A kind of nanometer multilayer transparent conductive film

A transparent conductive film, nano-multilayer technology, applied in the coating, superimposed layer plating, metal material coating process, etc. Low thickness threshold, smooth surface, improved wettability

Active Publication Date: 2018-03-20
HEBEI UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a nano-multilayer transparent conductive film to solve the problem that the existing silver-based multilayer transparent conductive film is difficult to simultaneously take into account good conductivity and high light transmittance

Method used

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  • A kind of nanometer multilayer transparent conductive film
  • A kind of nanometer multilayer transparent conductive film
  • A kind of nanometer multilayer transparent conductive film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] The specific preparation steps of the nano-multilayer transparent conductive film of the present embodiment 1 are as follows:

[0028] Step 1: Use a 100 μm thick polyethylene terephthalate (PET) film as a flexible transparent substrate, clean the PET substrate ultrasonically with acetone, ethanol, and deionized water, and dry it with N 2 Blow dry and bake in the oven at 60°C for 10 minutes.

[0029] Step 2: Place the PET substrate cleaned in step 1 on the substrate table of the vacuum chamber of the radio frequency magnetron sputtering equipment. The radio frequency magnetron sputtering equipment is pre-installed with ITO targets, and the ITO targets are made of In 2 o 3 and 3wt% Sn composition. Use a mechanical pump and a molecular pump to pump the vacuum of the magnetron sputtering equipment cavity to 5.0×10 -4 After Pa is lower than 30 sccm of argon and oxygen mixed gas, the percentage of oxygen is 0.5%, the pressure is adjusted to 0.7 Pa, the frequency of RF po...

Embodiment 2

[0042] The specific preparation steps of the multilayer transparent conductive film of the present embodiment are as follows:

[0043] Step 1: Use a 100 μm thick PET film as the substrate, clean the PET substrate ultrasonically with acetone, ethanol, and deionized water, and dry it with N 2 Blow dry and bake in the oven at 60°C for 10 minutes. Then the PET substrate is put into the cavity of the multi-target radio frequency magnetron sputtering thin film deposition equipment, which is pre-loaded with ITO (by In 2 o 3 and 3wt% Sn), high-purity Cu and Ag targets, and each layer of the nano-multilayer transparent conductive film is prepared by radio frequency magnetron sputtering technology, and the frequency of the radio frequency power supply for sputtering is 13.56 MHz.

[0044] Step 2: Use a mechanical pump and a molecular pump to pump the vacuum of the chamber of the magnetron sputtering equipment to 5.0×10 -4 Pa, and then 30 sccm of argon and oxygen gas mixture (oxygen...

Embodiment 3

[0055] The substrate used as a multilayer transparent conductive film can also be a substrate on which a functional layer is deposited, such as Image 6 as shown, Image 6 The substrate 1 of the multilayer transparent conductive film shown in is PET / ITO / BPhen:Cs coated with organic light-emitting diode functional layer 2 CO 3 / TPBi / TPBi:ir(ppy) 3 / TCTA / MoO 3 substrate, and on the substrate 1, an ITO layer, CuO x layer, Ag layer and ITO layer.

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Abstract

The invention provides a nanometer multi-layer transparent conducting thin film. According to the nanometer multi-layer transparent conducting thin film, at least one dual layer is deposited on a substrate, and the dual layer comprises a weak copper oxide (CuOx) layer and a continuous ultrathin silver layer which is located on the CuOx layer and is in contact with the CuOx layer. The atomic percent x of oxygen to copper in the CuOx layer is larger than 0 and smaller than and equal to 20%. The thickness of the CuOx layer ranges from 0.5 nm to 3 nm, and the thickness of the silver layer ranges from 2 nm to 10 nm. Compared with a traditional transparent conducting thin film, the nanometer multi-layer structure transparent conducting thin film has high light transmissivity and low specific resistance and surface roughness and is used as a transparent electrode of a solar cell, a touch screen and other photoelectric devices so that the performance can be improved. The temperature needed when the nanometer multi-layer transparent conducting thin film is prepared is low, high-quality preparation of the film can be achieved at the room temperature based on the vacuum coating technology, and large-area low-cost production can be achieved conveniently based on the winding type thin film preparation technology.

Description

technical field [0001] The invention relates to the field of functional thin film materials and thin film optoelectronic devices, in particular to a nanometer multilayer transparent conductive film. Background technique [0002] Transparent conductive films have both optical transparency and conductivity, and can be widely used in solar cells, light-emitting diodes, and touch screens, and have been a research hotspot in recent years. At present, the widely used transparent conductive films mainly include transparent conductive oxide (TCO) films such as indium tin oxide (ITO) and aluminum-doped zinc oxide (AZO), but they also have some obvious disadvantages, such as mechanical flexibility is usually relatively low. Poor, high-quality films need to be prepared at a substrate temperature above 200°C, and the work function is not easy to adjust. In order to solve these problems and meet the ever-changing development needs of optoelectronic devices, it is imperative to develop n...

Claims

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Application Information

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Patent Type & AuthorityPatents(China)
IPC IPC(8): C23C14/35C23C14/30C23C14/08C23C14/18C23C28/00
CPCC23C14/0036C23C14/086C23C14/087C23C14/18C23C14/30C23C14/35C23C28/322C23C28/345
Inventor路万兵于威蒋树刚杨彦斌王春生刘海旭傅广生
OwnerHEBEI UNIVERSITY