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Preparation method of pure titanium surface Ag/Sr co-doped TiO2 porous film

A porous film and co-doping technology, applied in the direction of surface reaction electrolytic coating, ion implantation plating, electrolytic coating, etc., can solve the problems of poor antibacterial performance, poor osseointegration of bioactive implants, etc., and achieve low cost and effective Good for adhesion and proliferation, good application prospects

Active Publication Date: 2016-03-23
山西美原齿科器械有限责任公司
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Problems solved by technology

[0005] The object of the invention is to provide a kind of pure titanium surface Ag / Sr co-doped TiO 2 Preparation method of porous film to solve the problems of poor antibacterial performance, biological activity and poor osseointegration of existing titanium-based implants

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  • Preparation method of pure titanium surface Ag/Sr co-doped TiO2 porous film
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  • Preparation method of pure titanium surface Ag/Sr co-doped TiO2 porous film

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[0031] The present invention is further illustrated by the following examples, but not limited to the following examples.

[0032] Implement a kind of pure titanium surface Ag / Sr co-doped TiO of the present invention 2 The preparation method of the porous film is to use the TiAg alloy target as the source in the magnetron sputtering coating equipment, and use the low-temperature plasma generated by the glow discharge to bombard the surface of the source to make the pre-plated metal elements flow from the source target The surface of the material is sputtered out, and a TiAg deposition layer is formed on the surface of pure titanium through transport deposition. Then put the sample with TiAg film deposited on the surface into the micro-arc oxidation electrolyte. Under the action of local high temperature and high pressure, the active elements Ca, P, and Sr in the electrolyte enter the surface of the sample through diffusion and electrophoresis. Formation of Ag / Sr co-doped TiO on...

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Abstract

The invention discloses a preparation method of a pure titanium surface Ag / Sr co-doped TiO2 porous film. A pure titanium sample and a TiAg alloy target are oppositely put in a magnetron sputtering film plating furnace, and argon is fed to pre-sputter and clean the sample after vacuumizing; then, a source pole and workpiece voltage are switched on to form a TiAg alloy film on the surface of the sample through the argon ion bombardment and the metal ion deposition and dispersion; and an alloyed sample, serving as an anode, is dip in electrolyte, a stainless steel electrolytic cell serves as a cathode, and a direct-current pulse micro-arc oxidation device is adopted to perform the micro-arc oxidation to obtain the Ag / Sr co-doped TiO2 porous film under a certain conditions of current density, duty ratio and direct-current pulse frequency. The film, prepared by the method, is excellent in bonding force, has long-acting antibacterial property and excellent biocompatibility, and is simple in operation, excellent in repeatability, suitable for large-batch production and capable of preparing advanced medical implant bone substitute materials.

Description

technical field [0001] The invention relates to a kind of Ag / Sr co-doped TiO on the surface of pure titanium 2 The preparation method of porous film, specifically a combination of magnetron sputtering and micro-arc oxidation technology, on the surface of pure titanium to prepare Ag / Sr co-doped TiO with long-term antibacterial ability and excellent biocompatibility 2 porous film method. Background technique [0002] Metal titanium has a density close to that of human bone, low elastic modulus, strong corrosion resistance, and better biocompatibility than stainless steel and cobalt-chromium-molybdenum alloys. It has become the preferred medical metal material and is widely used in artificial bones, artificial joints, and tooth roots. , Cardiovascular stents and other implants. However, titanium itself does not have antibacterial ability, and it is easy to cause bacterial infection when implanted in the human body during clinical use, resulting in implant failure. In additio...

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Application Information

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IPC IPC(8): C23C14/35C23C14/16C25D11/26
CPCC23C14/165C23C14/35C25D11/26
Inventor 张翔宇贺晓静杭瑞强黄晓波秦林唐宾
Owner 山西美原齿科器械有限责任公司
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