Pt-GFW/SiO2/n-Si heterojunction material and preparation method thereof
A heterojunction, pt-gfw technology, applied in the field of materials, can solve problems such as weak response to visible light, and achieve the effects of improved photovoltaic effect, superior performance and simple preparation
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Embodiment 1
[0024] The invention improves the response of the graphene solar cell to visible light at room temperature.
[0025] First, heat the copper grid from room temperature to 1000°C in an argon atmosphere for 80 minutes, then pass hydrogen gas at 1000°C for 30 minutes, and pass argon, hydrogen, and methane at a ratio of 200:2:30 at 1000°C. , reacted for 20 minutes. Under argon protection, cool down to room temperature. The copper mesh on which the graphene mesh was grown was etched with ferric nitrate solution and washed three times with deionized water. The wafers were then ultrasonically cleaned two to three times with acetone, and then cleaned with hydrofluoric acid. The cleaned graphene mesh was then transferred to a silicon wafer. Stand still at room temperature for 15 hours to form a naturally oxidized silicon dioxide layer where the silicon of the device is not well connected to the graphene network, and thus assemble into a graphene solar cell in the usual sense.
[002...
Embodiment 2
[0034] The experiment is to first heat the copper mesh from room temperature to 1000°C in an argon atmosphere for 60 minutes, then pass hydrogen gas at 1000°C for 30 minutes, and pass argon and hydrogen at a ratio of 200:2:30 at 1000°C. , methane, reacted for 20 minutes. Under argon protection, cool down to room temperature. The copper mesh on which the graphene mesh was grown was etched with ferric nitrate solution and washed three times with deionized water. The wafers were then ultrasonically cleaned two to three times with acetone, and then cleaned with hydrofluoric acid. The cleaned graphene mesh was then transferred to a silicon wafer. Stand still at room temperature for 15 hours to form a naturally oxidized silicon dioxide layer where the silicon of the device is not well connected to the graphene network, and thus assemble into a graphene solar cell in the usual sense.
[0035] The thickness of the silicon oxide layer may be 1.5-2.5 nanometers.
[0036] The thickne...
Embodiment 3
[0043] The invention improves the response of the graphene solar cell to visible light at room temperature.
[0044] First, heat the copper grid from room temperature to 1000°C in an argon atmosphere for 80 minutes, then pass hydrogen gas at 1000°C for 30 minutes, and pass argon, hydrogen, and methane at a ratio of 200:2:30 at 1000°C. , reacted for 20 minutes. Under argon protection, cool down to room temperature. The copper mesh on which the graphene mesh was grown was etched with ferric nitrate solution and washed three times with deionized water. The wafers were then ultrasonically cleaned two to three times with acetone, and then cleaned with hydrofluoric acid. The cleaned graphene mesh was then transferred to a silicon wafer. Stand still at room temperature for 15 hours to form a naturally oxidized silicon dioxide layer where the silicon of the device is not well connected to the graphene network, and thus assemble into a graphene solar cell in the usual sense.
[004...
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