Circuit board and method of making the same
A technology for circuit boards and aluminum substrates, applied in the field of circuit boards and their preparation, can solve problems such as poor heat dissipation of aluminum-based circuit boards, and achieve the effects of easy large-scale implementation, good heat dissipation, and high adhesion
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Embodiment 1
[0066] (1) Pretreatment
[0067] After the aluminum substrate is cleaned, soak for 10 minutes in a degreasing solution with a temperature in the range of 50-60° C., and then put the degreased aluminum substrate in the polishing solution for 15 minutes of polishing. Among them, the composition of the solution used during degreasing is: NaOH 10g / L, NaOH 3 PO 4 30g / L, Na 2 CO 3 15g / L, sodium dodecylsulfonate 6g / L, with water as solvent. The composition of the polishing liquid used for polishing is: H 2 SO 4 20% by weight, HNO 3 10% by weight, H 3 PO 4 70% by weight, using water as a solvent.
[0068] (2) Anodizing
[0069]Use the aluminum substrate obtained in step (1) as the anode and immerse it in the electrolyte solution at a temperature of 40°C, and at the same time use stainless steel as the cathode, connect the cathode and anode to the positive and negative electrodes of the power supply respectively, and then apply a voltage of 18V to carry out electrolysis ...
Embodiment 2
[0091] The circuit board was prepared by the same method as in Example 1, the difference was that step (3) was carried out by the following method:
[0092] Soak the aluminum substrate obtained in step (2) in lanthanum chloride aqueous solution at 96° C. for 30 minutes. Wherein, in the solution, the concentration of lanthanum chloride is 0.05 mol / L, and the pH value of the solution is in the range of 5-5.5.
[0093] After testing, the content of lanthanum element in the aluminum oxide layer is 0.11% by weight.
[0094] After calculation, the plating speed is 2.0 μm / h. After testing, the adhesion of the plating layer formed by the electroless plating is ISO grade 0, the thermal conductivity of the obtained circuit board is 17W / (m·K), and the breakdown voltage is 2.3kV.
Embodiment 3
[0096] Using the same method as in Example 1 to prepare a circuit board, the difference is that step (4) is carried out using the following method:
[0097] Irradiating at least part of the surface of the aluminum oxide layer on the surface of the aluminum substrate obtained in step (3) with a laser to form a circuit pattern. Among them, the conditions of laser irradiation include: using a fiber laser, the laser wavelength is 1064nm, the power is 25W, the frequency is 50kHz, the line speed is 100mm / s, and the filling pitch is 0.05mm.
[0098] After calculation, the plating speed is 2.5 μm / h. After testing, the adhesion of the plating layer formed by electroless plating is ISO grade 0, the thermal conductivity of the obtained circuit board is 16W / (m·K), and the breakdown voltage is 2.3kV.
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