Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Wide ultraviolet light absorption Fega hollow sphere nano-array material and preparation method thereof

A nano-array and hollow sphere technology is applied in the preparation of FeGa hollow sphere nano-array materials, and the field of FeGa hollow sphere nano-array materials can solve problems such as limiting the application range of metal photonic crystals, and achieve high mechanical strength, good ductility, and application wide effect

Inactive Publication Date: 2016-03-02
李志刚 +1
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, traditional metal photonic crystal materials often cannot be adjusted after the structure is formed, which limits the application range of metal photonic crystals.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Wide ultraviolet light absorption Fega hollow sphere nano-array material and preparation method thereof
  • Wide ultraviolet light absorption Fega hollow sphere nano-array material and preparation method thereof
  • Wide ultraviolet light absorption Fega hollow sphere nano-array material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0044] The preparation method of the FeGa hollow sphere nano-array material capable of regulating and controlling the broad ultraviolet light absorption performance by a magnetic field of the present invention comprises the following steps:

[0045] The first step is to clean the substrate;

[0046] The cleaning steps of the glass substrate are as follows:

[0047] Step 1. Ultrasonic cleaning of the substrate in acetone for 40 minutes, and then cleaning with distilled water several times;

[0048] Step 2. Ultrasonic cleaning of the substrate in ethanol for 40 minutes, and then cleaning with distilled water several times;

[0049] Step 3: Put the substrate in distilled water and ultrasonically clean it for 30 minutes;

[0050] Step 4. Place the substrate in a mixture of concentrated sulfuric acid and hydrogen peroxide (concentrated sulfuric acid and H 2 o 2 The volume ratio is 3:1) for 8 hours, then ultrasonic cleaning for 60 minutes, and then repeated cleaning with distill...

Embodiment 1

[0072] Synthesis of FeGa hollow sphere array membrane with a diameter of 1 micron:

[0073] 1. Take 10 microliters of polystyrene colloidal spheres with a diameter of 1 micron and mix them with 10 microliters of absolute ethanol solution. Synthesize the colloidal crystal template by using the air-liquid interface synthesis method in a petri dish, and scoop it up with a silicon chip. Absorb excess water with filter paper;

[0074] 2. Put the colloidal crystal template in the vacuum chamber for sputter coating, and vacuum to 10 -5 Pa, into high-purity argon to maintain 6 mtorr, sputtering power 70 watts, pre-sputtering 1000 seconds, sputtering 5000 seconds;

[0075] 3. Take the sample out and immerse it in dichloromethane for 1 minute, and then immerse it in acetone for 1 minute to obtain a shape as follows: figure 1 As shown, the UV light absorption properties are as image 3 shown.

Embodiment 2

[0077] Synthesis of FeGa hollow sphere array membrane with a diameter of 500nm:

[0078] 1. Mix 10 microliters of polystyrene colloidal spheres with a diameter of 500nm and absolute ethanol at a ratio of 1:1, synthesize a colloidal crystal template in a petri dish by gas-liquid interface synthesis, and scoop it up with a silicon wafer;

[0079] 2. Put the colloidal crystal template in the vacuum chamber for sputter coating, and vacuum to 10 -5 Pa, into the argon gas to maintain 6 mtorr, sputtering power 70 watts, pre-sputtering 1000 seconds, sputtering 1500 seconds;

[0080] 3. Take the sample out and immerse it in dichloromethane for 1 minute, and then immerse it in acetone for 1 minute to obtain a shape as follows: figure 2 As shown, the UV light absorption properties are as Figure 4 shown.

[0081] The prepared sample has strong ultraviolet absorption in the ultraviolet, especially in the range of 200-400 nanometers. In addition, the UV absorption coefficient can be a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
thicknessaaaaaaaaaa
compressive strengthaaaaaaaaaa
Login to View More

Abstract

The invention discloses a wide ultraviolet light absorption FeGa hollow sphere nano array material which comprises a substrate and a FeGa hollow sphere array film. The FeGa hollow sphere array film covers the substrate. The FeGa hollow sphere array film is a honeycomb-shaped array formed by a plurality of FeGa hollow sphere mono-layers in close arrangement. The diameter of a FeGa hollow sphere ranges from 500 nm to 1000 nm and the wall thickness of the FeGa hollow sphere ranges from 20 nm to 120 nm. Metal photonic crystals are made of the FeGa material, the optimal performance of the material can be further controlled through an applied magnetic field and the morphological structure of the material can be controlled through the good hysteresis flexibility of FeGa. The invention further discloses a method for preparing the wide ultraviolet light absorption FeGa hollow sphere nano array material.

Description

technical field [0001] The invention relates to a nanometer material, in particular to a FeGa hollow sphere nanometer array material capable of regulating and controlling the broad ultraviolet light absorption performance by a magnetic field. The invention also relates to a preparation method of the FeGa hollow sphere nano-array material whose broad ultraviolet light absorption performance can be regulated by a magnetic field. Background technique [0002] A photonic crystal is an artificial crystal composed of one medium periodically arranged in another medium. The periodic change of the refractive index forms an optical energy band, which prevents photons of a certain energy falling into it from propagating, forming a photonic band gap, and spontaneously radiating suppressed. By designing the photonic crystal structure, the light whose frequency is in the forbidden band is localized in the periodic structure, so as to realize the control of light. [0003] Metal photonic...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B22F1/00C23C14/35C23C14/14B82Y20/00B82Y40/00
Inventor 李志刚冯尚申邵先亦陈卫平李艳萍王天乐
Owner 李志刚
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products