ITO-Ag-ITO etching liquid for AM-OLED display screen and preparation method

An AM-OLED, etching solution technology, applied in chemical instruments and methods, surface etching compositions, etc., can solve the problem of difficulty in controlling the etching angle and the etching amount of the metal layer, affecting the image accuracy and quality of high-density thin wires, affecting etching Effect repeatability and other issues, to achieve the effect of stable reaction, smooth lines, and consistent etching rate

Active Publication Date: 2015-12-23
JIANGYIN RUNMA ELECTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the process of reagent etching ITO / Ag / ITO materials, it is often difficult to control the etching angle and the etching amount of the metal layer with the general ITO etching solution on the market, and the etching solution is unstable, which affects the repeatability of the etching effect
[0005] In recent years, while people's demand for liquid crystal displays has been increasing, higher requirements have been placed on product quality and screen accuracy, and the effect of etching can directly lead to the quality of the circuit board manufacturing process and affect the quality of high-density thin wires. Image Accuracy and Quality

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] The invention is an ITO / Ag / ITO etchant for AM-OLED display screen, which comprises phosphoric acid, acetic acid, nitric acid, additives, surface active agent and pure water.

[0032] Wherein, the percentages by weight of each of the six raw materials are: 60% phosphoric acid, 25% acetic acid, 3% nitric acid, 1% additive, 0.5% surfactant, and the rest is pure water.

[0033] Wherein, the phosphoric acid concentration is 85%, the acetic acid concentration is 99.8%, and the nitric acid concentration is 70%.

[0034] Wherein, the additive uses potassium nitrate as a single component. The purity of the potassium nitrate is 99.5%, and the impurity components in the potassium nitrate raw material are sodium chloride, water and a very small amount of impurities insoluble in the etching solution.

[0035] Wherein, the surfactant is fatty alcohol polyoxyethylene ether.

[0036] Wherein, there are no more than 100 particles with a particle size greater than 0.3 μm per 1000 Kg in...

Embodiment 2

[0050] The invention is an ITO / Ag / ITO etchant for an AM-OLED display, characterized in that the etchant includes phosphoric acid, acetic acid, nitric acid, additives, surfactants and pure water.

[0051] Wherein, the percentage by weight of each of the six raw materials is: 50% phosphoric acid, 10% acetic acid, 6% nitric acid, 1% additive, 0.5% surfactant, and the rest is pure water.

[0052] Wherein, the phosphoric acid concentration is 85%, the acetic acid concentration is 99.8%, and the nitric acid concentration is 70%.

[0053] Wherein, the additive uses potassium nitrate as a single component. The purity of the potassium nitrate is 99.5%, and the impurity components in the potassium nitrate raw material are sodium chloride, water and a very small amount of impurities insoluble in the etching solution.

[0054] Wherein, the surfactant is a non-foaming nonionic surfactant, and the fatty alcohol polyoxyethylene ether in the AEO series is used.

[0055] There are no more th...

Embodiment 3

[0069] The difference between this embodiment and Example 1 is that the percentage by weight of each raw material in the six raw materials is respectively: 55% phosphoric acid, 15% acetic acid, 5% nitric acid, 0.5% additive, 0.2% surfactant, and the rest for pure water. The additive uses potassium nitrate, and the surfactant uses alkylphenol polyoxyethylene ether.

[0070] Implementation process: immerse the ITO / Ag / ITO substrate in the etching solution, control the etching temperature at 40°C, rinse with ultrapure water for 80s after etching, and finally dry with high-purity nitrogen. Under the observation of the etched substrate under a 100,000-fold SEM, the edges of the In / Ag / In wires are flat, the substrate surface is clean and free of metal residues, and the etching angle is kept between 70° and 90°.

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Abstract

The invention discloses ITO-Ag-ITO etching liquid for an AM-OLED display screen and a preparation method. The etching liquid is prepared from phosphoric acid, acetic acid, nitric acid, additives, surfactants and pure water. The preparation method of the etching liquid comprises the steps that the rotating speed of a stirrer of a dosing tank is kept at normal temperature and pressure, the pure water, the phosphoric acid, the acetic acid, the nitric acid, the additives, the surfactants and the balance pure water are sequentially added into the dosing tank, and after full stirring is conducted, the ITO-Ag-ITO etching liquid is prepared by introducing a fully-stirred mixture into a filter for filtration. According to the ITO-Ag-ITO etching liquid for the AM-OLED display screen and the preparation method, the ITO-Ag-ITO etching liquid is small in particle size and high in purity, the etching rate to different metal is basically the same, and reaction is stable; the etching rate can be controlled by adjusting the concentrations of the phosphoric acid and the nitric acid, the surface of a substrate etched through the etching liquid is clean and tidy, residues do not exist, the intermetallic layering phenomenon does not exist, remaining lines are flat and smooth, and the etching angle is kept between 70 degrees to 90 degrees.

Description

technical field [0001] The invention relates to a composition for chemical etching of metal materials and a preparation method thereof, in particular to an ITO / Ag / ITO etchant for AM-OLED display screens and a preparation method thereof. Background technique [0002] AM-OLED is the abbreviation of Active-matrix organic light emitting diode in English, and the full name in Chinese is active matrix organic light emitting diode or active matrix organic light emitting diode. The structure of the AM-OLED screen has three layers, AM-OLED screen + TouchScreenPanel (touch screen panel) + outer protective glass. AM-OLED is a kind of OLED technology. OLED means that it is a self-luminous display, which uses multiple layers of organic compounds to achieve independent R, G, and B three-color light. The AM-OLED screen is very thin, and the touch layer can be integrated in the screen, so it is more advantageous to make an ultra-thin machine. AM-OLED adopts pentile arrangement, unlike t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K13/06
Inventor 戈烨铭
Owner JIANGYIN RUNMA ELECTRONICS MATERIAL
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