Epitaxial growth method with p-layer special doped structure

An epitaxial growth, special technology, applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problem of difficult to generate high carrier concentration, growth conditions, reduce material quality and other problems, to reduce the self-compensation effect , Improve crystal quality, improve the effect of doping effect

Inactive Publication Date: 2014-06-11
西安利科光电科技有限公司
View PDF4 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, the p-layer of LED is doped with magnesium element in GaN, and the magnesium acceptor is activated by annealing. However, due to the high activation energy and low ionization rate of magnesium, it is difficult to generate high carrier concentration, and it is affected by growth conditions. Large, the doping process is prone to defects and reduces the quality of the material

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Epitaxial growth method with p-layer special doped structure
  • Epitaxial growth method with p-layer special doped structure
  • Epitaxial growth method with p-layer special doped structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0044] The present invention will be further elaborated below in conjunction with the accompanying drawings.

[0045] The present invention applies metal organic compound chemical vapor deposition (MOCVD) epitaxial growth technology, utilizes existing MOCVD technology equipment, uses trimethylgallium (TMGa), triethylgallium (TEGa), and trimethylindium (TMIn), Trimethylaluminum (TMAl) and ammonia (NH3) silane (SiH4) and dimagnesium (cp2Mg) respectively provide gallium source, indium source, aluminum source, and nitrogen source, magnesium source, silicon source required for growth, using NH3 pulsed delta doping is used to prepare p-layer superlattice structure with double element doping, which further combines the advantages of delta doping and double doping.

[0046] A specific example of the epitaxial growth method is as follows:

[0047] 1. After the sapphire substrate is specially cleaned, put it into the MOCVD equipment and bake it at 1100°C for 10 minutes.

[0048] 2. Lo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an epitaxial growth method with a p-layer special doped structure. According to the method, when a p-type layer of an LED (Light Emitting Diode) is grown, double-element doping of a GaN/AlGaN superlattice structure is adopted, that is, a small amount of silane is doped when doping magnesium. The silane is doped as a donor, however, due to the small amount of the doped silane, the lattice imperfection caused by the doped magnesium can be remarkably improved, a self-compensation effect is reduced, the crystal quality is improved, non-composite imperfection centers are reduced, a small number of scattering centers are caused, the carrier mobility and the ionization efficiency of an accepter are improved, and in addition, as the growing temperature of AlGaN is high, such doping is beneficial for improving the doping concentration of magnesium, the doping effect of the p-layer is improved, and the overall lighting efficiency of the LED is greatly improved. Due to improvement of the crystal quality and the improvement of barrier layer conductivity, the current expansion capability is improved, and the reliability of the LED device is also improved.

Description

technical field [0001] The invention belongs to the technical field of photoelectric device material preparation and structure design, and in particular relates to an LED epitaxial doping growth method and an epitaxial sheet structure thereof. Background technique [0002] Group III nitride semiconductor materials are playing an increasingly widespread role due to their excellent characteristics. They have the characteristics of large band gap, high electron drift saturation velocity, small dielectric constant, and good thermal conductivity. They are very suitable for making radiation-resistant materials. , high-frequency, high-power and high-density integrated electronic devices; using its unique band gap, it can also produce blue, green and ultraviolet light-emitting devices and photodetection devices. After nearly ten years of development, GaN-based blue LEDs have been successfully commercialized and widely used in the fields of landscape lights, backlights, and lighting....

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/20
CPCH01L33/0075
Inventor 王晓波
Owner 西安利科光电科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products