Wafer-level packaging method based on silicon molecular sieve and polytetrafluoroethylene composite film

A polytetrafluoroethylene, wafer-level packaging technology, applied in the process of producing decorative surface effects, decorative arts, measuring devices, etc., to achieve the effect of improving packaging efficiency and reducing packaging costs

Active Publication Date: 2016-01-13
中科芯未来微电子科技成都有限公司
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Problems solved by technology

In view of the fact that there is no relevant report on the dust-proof and chemical-contaminated wafer-level packaging of MEMS devices, the present invention proposes a temperature,

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  • Wafer-level packaging method based on silicon molecular sieve and polytetrafluoroethylene composite film
  • Wafer-level packaging method based on silicon molecular sieve and polytetrafluoroethylene composite film
  • Wafer-level packaging method based on silicon molecular sieve and polytetrafluoroethylene composite film

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[0029] The method of the present invention consists of three parts: the preparation of silicon molecular sieve, the formation of the encapsulation cavity and the gold-silicon eutectic bonding. Among them, the silicon molecular sieve is prepared by deep-hole etching, and the size of the particles that can pass through is selected by controlling the pore size of the molecular sieve, which plays a role in blocking large molecules and selecting small molecules. In order to solve the problem that the surface of the silicon molecular sieve is easy to adhere to chemical substances such as dust, water vapor, oil, and so on, which causes the molecular sieve to block, the present invention modifies the surface of the silicon molecular sieve, that is, prepares a layer of hydrophobic and oleophobic polymer organic polymer film ——Polytetrafluoroethylene film (PTFE). The PTFE film not only has extremely small surface tension and excellent corrosion resistance, but also has a simple preparati...

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Abstract

The invention discloses a wafer-level packaging method based on a silicon molecular sieve and polytetrafluoroethylene composite film. By using a silicon-on-insulator wafer as a carrier, the method integrates the vacuum packaging of a temperature sensor chip on a wafer, and the dustproof and chemical adhesion-proof open-type packaging of a humidity sensor chip and a pressure sensor chip on the wafer into one set of technology via technologies such as dual-surface photolithography, deep-hole etching, surface spin-coating, eutectic bonding, and so on. Top silicon of the silicon-on-insulator wafer is used as an etching carrier to prepare the molecular sieve used as a packaging window of the humidity sensor and the pressure sensor to block impurity particles with large size in the air. Through a surface modification technique, the polytetrafluoroethylene film covers the surface of the silicon molecular sieve to perform hydrophobic treatment to effectively improve anti-adhesion performance of the surface. A micro electro mechanical gas sensor adopting the packaging technique not only could be applied to a complex chemical impurity environment to achieve accurate industrial process monitoring, but also has remarkable price and volume advantages and is suitable for industrialized mass production simultaneously.

Description

technical field [0001] The invention belongs to the technical field of micro-electromechanical systems (MEMS) manufacturing, and in particular relates to a wafer-level packaging technology for dust-proof and chemical-impurity-proof multi-parameter microsensors of temperature, humidity and pressure. Background technique [0002] As modern industry moves towards the 4.0 era, process control plays an increasingly important role in production. Usually, in order to ensure that the production process is in a controlled state, the parameters that directly or indirectly affect product quality, such as temperature, humidity, pressure, flow, liquid level, composition, concentration, etc., are detected and controlled in real time to make them close to a given value or maintain within the given range. Through the control of process parameters, production efficiency can be improved, energy consumption can be reduced, pollution can be reduced, etc. However, for chemical, petroleum, meta...

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Application Information

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IPC IPC(8): B81C1/00B81B7/00
Inventor 马晶晶欧文罗九斌
Owner 中科芯未来微电子科技成都有限公司
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