the reaction vessel, add 0.1mL of titanium trichloride hydrochloric acid solution (20wt% titanium trichloride dissolved in 2M hydrochloric acid), 0.2mL of hydrochloric acid (37wt%) and 10mL of deionized water, at 80 o C for 90 minutes, after cooling, the samples were taken out, rinsed with deionized water, and then processed in an oxygen plasma cleaning machine with an oxygen flow rate of 0.6 L / min, using a power of 50 W, and the processing time was 10 minutes. Finally, the sample was placed in an oxygen atmosphere with an ...
Embodiment 2
[0051] TiO will be deposited 2 The FTO glass of the seed layer was placed in an autoclave, and 6mL of hydrochloric acid (37wt%), 6mL of amyl ketone, and 0.6mL of tetrabutyl titanate were added, at 200 o C for 50 minutes, after cooling, the sample was taken out, rinsed with ethanol, soaked in a mixed solution of hydrogen peroxide and ammonia water at a volume ratio of 10:1 for 10 minutes, taken out and rinsed with deionized water. Put the processed sample into the reaction vessel, add 0.05mL of titanium trichloride hydrochloric acid solution (20wt% titanium trichloride dissolved in 2M hydrochloric acid), 0.1mL of hydrochloric acid (37wt%), 10mL of deionized water, o C heat preservation for 120min, after cooling, the samples were taken out, rinsed with deionized water, and then processed in an oxygen plasma cleaner with an oxygen flow rate of 1L / min, using a power of 50W, and the processing time was 10min. Finally, the sample was placed in an oxygen atmosphere with an oxygen fl...
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