Composite graphene coating for fuel cell metal polar plate and preparation method thereof
A graphene composite, metal plate technology, applied in fuel cell parts, fuel cells, circuits, etc., can solve the problems of many graphene layer defects, reducing the metal corrosion rate, and the corrosion resistance ability needs to be further improved. Enhanced corrosion resistance, reduced corrosion ion attack, and improved durability
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Embodiment 1
[0039] (1) Put the stainless steel metal bipolar plate after ultrasonic cleaning into the cavity of the unbalanced magnetron sputtering ion plating furnace, and evacuate to 3×10 -5 torr, filled with argon, the working pressure is kept at 4×10 -4 torr, the bias voltage is -500V, the passivation layer is removed by ion bombardment, the ion plating sputtering cleaning process time is 30min, the sample is hung on the rotating support, and the support speed is 4r / min.
[0040] (2) The bias voltage was maintained at -60V, the Ni target current was turned on, and the current was gradually increased from 0 to 6A, and a metal Ni layer was deposited on the surface of the metal plate for 30 minutes.
[0041] (3) Put the electrode plate after depositing the metal Ni layer into a vacuum tube furnace, pass through 50 sccm of hydrogen and 80 sccm of argon as protective gases, and heat the tube furnace from room temperature to 900° C. for 30 minutes. 30 sccm of ethylene gas was introduced, a...
Embodiment 2
[0044] (1) Put the stainless steel metal bipolar plate after ultrasonic cleaning into the cavity of the unbalanced magnetron sputtering ion plating furnace, and evacuate to 3×10 -5 torr, filled with argon, the working pressure is kept at 4×10 -4 torr, the bias voltage is -500V, the passivation layer is removed by ion bombardment, the ion plating sputtering cleaning process time is 30min, the sample is hung on the rotating support, and the support speed is 4r / min.
[0045] (2) Keep the bias voltage at -60V, turn on the Cu target current, and gradually increase the current from 0 to 6A, and deposit a metal Cu layer on the surface of the metal plate for 30 minutes.
[0046] (3) Put the electrode plate after depositing the metal Cu layer into a vacuum tube furnace, pass through 60 sccm of hydrogen and 70 sccm of argon as protective gas, and heat the tube furnace from room temperature to 1000° C. for 30 minutes. 30 sccm of methane gas was introduced, and graphene crystals were gro...
Embodiment 3
[0049] (1) Put the stainless steel metal bipolar plate after ultrasonic cleaning into the chamber of multi-arc ion plating furnace, and vacuumize to 8×10 -3 Pa, filled with argon gas, with a bias voltage of -700V, ion bombardment to remove the passivation layer, ion plating and sputtering cleaning process time of 10min, the sample is hung on the rotating stand, and the stand speed is 4r / min.
[0050] (2) Reduce the bias voltage to -500V, turn on the Cu target current, and gradually increase the current from 0 to 70A, and deposit a metal Cu layer on the surface of the metal plate for 30 minutes.
[0051] (3) Put the electrode plate after depositing the metal Cu layer into a vacuum tube furnace, pass through 50 sccm of hydrogen and 70 sccm of argon as protective gas, and heat the tube furnace from room temperature to 1200° C. for 40 minutes. Pass 30 sccm of acetylene gas, under the catalysis of Cu, grow graphene crystals for 60 minutes, continue to pass hydrogen and argon after ...
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