Low stress hard coating and its application
A technology of coating and residual compressive stress, applied in the field of refractory coating
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example 1
[0134] Example 1 - Coated Cutting Tool
[0135] Coating a cutting tool with a refractory layer formed by sublayer groups, each sublayer group consisting of a TiN nanolayer forming a cubic phase and an adjacent M 1-x Al x N nanolayers, where M is titanium and x > 0.6. The refractory layer is deposited by cathodic arc evaporation on a cemented carbide (WC-6wt.% Co) indexable insert substrate [ANSI standard geometry CNGP433], wherein the substrate temperature is 550-600 ° C, bias voltage -20V, nitrogen partial pressure 4.0-4.5Pa and argon partial pressure 0.5-1.0Pa. For the coating deposition, an INNOVA PVD device from OC Oerlikon Balzers AG was used. Using the cathode configuration in Table VIII to alternately sequentially deposit TiN nanolayers forming the cubic phase and Ti 1-x Al x N nanolayers (x≥0.6) to provide the refractory layer.
[0136] Table VIII - Cathode Construction
[0137]
[0138] The properties of the resulting refractory layers are provided in Table ...
example 2
[0142] Example 2 - Coated Cutting Tool
[0143] A coated cutting tool was made according to Example 1 except that the bias voltage was increased to -45V and the cemented carbide substrate geometry was ANSI standard geometry CNGP432. The properties of the resulting refractory layers are provided in Table X. The hexagonal phase content, residual compressive stress, and hardness of the refractory layer were determined according to their respective techniques described in Part I of this document.
[0144] Table X - Refractory Liner Properties
[0145]
[0146] Similar to Example 1, the coated cutting tool of Example 2 exhibited high hardness, low residual compressive stress, and high thickness. Figure 6 is an X-ray diffraction pattern of the refractory coating of Example 2.
example 3
[0147] Example 3 - Coated Cutting Tool
[0148] use a Ti 1-x Al x N(x>0.6) a single complete refractory layer to coat a cutting tool. The Ti 1-x Al x The N refractory layer is deposited by cathodic arc deposition on a cemented carbide (WC-6wt.% Co) indexable insert substrate [ANSI standard geometry SNG433], where the substrate temperature is 550-600 ° C, bias voltage -30V, nitrogen partial pressure 4.0-4.5Pa and argon partial pressure 0.5-1.0Pa. For the deposition of the refractory layer, INNOVA cathodic arc equipment from Oerlikon was used. The cathode composition is Ti 0.33 Al 0.67 And the anode of the device employs an annular extension. For example, the INNOVA cathodic arc equipment operates in an Advanced Plasma Optimizer (APO) configuration in which an annular extension of the anode is incorporated. The properties of the resulting refractory layers are provided in Table XI. The hexagonal phase content, residual compressive stress, and hardness of the refractory...
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