A nanostructured coating with ultrahigh hardness and its preparation method
A nanostructure and hardness technology, applied in the field of materials science, can solve the problems that the hardness and high temperature oxidation resistance of the coating cannot meet the requirements of high-speed cutting and dry cutting, and the coating performance, deposition conditions and deposition efficiency cannot be taken into account. High temperature oxidation resistance, excellent mechanical properties, simple process effect
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[0029] Preparation, characterization and measuring instruments used in the present invention:
[0030] JGP-450 Magnetron Sputtering System, Shenyang Scientific Instrument Development Center Co., Ltd., Chinese Academy of Sciences
[0031] D8 Advance X-ray diffractometer, Bruker, Germany
[0032] NANO Indenter G200 nanoindenter, Agilent Technologies, USA
[0033] Tecnai G 2 Model 20 high-resolution transmission electron microscope, FEI, USA
[0034] Quanta FEG450 scanning electron microscope, American FEI company
Embodiment 1
[0036] A method for preparing a nanostructured coating with ultrahigh hardness, comprising the steps of:
[0037] 1) A step to clean the substrate:
[0038] First, send the polished substrate into an ultrasonic cleaning machine, and use 15-30kHz ultrasonic waves to clean it in absolute alcohol and acetone for 5-10 minutes; then perform ion cleaning, that is, put the substrate into a vacuum chamber and vacuumize it to 6×10 -4 Ar gas is introduced after the Pa, and the vacuum degree is maintained at 2-4 Pa. The substrate is ion-bombarded with radio frequency (13.56MHz) for 20-50 minutes, and the power is 80-100W; the substrate is ceramic.
[0039] 2) a step of alternately sputtering TiSiN layers and CrAlN layers;
[0040] TiSi (84atom%: 16 atom%) composite target and CrAl target (50 atom%: 50 atom%) are used, with a diameter of 75mm; Ar gas flow: 40sccm, N 2 Air flow: 5sccm;
[0041] TiSiN layer sputtering power 350W, time 20s; CrAl layer sputtering power 150W, time 3s;
[0...
Embodiment 2
[0045] A method for preparing a nanostructured coating with ultrahigh hardness, comprising the steps of:
[0046] 1) A step to clean the substrate:
[0047] First, send the polished substrate into an ultrasonic cleaning machine, and use 15-30kHz ultrasonic waves to clean it in absolute alcohol and acetone for 5-10 minutes; then perform ion cleaning, that is, put the substrate into a vacuum chamber and vacuumize it to 6×10 -4 Ar gas is introduced after the Pa, and the vacuum degree is maintained at 2-4Pa. The substrate is bombarded with ions for 20-50min by radio frequency (13.56MHz), and the power is 80-100W; the substrate is nickel-chromium alloy.
[0048] 2) a step of alternately sputtering TiSiN layers and CrAlN layers;
[0049] TiSi (84atom%: 16 atom%) composite target and CrAl target (50 atom%: 50 atom%) are used, with a diameter of 75mm; Ar gas flow: 20sccm, N 2 Air flow: 2sccm;
[0050] TiSiN layer sputtering power 350W, time 20s; CrAl layer sputtering power 150W, ti...
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