34results about How to "Processing duration reduced" patented technology

A method and an apparatus for advantageously introducing a flame, a high velocity oxidizing gas, and a high velocity particulate flow into a furnace for metal melting, refining and processing, for example, steel making in an electric arc furnace. The steel making process of an electric arc furnace is made more efficient by shortening the time of the scrap melting phase, introducing a more effective high velocity oxidizing gas stream into the process sooner to decarburize the melted metal and introducing a more effective particulate injection to reduce FeO, form or foam slag and/or recarburize. Improved efficiency is obtained by mounting a fixed burner/lance and carbon injector lower and closer to the hot face of the furnace refractory at an effective injection angle. This mounting technique shortens the distance that the flame of the burner has to melt through scrap to clear a path to the molten metal, and shortens the distance the high velocity oxygen and high velocity particulates travel to the slag-metal interface. One method includes supplying a plurality of oxidizing reaction zones with the high velocity oxidizing gas to decarburize the melted metal and a plurality of particulate reaction zones with high velocity flows of particulate carbon for reducing FeO and/or forming foamy slag. The particulate reaction zones are located on the downstream side of the oxidizing gas reaction zones so as to minimize any effect of the reduction reaction on the decarburization reaction and to recover a part of the hot FeO produced in the oxidizing gas reaction zones.

The invention relates to a method for applying rewiring to a panel. For this purpose, a panel is provided which has a coplanar overall upper side of an upper side of a plastic compound and the upper sides of semiconductor chips. The method provides a rewiring layer with implementation of external contacts and rewiring lines which, by means of a two-stage exposure step, compensates for position errors of the semiconductor chips in the component positions of the panel.

An image quality enhancing apparatus, an image display apparatus, an image quality enhancing method, and a computer readable storage medium which make a learning-type image quality enhancing method utilizing a sparse expression practical are provided. The image quality enhancing apparatus calculates, from the feature quantity of an image, coefficients of low-image-quality base vectors expressing a feature quantity with a linear sum and generates the image with the enhanced image quality by calculating a linear sum of high-image-quality base vectors using the calculated coefficient. When calculating the coefficient, T base vectors highly influential on the feature quantity are selected from among a plurality of base vectors and an analytic solution making L2 norm of a coefficient matrix α as small as possible is calculated. A sparse solution of the coefficients can be obtained without using the iteration method and a practical image quality enhancing apparatus can be realized.

A modular laboratory apparatus for analysis and synthesis of liquids has a liquid tank, a central electronic evaluation unit, a multitude of functional modules, and a multitude of fluid modules. The functional modules and the fluid modules are mechanically connected in rows and are selectively connected to each other electrically and fluidically. At least one fluid module is fluidically connected to the liquid tank, and provision is made for electrical connections which connect the functional modules and the fluid modules to the central electronic evaluation unit. In a method for analysis and synthesis of liquids using a modular laboratory apparatus, the functional modules and the fluid modules are controlled by the central electronic evaluation unit by executing an analysis and/or synthesis program in order to perform an analysis procedure and/or a synthesis procedure.

A packaging machine having a sealing member that acts on a product wrapped by a lower film and an upper film, and which seals or closes the films to each other around the product in order to vacuum-package said product between both films, and control means for causing the sealing member to move in order to package the product. The sealing member defines at least one inner space where the product to be vacuum-packaged is disposed wrapped at least partially by the two films. According to one implementation the sealing member includes at least one longitudinal first wall, a longitudinal second wall and a transverse wall between which the inner space is defined, and an unobstructed opening facing the transverse wall.

A process is disclosed for producing a high temperature stable fiber composite ceramic by chemical vapor infiltration (CVI) with a silicon carbide precursor in a suitable carrier gas on carbon fiber preforms or silicon carbide fiber preforms. This process is characterized by the use of a process pressure of ≧0.6 bar absolute and a process temperature of ≧1100° C. Also disclosed are structural component parts, particularly for aircraft and spacecraft engineering, which are commonly exposed to high thermal and mechanical loading and which have been produced by the above process.

A method for preparing a semiconductor structure includes the following steps: providing a substrate including a first region and a second region defined thereon, forming a first mask structure over the substrate, forming a plurality of first features in the first mask structure in the first region, forming a second mask structure over the first mask structure, simultaneously forming a plurality of second features in the second mask structure in the second region and a plurality of third features in the second mask structure in the first region, and transferring the second features and the third features to the first mask structure to simultaneously form a plurality of islanding features in the first region and a plurality of line features in the second region.

Semiconductor wafers are cleaned, dried, and hydrophilized the following steps in the order stated:

• • a) treating the semiconductor wafer with a liquid aqueous solution containing hydrogen fluoride, the semiconductor wafer rotating about its center axis at least occasionally, and
  • b) drying the semiconductor wafer by rotation of the semiconductor wafer about its center axis at a rotational speed of 1000 to 5000 revolutions per minute in an ozone-containing atmosphere, the liquid aqueous solution containing hydrogen fluoride flowing away from the semiconductor wafer on account of the centrifugal force generated by the rotation, and the surface of the semiconductor wafer being hydrophilized by ozone.

System and methods for distributed processing are provided. The distributed processing system may include a control node, a first computing node, and a second computing node. The control node may obtain a type and a characteristic identifier of to-be-processed characteristic data. The type may be used to identify a home computing node to process to-be-processed characteristic data. The home computing node may be an identified one of the first computing node or the second computing node. The control node may determine process index information based on the characteristic identifier. The control node may schedule data index information corresponding to the to-be-processed characteristic data to a processing process on the home computing node according to the process index information. The data index information may be used for instructing the home computing node to obtain the to-be-processed characteristic data so that the home computing node may processes the to-be-processed characteristic data.

The invention relates to the field of measurement technology and relates to methods for measuring profiles of three-dimensional objects. With the aid of a projector, a previously known image which comprises non-intersecting lines is projected onto an object. The reflected signal is recorded with the aid of two cameras which are arranged at different distances away from the projector and which form different triangulation angles between the central beam of the projector and the central beams of the cameras. The distance between the projector and the closest camera is selected in such a way that the triangulation angle of the central beam of this camera and of the central beam of the projector is equal to the arctangent of the ratio of the distance between the projected bands to the depth of field of the camera lens. With the aid of the image produced by the first camera, the longitudinal and vertical coordinates of the projected lines are determined, and then the vertical coordinates of the lines are made more precise with the aid of the image produced by the second camera. The technical result consists in simplifying and expediting the measurement process.

The invention relates to a device (10) for finishing a workpiece (12), comprising a holding device (26) for holding at least one pressing element (40), and a finishing band (18) that can be pressed against a workpiece surface (16) to be finished, at the height of the pressing element (40), by means of said pressing element (40). The device also comprises a flexible intermediate element (44) that transmits a pressure force of the pressing element (40) to the finishing band (18) by means of a force absorbing surface and a force transmission surface.

Measurement data of intensities of fluorescence obtained by directing excitation light onto a subject is acquired. An initial value of an absorption coefficient of the phosphor is set on the basis of a concentration distribution of the phosphor, an intensity distribution of the fluorescence on the basis of an absorption coefficient and a diffusion coefficient (reduced scattering coefficient) of the subject, which are set beforehand, are calculated, and the measurement data is compared with the calculation result. If these are found not to be matched, an absorption coefficient of the phosphor at which the error will be a minimum is estimated by performing an inverse problem calculation using a mathematical model. The calculation of the intensity distribution of the fluorescence and evaluation of the error from the obtained concentration distribution are repeated using the absorption coefficient, and a concentration distribution for which the error is the minimum is acquired.

A method for producing an implant, such as a stent, includes providing an implant blank, such as a stent preform, formed from a degradable material, preferably a magnesium alloy. Recess are introduced into the implant blank through laser beam ablation using laser radiation in the form of pulse bundles, each pulse bundle having at least two pulses.

A method and plant for thermally treating braking elements after a forming step, including a convective heating step at 150-300° C. and a infrared irradiation heating step, immediately in succession one relative to the other. A tunnel convection furnace is crossed by at least a first conveyor belt which translates along a first direction and on an upper face of which the braking elements are placed, is arranged laterally adjacent, with respect to the first direction, to an infrared heating tunnel furnace crossed by a second conveyor belt which translates along a second direction, parallel and opposite to the first one, and on an upper face of which the braking elements are placed. The first conveyor belt is larger than the second conveyor belt, and the braking elements appear in multiple side-by-side rows in a transverse and oblique direction with respect to the first and second directions. Robots placed at the opposite ends of the furnaces transfer the braking elements from the first conveyor belt to the second one or vice versa to a first end of the furnaces and place them on the first conveyor belt or second one to a second end of the furnaces being opposite to the first one, so as to change at will the sequence in which the infrared and convective heating steps are performed.

The method consists of subjecting a coarse-grained titanium semi-product (1) with the pure titanium content of at least 99 wt % to a plastic deformation. In said plastic deformation the transverse cross-section surface area of the titanium semi-product is reduced by hydrostatic extrusion in which the titanium semi-product is the billet (1) extruded through the die (4). The reduction (R) of the transverse cross-section of the titanium billet (1) is realized in at least three but not more than five consecutive hydrostatic extrusion passes at the initial temperature of the billet (1) not above 50° C. and the extrusion velocity not above 50 cm/s. Prior to each hydrostatic extrusion pass, the titanium billet is covered with a friction-reducing agent. During the first hydrostatic extrusion pass, the reduction of the transverse cross-section surface area of the titanium semi-product is at least four, whereas during the second and third hydrostatic extrusion pass it is at least two and a half.

Disclosed herein is a process for the production of poly(meth)acrylimide materials. Therein, a granulated copolymer of (meth)acrylic acid and (meth)acrylonitrile is prefoamed and imidated by thermal treatment in a single step to provide poly(meth)acrylimide particles.

A process for the preparation of highly pure (E)-N,N-diethyl-2-cyano-3-(3,4-dihydroxy-5-nitrophenyl)acrylamide (Entacapone). It comprises condensing 3,4-dihydroxy-5-nitro benzaldehyde with N,N-diethyl cyano acetamide in an organic solvent in the presence of an organic base and an acid under reflux conditions followed by distilling off the solvent under vacuum and treating the residue with a lower aliphatic carboxylic acid at 40-8O0 C. The resulting residue is extracted with a chlorinated solvent and the solvent is distilled off under vacuum. The resulting residue is extracted with an organic solvent to obtain crude N,N-diethyl-2-cyano-3-3,4-dihydroxy-5-nitrophenyl)acrylamide. The crude product N,N-diethyl-2-cyano-3-(3,4-dihydroxy-5-nitrophenyl) acrylamide formed is treated with a mixture of organic alcohol and organic acid in the molar ratio of the crude product to organic alcohol 1:5 to 15 and crude product to organic acid 1:1 to 3 under reflux conditions.