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Nano-structure coating with ultra-high hardness and manufacturing method thereof

A nanostructure and hardness technology, applied in the field of materials science, can solve the problems of coating hardness, high temperature oxidation resistance that cannot meet high-speed cutting and dry cutting, coating performance, deposition conditions and deposition efficiency, etc., to achieve excellent High temperature oxidation resistance, excellent mechanical properties, and high production efficiency

Active Publication Date: 2016-02-03
UNIV OF SHANGHAI FOR SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0011] Aiming at the above-mentioned technical problems in the prior art, the present invention provides a nanostructured coating with ultrahigh hardness and a preparation method thereof. The nanostructured coating with ultrahigh hardness and its preparation method solve the problem of The coating hardness and high-temperature oxidation resistance in the prior art cannot meet the technical problems of high-speed cutting and dry cutting. At the same time, the technical problems of coating performance, deposition conditions and deposition efficiency must be solved.

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  • Nano-structure coating with ultra-high hardness and manufacturing method thereof
  • Nano-structure coating with ultra-high hardness and manufacturing method thereof

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preparation example Construction

[0029] Preparation, characterization and measuring instruments used in the present invention:

[0030] JGP-450 Magnetron Sputtering System, Shenyang Scientific Instrument Development Center Co., Ltd., Chinese Academy of Sciences

[0031] D8Advance X-ray diffractometer, Bruker, Germany

[0032] NANOIndenterG200 nanoindenter, Agilent Technologies, USA

[0033] TecnaiG 2 Model 20 high-resolution transmission electron microscope, FEI, USA

[0034] QuantaFEG450 scanning electron microscope, American FEI company

Embodiment 1

[0036] A method for preparing a nanostructured coating with ultrahigh hardness, comprising the steps of:

[0037] 1） A step for cleaning the substrate:

[0038] First, send the polished substrate into an ultrasonic cleaning machine, and use 15-30kHz ultrasonic waves to clean it in absolute alcohol and acetone for 5-10 minutes; then perform ion cleaning, that is, put the substrate into a vacuum chamber and vacuumize it to 6×10 -4 Ar gas is introduced after the Pa, and the vacuum degree is maintained at 2-4 Pa. The substrate is ion-bombarded with radio frequency (13.56MHz) for 20-50 minutes, and the power is 80-100W; the substrate is ceramic.

[0039] 2) a step of alternately sputtering TiSiN layers and CrAlN layers;

[0040] TiSi (84atom%:16atom%) composite target and CrAl target (50atom%:50atom%) are used, with a diameter of 75mm; Ar gas flow: 40sccm, N 2 Air flow: 5sccm;

[0041] TiSiN layer sputtering power 350W, time 20s; CrAl layer sputtering power 150W, time 3s;

[0...

Embodiment 2

[0045] A method for preparing a nanostructured coating with ultrahigh hardness, comprising the steps of:

[0046] 1） A step for cleaning the substrate:

[0047] First, send the polished substrate into an ultrasonic cleaning machine, and use 15-30kHz ultrasonic waves to clean it in absolute alcohol and acetone for 5-10 minutes; then perform ion cleaning, that is, put the substrate into a vacuum chamber and vacuumize it to 6×10 -4 Ar gas is introduced after the Pa, and the vacuum degree is maintained at 2-4Pa. The substrate is bombarded with ions for 20-50min by radio frequency (13.56MHz), and the power is 80-100W; the substrate is nickel-chromium alloy.

[0048] 2) a step of alternately sputtering TiSiN layers and CrAlN layers;

[0049] TiSi (84atom%:16atom%) composite target and CrAl target (50atom%:50atom%) are used, with a diameter of 75mm; Ar gas flow: 20sccm, N 2 Air flow: 2sccm;

[0050] TiSiN layer sputtering power 350W, time 20s; CrAl layer sputtering power 150W, ti...

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Abstract

The invention provides a nano-structure coating with the ultra-high hardness. The coating is composed of at least one TiSiN layer and at least one CrAlN layer. The TiSiN layers and the CrAlN layers are alternately deposited on a substrate. The invention further provides a manufacturing method of the nano-structure coating with the ultra-high hardness. The method includes the steps that the substrate which is polished is conveyed into an ultrasonic washing machine so as to be ultrasonically washed in anhydrous alcohol and acetone; then ion washing is performed; and after ion washing is performed, the substrate is placed in a multi-target magnetron sputtering instrument and stays in front of a TiSi composite target and a CrAl target alternately, and the nano-structure coating with the TiSiN layers and the CrAlN layers alternately superposed is obtained through sputtering. The nano-structure coating has the ultrahigh hardness and the excellent mechanical performance and high-temperature and oxidation resistance and can be used as a protective coating of a high-speed cutter and service anti-abrasion workpieces under other high-temperature conditions.

Description

technical field [0001] The invention belongs to the field of materials science and relates to a protective coating, in particular to a nanostructure coating with ultrahigh hardness and a preparation method thereof. Background technique [0002] With the development of advanced manufacturing industry, higher and higher requirements are put forward for the surface properties of materials, and the surface of materials is required to have high hardness, wear resistance, corrosion resistance and high temperature resistance. Coating a layer of superhard coating on the surface of the material is an effective way to improve the surface performance of the material. Its development meets the high technical requirements of the modern manufacturing industry for metal cutting tools and can be widely used in machinery manufacturing, automobile industry, Geological drilling, mold industry and other fields. With the continuous development of advanced cutting technologies such as high-speed...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/06C23C14/02
Inventor 李伟刘平张柯马凤仓刘新宽陈小红何代华
Owner UNIV OF SHANGHAI FOR SCI & TECH
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