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A novel electroless nickel plating method with strong selectivity for ito/fto/azo conductive glass

A conductive glass and electroless nickel plating technology, which is applied in the field of new electroless nickel plating method, can solve the problems of complex process procedures, slow production speed and high production cost, and achieve the effects of excellent gloss, fast process speed and easy operation

Inactive Publication Date: 2016-04-27
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Cause this method process procedure to be complicated, equipment investment is high, production speed is slow and production cost is high

Method used

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  • A novel electroless nickel plating method with strong selectivity for ito/fto/azo conductive glass
  • A novel electroless nickel plating method with strong selectivity for ito/fto/azo conductive glass
  • A novel electroless nickel plating method with strong selectivity for ito/fto/azo conductive glass

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Experimental program
Comparison scheme
Effect test

Embodiment 1I

[0026] Embodiment 1 ITO electroless nickel plating on conductive glass

[0027] Steps: degreasing—etching—catalysis—activation—reduction—electroless plating.

[0028] (1) Degreasing: Put the single-sided ITO conductive glass into ethanol solution to clean for 3 minutes, then put it into 20°C alkaline degreasing liquid for ultrasonic degreasing for 4 minutes, and then clean it with tap water. The formula of degreasing liquid is 15g / L sodium hydroxide, 20g / L sodium phosphate, 20g / L sodium carbonate, 1g / L sodium dodecylbenzenesulfonate;

[0029] (2) Etching: put the degreased single-sided ITO conductive glass into the etching solution at 20°C for 4 minutes, and then wash it with deionized water. The etching solution formula is 50g / L sodium persulfate, 40g / L sodium sulfate, 1mL / L concentrated sulfuric acid, 4g / L ammonium bifluoride, 15g / L citric acid;

[0030] (3) Soak the etched single-sided ITO conductive glass in a catalytic solution at 20°C for 4 minutes. The formula of th...

Embodiment 2I

[0035] Embodiment 2 ITO electroless nickel plating on conductive glass

[0036] Steps: degreasing—etching—catalysis—activation—reduction—electroless plating.

[0037] (1) Degreasing: Put the single-sided ITO conductive glass into ethanol solution to clean for 4 minutes, then put it into 25°C alkaline degreasing solution for 6 minutes, and then wash it with tap water. The formula of degreasing solution is 15g / L Sodium hydroxide, 20g / L sodium phosphate, 20g / L sodium carbonate, 1g / L sodium dodecylbenzenesulfonate;

[0038] (2) Etching: Put the degreased single-sided ITO conductive glass into the etching solution at 25°C for 4 minutes, and then wash it with deionized water. The etching solution formula is 50g / L sodium persulfate, 40g / L sodium sulfate, 1mL / L concentrated sulfuric acid, 4g / L ammonium bifluoride, 15g / L citric acid;

[0039] (3) Soak the etched single-sided ITO conductive glass in a catalytic solution at 25°C for 4 minutes. The catalytic solution formula is 4g / L acet...

Embodiment 2

[0043] The cross-sectional SEM figure of the sample obtained in embodiment 2 is shown in figure 1 , surface SEM image see image 3 .

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Abstract

The invention provides a novel high-selectivity chemical nickel plating method for ITO / FTO / AZO conductive glass, which specifically comprises the steps of oil removal, etching, catalysis, activation, reduction and chemical nickel plating. The innovation of the invention lies in the pre-plating treatment liquid, the treatment order and the chemical nickel plating liquid, wherein the pre-plating treatment liquid comprises catalysis liquid and activation liquid. The method provided by the invention is applied to the metallization of conductive glass on various display screens and touch screens as well as the metallization of edge conductive glass, and metal deposition is completely avoided on common glass and conductive glass protection films. With good gloss, binding force and electrical conductivity, a nickel-plated layer is suitable for the metallization of various ITO / FTO / AZO products. The novel chemical nickel plating method provided by the invention has great selectivity and deposits metal nickel only on the target matrix ITO / FTO / AZO, and the coverage rate can reach 100%; compared with the existing magnetron sputtering method, the production cost is low, the speed is high, and the equipment investment is small; moreover, solutions prepared in all steps have good stability and can be used for a long time.

Description

technical field [0001] The invention belongs to the technical field of coating, and in particular relates to a novel electroless nickel plating method with strong selectivity for ITO / FTO / AZO conductive glass. Background technique [0002] Transparent conductive film glass refers to a component formed by uniformly coating a layer of transparent conductive oxide film on the surface of ordinary flat glass by physical or chemical coating methods. Its types are divided into indium tin oxide transparent conductive film glass (ITO), F-doped tin oxide (FTO), Al-doped zinc oxide transparent conductive film glass (AZO), due to its excellent photoelectric properties, ITO / FTO / AZO It is widely used in surface heating elements, heat reflective films, terminal equipment, automotive glass, solar cells, thin film resistors, gas sensors, electrode materials in display devices, anti-static, and anti-electromagnetic shielding layers. [0003] Regardless of the field of application, if local or...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C18/36C23C18/28C23C18/30C23C18/18
Inventor 梅天庆任春春项腾飞
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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