Surface roughness reduction method of light-cured rapid prototype based on atomization technology

A surface roughness and light-curing technology, which is applied in the field of light-curing rapid prototyping, can solve problems such as waste of materials, mold cracking, and increased thermal stress, and achieve the effects of reducing roughness, saving costs, and ensuring dimensional accuracy

Active Publication Date: 2016-06-29
XI AN JIAOTONG UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The resin coating method uses thermosetting resin as the raw material to coat the surface of the light-curing rapid prototype. This method has high requirements on the viscosity and leveling of the resin, and the operation process is complicated. The coating effect is affected by the shape of the prototype and the placement angle. Great impact; at the same time, this method can only deal with the outer surface of simple prototypes. For prototypes with complex inner cavity structures, the coating effect is poor, and resin interception is prone to occur, which greatly reduces the accuracy of prototypes.
For light-cured rapid prototypes used in the field of rapid precision casting, the thermosetting resin coating increases the thermal stress of the mold during pre-firing and degreasing, which can easily cause mold cracking
Surface polishing post-processing methods include grinding method and abrasive flow method, etc. The disadvantages are that machining allowance needs to be reserved during molding, which wastes materials, has high requirements for the processor's technology, and is difficult to process complex inner cavities.

Method used

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  • Surface roughness reduction method of light-cured rapid prototype based on atomization technology
  • Surface roughness reduction method of light-cured rapid prototype based on atomization technology

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] A method for reducing the surface roughness of light-cured rapid prototypes based on atomization technology, comprising the following steps:

[0036] 1) Heating polyethylene wax emulsion

[0037] Select polyethylene wax emulsion as the raw material for flattening, heat the polyethylene wax emulsion in a heating range of 35°C to 40°C, the viscosity of the polyethylene wax emulsion decreases, and the viscosity of the polyethylene wax emulsion after heating is 6.0mPa.s to 9.0mPa.s. The viscosity is around 40mPa.s at room temperature, and the decrease in viscosity is beneficial to the subsequent ultrasonic atomization. If the heating temperature exceeds 40°C, the polyethylene wax emulsion will break and can no longer be used as a flat coating material;

[0038] Wherein, the polyethylene wax emulsion is prepared from polyethylene wax and sodium alkylbenzene sulfonate at a volume ratio of 3:7; the particle diameter of polyethylene wax particles in the polyethylene wax emulsio...

Embodiment 2

[0048] A method for reducing the surface roughness of light-cured rapid prototypes based on atomization technology, comprising the following steps:

[0049] 1) Warm palm wax emulsion

[0050] Select palm wax emulsion as the raw material for flattening, heat the palm wax emulsion at a heating range of 30°C to 40°C, the viscosity of the palm wax emulsion will decrease, after heating, the viscosity of the palm wax emulsion will be 6.0mPa. About 50mPa.s, the decrease in viscosity is conducive to the subsequent atomization. If the heating temperature exceeds 40°C, the palm wax emulsion will break and it can no longer be used as a flat coating material;

[0051] Wherein, the palm wax emulsion is prepared by preparing palm wax and gum arabic according to the volume ratio of 4:6; the particle diameter of the palm wax particles in the palm wax emulsion is 100-200nm.

[0052] 2) Ultra-high pressure atomization of palm wax emulsion

[0053] Adjust the pressure of the ultra-high-pressur...

Embodiment 3

[0060] A method for reducing the surface roughness of light-cured rapid prototypes based on atomization technology, comprising the following steps:

[0061] 1) Heating polytetrafluoroethylene wax and paraffin mixed wax emulsion

[0062] Select polytetrafluoroethylene wax and paraffin wax mixed wax emulsion as coating raw material, heat polytetrafluoroethylene wax and paraffin mixed wax emulsion, heating range 30 ℃ ~ 40 ℃, the viscosity of polytetrafluoroethylene wax and paraffin mixed wax emulsion decreases, After heating, the viscosity of polytetrafluoroethylene wax and paraffin mixed wax emulsion is 6.0mPa.s ~ 9.0mPa.s, and the viscosity is about 45mPa.s at room temperature. Demulsification occurs and can no longer be used as a flattening material;

[0063] Wherein, the volume ratio of polytetrafluoroethylene wax and paraffin wax in polytetrafluoroethylene wax and paraffin wax emulsion is 1:1, polytetrafluoroethylene wax and paraffin wax emulsion are wax (polytetrafluoroeth...

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Abstract

The invention discloses an atomization technology-based light-cured rapid prototyping product surface roughness reducing method. The method adopting a liquid wax emulsion as a raw material comprises the following steps: heating the material, and atomizing to form uniform atomization environment in an atomization box; placing a light-cured rapid prototyping product in the atomization box, and uniformly coating the internal and external cavity surfaces of the light-cured rapid prototyping product with the atomized wax emulsion for a certain time, taking out he light-cured rapid prototyping product, heating the light-cured rapid prototyping product in an oven, and drying to remove water in the emulsion to form an extremely thin coating on the internal and external cavity surfaces of the light-cured rapid prototyping product. The coating can eliminate a step effect generated through a light curing rapid molding technology and reduce the surface roughness of the light-cured rapid prototyping product. The method is simple to operate, is especially suitable for the surface quality improvement of the light-cured rapid prototyping product with a complex internal and external cavity structure, does not affect the dimensional accuracy of the light-cured rapid prototyping product, and has a wide application prospect.

Description

technical field [0001] The invention belongs to the technical field of light-curing rapid prototyping, and relates to a method for processing the surface roughness of a prototype, in particular to a method for reducing the surface roughness of a light-curing rapid prototype based on atomization technology. Background technique [0002] Rapid prototyping technology is an advanced manufacturing method based on the principle of material accumulation. Its appearance provides a new means for the manufacture of complex parts, which can shorten the product design cycle, speed up the development of new products, and reduce manufacturing costs. Among them, the light-curing rapid prototyping technology is the most widely used and the highest precision method in the current rapid prototyping technology. Due to the limitation of technical principles, there is a step effect on the surface of the prototype after molding, which causes the distortion of precision. This technical bottleneck ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B29C67/00
Inventor 鲁中良李涤尘吉喆周江平苗恺董茵
Owner XI AN JIAOTONG UNIV
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