Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method of high-crystallization graphene quantum dots capable of replacing fullerene

A technology of graphene quantum dots and high crystallinity, which is applied in the direction of nanotechnology, nanotechnology, nanotechnology, etc. for materials and surface science, can solve problems such as expensive and difficult to achieve large-scale production, and achieve high Effect of carbon content, realization of large-scale production, and high crystal structure

Inactive Publication Date: 2016-06-22
TIANJIN UNIV
View PDF3 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the raw materials used in this method, that is, nano-scale pure graphite particles (GNPs), are very expensive and generally only available to a few specialized research groups, so this method is difficult to achieve large-scale production

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of high-crystallization graphene quantum dots capable of replacing fullerene
  • Preparation method of high-crystallization graphene quantum dots capable of replacing fullerene
  • Preparation method of high-crystallization graphene quantum dots capable of replacing fullerene

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Add 15 μL of concentrated sulfuric acid as an ion catalyst to 15 mL of an aqueous solution of glycerol with a volume fraction of 70%, ultrasonically disperse the mixed solution for 3 minutes, put it into a polytetrafluoroethylene hydrothermal reaction kettle, cover and seal Afterwards, the reaction kettle was put into a muffle furnace, and the temperature was raised to 180° C. for 16 hours. After the reaction was completed, the reaction kettle was cooled to room temperature, and the yellow-brown solution generated in the reaction kettle was poured out, the solid impurities were removed by filtration, and the remaining solution was purified by dialysis. Mix the solution obtained after purification with 5 times the volume of anhydrous DMF solvent and disperse evenly by ultrasonic. After completion, put it into a chemical microwave reactor, set the heating power to 600W, and perform microwave reduction treatment under N2 protection conditions for 2 minutes. After the end, ...

Embodiment 2

[0026] Add 30 μL of concentrated sulfuric acid as an ion catalyst to 30 mL of an aqueous solution of glycerol with a volume fraction of 70%, sonicate the mixed solution for 4 minutes to disperse it evenly, then place it in a polytetrafluoroethylene hydrothermal reaction kettle, cover and seal Afterwards, the reaction kettle was put into a muffle furnace, and the temperature was raised to 200° C. for 20 h. After the reaction was completed, the reaction kettle was cooled to room temperature, and the yellow-brown solution generated in the reaction kettle was poured out, the solid impurities were removed by filtration, and the remaining solution was purified by dialysis. Mix the solution obtained after purification with 5 times the volume of anhydrous DMF solvent and disperse evenly by ultrasonic. After completion, put it into a chemical microwave reactor, set the heating power to 720W, and perform microwave reduction treatment under N2 protection conditions for 3 minutes. After t...

Embodiment 3

[0028] Add 40 μL of concentrated sulfuric acid as an ion catalyst to 40 mL of an aqueous solution of glycerol with a volume fraction of 70%, ultrasonically disperse the mixed solution for 5 minutes, put it into a polytetrafluoroethylene hydrothermal reaction kettle, cover and seal Afterwards, the reaction kettle was put into a muffle furnace, and the temperature was raised to 220° C. for 24 hours. After the reaction was completed, the reaction kettle was cooled to room temperature, and the yellow-brown solution generated in the reaction kettle was poured out, the solid impurities were removed by filtration, and the remaining solution was purified by dialysis. Mix the solution obtained after purification with 5 times the volume of anhydrous DMF solvent and disperse evenly by ultrasonic. After completion, put it into a chemical microwave reactor, set the heating power to 800W, and set 2 Microwave reduction treatment under protected conditions for 5 minutes. After the end, the s...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a preparation method of high-crystallization graphene quantum dots capable of replacing fullerene. The preparation method comprises the steps: taking small-molecular carbohydrate as a carbon source, and synthesizing carbon quantum dots with the size of nanoscale by a one-step hydrothermal method; carrying out temperature controlled microwave reduction treatment on the carbon quantum dots, and removing oxygen-containing groups on the surface; mixing a chloroform solvent with a carbon quantum dot aqueous solution after the completion of treatment, carrying out extraction and separation operation on the mixed solution, collecting a lower-layer chloroform solution, and removing the lower-layer chloroform solvent by using a reduced pressure distillation method to obtain the final product. The preparation method has the advantages of easy operation, short time and high yield, and can realize large scale preparation; the graphene quantum dots soluble in an organic phase and uniform in size can be obtained through the one-step solvent selection separation action, and are expected to be applied in light detectors, solar cells and other organic photovoltaic fields.

Description

technical field [0001] The invention belongs to the field of preparation of carbon nanomaterials, more specifically, relates to a 2 Graphene-like quantum dots (GQDs) with a highly crystalline structure dominated by hybrid carbon atoms can be used as an electron acceptor material to replace fullerene derivatives in organic solar cells. Background technique [0002] Among renewable energy sources such as solar energy, wind energy, hydrogen energy, and coal vaporization, photovoltaic energy, which converts solar energy into electricity, is one of the most promising energy sources in the future. At present, the mainstream inorganic solar cells, such as monocrystalline silicon and polycrystalline silicon solar cells, have high power conversion efficiency (PCE), but the high energy consumption production process and high price limit their wide application. In contrast, polymer solar cells have unique advantages such as light weight, good flexibility, low production cost and easy ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C01B31/02B82Y30/00
Inventor 封伟黄征程沈永涛
Owner TIANJIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com