A kind of preparation method of silicon chip master alloy
A master alloy and silicon wafer technology, applied in the field of semiconductor doping, can solve the problems of secondary pollution and inaccurate weighing, and achieve the effects of low reduction power consumption, low solid solubility, and contact area.
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Embodiment 1
[0034]This embodiment provides a method for preparing a P-type silicon chip master alloy, comprising the following steps:
[0035] (1) Pass the refined chlorosilane gas (one or more of monosilane, silicon tetrachloride, silicon trichloride, and silicon dichloride) in the silicon source gas storage tank through the adsorption column filled with adsorbent , wherein the adsorbent includes functional resin, modified silica gel, modified molecular sieve, modified activated carbon, and modified alumina, and the metal impurities in the doped refined chlorosilane are removed by adsorption, wherein the metal impurities include: iron , copper, calcium and zinc to obtain refined chlorosilane gas after adsorption.
[0036] (2) Transport the adsorbed refined chlorosilane gas to the fluidized bed reactor, transport aluminum chloride to the fluidized bed reactor with hydrogen as the carrier gas, and feed the seed crystal into the fluidized bed reactor And make the seed crystal fluidized, wh...
Embodiment 2
[0042] This embodiment provides a method for preparing a P-type silicon chip master alloy, comprising the following steps:
[0043] (1) Pass the silicon source gas in the storage tank as monosilane gas through the adsorption column filled with adsorbents, where the adsorbents include functional resins, modified silica gel, modified molecular sieves, modified activated carbon, and modified alumina. The metal impurities in the doped monosilane are adsorbed and removed, wherein the metal impurities include: iron, copper, calcium, zinc, aluminum, and the adsorbed monosilane gas is obtained.
[0044] (2) Transport the adsorbed monosilane gas to the fluidized bed reactor, transport the mixture of aluminum chloride and boron chloride to the fluidized bed reactor with nitrogen as the carrier gas, and send it to the fluidized bed reactor Introduce the seed crystal and make the seed crystal fluidized, wherein the molar ratio of the sum of the moles of monosilane gas to the mixture of al...
Embodiment 3
[0048] This embodiment provides a method for preparing a P-type silicon chip master alloy, comprising the following steps:
[0049] (1) Pass the mixed gas of silicon tetrachloride, silicon trichloride and silicon dichloride in the silicon source gas storage tank through the adsorption column filled with adsorbents, where the adsorbents include functional resin, modified silica gel, modified Molecular sieves, modified activated carbon, and modified alumina are used to adsorb and remove metal impurities in the mixed gas of doped silicon tetrachloride, silicon trichloride, and silicon dichloride by adsorption, and the metal impurities include copper. A mixed gas of silicon tetrachloride, silicon trichloride and silicon dichloride after adsorption is obtained.
[0050] (2) Transport the mixed gas of silicon tetrachloride, silicon trichloride and silicon dichloride after adsorption to the fluidized bed reactor, and use argon as the carrier gas to transport borane into the fluidized...
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Abstract
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