A kind of ultraviolet detector and preparation method thereof
A technology for ultraviolet detectors and preparation steps, applied in the field of ultraviolet detectors, can solve the problems of limited sustainable development and limited geological reserves, and achieve the effects of reducing device costs, high yield, and easy corrosion
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0034] The preparation method of the ultraviolet detector of the present invention, the steps include such as image 3 Shown are a substrate preparation step ( S10 ), a photoactive layer forming step ( S20 ), and a metal electrode forming step ( S31 ) and a metal electrode etching step ( S32 ) for forming a metal electrode.
[0035] First, carry out the substrate preparation step (S10), select the substrate, and select the substrate according to the preparation of the subsequent photoactive layer, etc., which can be single crystal silicon wafer, sapphire, quartz, glass, polycarbonate or phthalate Esters etc.
[0036] Next, the preparation of the photoactive layer of the ultraviolet detector is carried out on the substrate, that is, the step of forming the photoactive layer (S20). In the present invention, the photoactive layer is the amorphous oxide thin film Zn 4 al x sn 7 o 1.5x+18 The common production methods include magnetron sputtering method, chemical vapor depositi...
example 1
[0038] Example 1: Preparation of Zn 4 al x sn 7 o 1.5x+18 (x=0) Amorphous oxide film as a UV detector for the photoactive layer.
[0039] I) Preparation of the quartz substrate.
[0040] II) The photoactive layer is the amorphous oxide thin film Zn 4 al x sn 7 o 1.5x+18 Formation of (x=0):
[0041] 1) The weighed Zn(NO 3 ) 2 ·6H 2 O and SnCl 2 +NH 4 NO 3 Dissolve in dimethoxyethanol + acetylacetone + 14.5 M ammonia solution to form a precursor solution with a concentration of 0.2 M. When the Zn source is configured, the volume of dimethoxyethanol, acetylacetone and 14.5 M ammonia water The ratio is 25:1:0.57, and the volume ratio of the three when configuring the Sn source is 25:1:0.285; then stir at 30°C for 24 h, filter and mix evenly according to the ratio of Zn:Sn=4:7, and age for 24 h;
[0042] 2) The solution obtained after aging in step 1) was spin-coated on a quartz substrate to form a film. The spin-coating conditions were: the rotation speed was 220...
example 2
[0047] Example 2: Preparation of Zn 4 al x sn 7 o 1.5x+18 (x=0.5) Amorphous oxide film as a UV detector for the photoactive layer.
[0048] I) Preparation of the quartz substrate.
[0049] II) The photoactive layer is the amorphous oxide thin film Zn 4 al x sn 7 o 1.5x+18 (x=0.5) is formed:
[0050] 1) The weighed Zn(NO 3 ) 2 ·6H 2 O, Al(NO 3 ) 3 9H 2 O and SnCl 2 +NH 4 NO 3Dissolve in dimethoxyethanol + acetylacetone + 14.5 M ammonia solution to form a precursor solution with a concentration of 0.2 M, in which dimethoxyethanol, acetylacetone and 14.5M ammonia water are configured when Zn source and Al source are configured The volume ratio of the three is 25:1:0.57, and the volume ratio of the three is 25:1:0.285 when the Sn source is configured; then stir at 30°C for 12 h, and filter according to Zn:Al:Sn=4:0.5:7 Mix evenly and age for 18 hours;
[0051] 2) The solution obtained after aging in step 1) was spin-coated on a quartz substrate to form a film....
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


