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Lining step tube and porous baffle composite type multi-level magnetic field arc ion plating method

A technology of arc ion plating and porous baffles, which is applied in the field of material surface treatment, can solve the problems of low arc plasma transmission efficiency and large particle defects, so as to avoid large particle defects, improve crystal structure and stress state, and improve transmission efficiency Effect

Active Publication Date: 2017-05-17
ZHENGZHOU UNIVERSITY OF AERONAUTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the traditional arc ion plating method using low-melting point pure metal or multi-element alloy material and non-metallic material (such as graphite) as the target material, which is easy to produce large particle defects, and the arc plasma transmission efficiency caused by the curved magnetic filter technology. Low-level problems, combined with the multi-stage magnetic field filtering method and the combination of the shape and structure of the lined positive bias stepped tube and porous baffle composite device, the mechanical barrier shielding and the composite effect of positive bias electric field attraction, while ensuring arc plasma The body passes through a multi-stage magnetic field filter device with a high transmission efficiency and a composite device lined with a positive bias stepped tube and a porous baffle, so that the surface of the workpiece can be continuously and densely prepared with a high-quality film when a negative bias is applied, and at the same time realize To control the addition of elements in the film, reduce the production cost of using an alloy target, improve the deposition efficiency of the film, and reduce the adverse effects of large particle defects on the growth and performance of the film, a multi-stage compound lined with stepped tubes and porous baffles is proposed. Magnetic field arc ion plating method

Method used

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  • Lining step tube and porous baffle composite type multi-level magnetic field arc ion plating method
  • Lining step tube and porous baffle composite type multi-level magnetic field arc ion plating method
  • Lining step tube and porous baffle composite type multi-level magnetic field arc ion plating method

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specific Embodiment approach 1

[0015] Specific embodiment one: the following combination figure 1 , figure 2 , image 3 and Figure 4 This embodiment will be described. The device used in the multi-stage magnetic field arc ion plating method of the composite type lined with stepped tubes and porous baffles in this embodiment includes a bias power supply 1, an arc power supply 2, an arc ion plating target source 3, and a multistage magnetic field device. 4. Multi-stage magnetic field power supply 5, compound device lined with positive bias step tube and porous baffle 6, positive bias power supply 7, sample stage 8, bias power waveform oscilloscope 9 and vacuum chamber 10;

[0016] The method includes the following steps:

[0017] Step 1. Place the workpiece of the substrate to be processed on the sample stage 8 in the vacuum chamber 10, lined with a positive bias step tube and a porous baffle composite device 6 and the vacuum chamber 10 and the multi-stage magnetic field device 4. And the sample stage 8...

specific Embodiment approach 2

[0026] Embodiment 2: The difference between this embodiment and Embodiment 1 is that the method further includes:

[0027] Step 3: The pure metal thin film can be prepared by combining traditional DC magnetron sputtering, pulsed magnetron sputtering, traditional arc ion plating and pulse cathode arc with DC bias, pulse bias or DC pulse compound bias for film deposition , Compound ceramic films with different element ratios, functional films and high-quality films with nano-multilayer or gradient structure.

specific Embodiment approach 3

[0028] Embodiment 3: The difference between this embodiment and Embodiment 2 is that steps 1 to 3 are repeatedly performed to prepare multilayer structure films with different stress states, microstructures and element ratios. Others are the same as Embodiment 2.

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Abstract

The invention discloses a lining step tube and porous baffle composite type multi-level magnetic field arc ion plating method and belongs to the technical field of material surface treatment. The method aims at solving the problems that the inner wall of a tube is contaminated by macroparticles and deposited ions in a multi-level magnetic field filter device, and losses are caused in the arc plasma transmission process. The method comprises the steps of putting a workpiece to be subjected to film coating onto a sample table in a vacuum chamber, switching on a relevant power source, and starting an external water cooling system; and 2, conducting thin film deposition, wherein after the vacuum degree inside the vacuum chamber is lower than 10<-4> Pa, working gas is introduced, the air pressure is adjusted, a film coating power source is switched on, meanwhile, arc plasma at an outlet is sucked through a grid bias power source, energy adjustment is conducted, defects of the macroparticles are effectively eliminated and arc plasma transmission efficiency is guarantee through the blocking and shielding effect of the shape and structure combination of a lining positive bias step tube and porous baffle composite type device, the inhibition effect of a positive bias electric field and the filtration effect of multiple levels of magnetic fields, process parameters are set, and a thin film is prepared.

Description

technical field [0001] The invention relates to a composite multi-stage magnetic field arc ion plating method of a lined stepped tube and a porous baffle, and belongs to the technical field of material surface treatment. Background technique [0002] In the process of preparing thin films by arc ion plating, the current density of arc spot is as high as 2.5~5×10 10 A / m 2 , causing molten liquid metal to appear at the arc spot position on the surface of the target, sputtering out in the form of droplets under the action of local plasma pressure, attached to the surface of the film or embedded in the film to form "macroparticles" (Macroparticles) Defects (BoxmanR L, Goldsmith S. Macroparticle contamination in cathodic arc coatings: generation, transport and control [J]. Surf Coat Tech, 1992, 52(1): 39-50.). In arc plasma, since the moving speed of electrons is much greater than that of ions, the number of electrons reaching the surface of large particles per unit time is gre...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32
CPCC23C14/325
Inventor 魏永强宗晓亚陈小霞侯军兴张华阳刘源刘学申蒋志强冯宪章
Owner ZHENGZHOU UNIVERSITY OF AERONAUTICS
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