Isothermal extrusion production method of refractory metal rotating target material

Abstract

The invention relates to an isothermal extrusion production method of a refractory metal rotating target material. During the preparation of the refractory metal rotating target material by adopting an isothermal extrusion process, a target material tube target blank needs to be pressed firstly by adopting CIP (Cold Isostatic Pressing), then a refractory metal or refractory metal alloy target blank with density of 60-80 percent is obtained through sintering, then the pre-sintered target tube blank is contained in an isothermal extrusion die, the high-density low-oxygen-content refractory metal rotating target material is obtained by adopting a relatively simpler isothermal extrusion production flow, the method is not limited by materials, the geometric size, surface quality, internal organization, physical property and the like of the entire target material can be enabled to be optimal, the production efficiency is greatly improved, the production cost is reduced, and the method is particularly suitable for producing refractory metal alloy rotating target materials which are difficult to produce by adopting other processes. The casting uniformity is high and the crystal gains are fine and tiny; the compactness is high and the density reaches more than 99 percent; the process is simple and the production cost is low.

Description

technical field [0001] The invention relates to the processing of B23P metal or C22C alloy technology in the IPC classification applied to flat panel displays and vacuum coating fields such as glass, especially the isothermal extrusion production method of refractory metal rotating targets. Background technique [0002] Refractory metals generally refer to metals with a melting point higher than 1650°C and have certain reserves, including tungsten, tantalum, molybdenum, niobium, hafnium, chromium, vanadium, zirconium and titanium, and metals with a melting point higher than the melting point of zirconium, which is 1852°C, are called refractory metals. molten metal. Based on these metals, alloys formed by adding other elements are called refractory metal alloys. [0003] The refractory metals used as sputtering targets mainly refer to tungsten, molybdenum, tantalum and niobium. Refractory metal materials have been used as sputtering in many fields including liquid crystal d...

AI Technical Summary

Problems solved by technology

[0010] There will be a series of problems such as long cycle time, high cost and quality defects in the production of refractory metal targets by the above-mentioned process

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