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Black silicon solar cell and preparation method therefor

A technology of solar cells and black silicon, applied in the field of solar cells, can solve the problems of narrow solar spectrum absorption range and low photoelectric conversion rate, achieve good surface properties, strong light absorption performance, and improve the effect of effective separation

Inactive Publication Date: 2017-10-20
RESEARCH INSTITUTE OF TSINGHUA UNIVERSITY IN SHENZHEN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the passivation layer currently used has a very narrow absorption range for the solar spectrum and a low photoelectric conversion rate.

Method used

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  • Black silicon solar cell and preparation method therefor
  • Black silicon solar cell and preparation method therefor
  • Black silicon solar cell and preparation method therefor

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preparation example Construction

[0016] The invention provides a method for preparing a black silicon solar cell, comprising the steps of:

[0017] Prepare black silicon substrate;

[0018] Sequential deposition of BiFeO on black silicon substrate 3 thin film and ITO thin film.

[0019] According to a specific embodiment of the present invention, the preparation of a black silicon substrate includes the following steps:

[0020] Etching the silicon wafer with a mixed solution of sodium hydroxide and isopropanol to form a silicon wafer with a disordered pyramid structure;

[0021] Depositing silver nanoparticles on the silicon wafer with a disordered pyramid structure, etching the silicon wafer deposited with silver nanoparticles with a mixed solution of hydrogen fluoride and hydrogen peroxide, and then removing the silver nanoparticles with a mixed solution of hydrogen peroxide and ammonia water, A black silicon substrate was obtained.

[0022] According to a specific embodiment of the present invention, ...

Embodiment 1

[0060] Gently rub the surface of the silicon wafer with a commercially available household detergent to roughly remove oil and particles from the surface of the silicon wafer. Put the roughly cleaned silicon wafer into acetone, ethylene glycol, professional cleaning agent, and deionized water for 10 minutes for ultrasonic cleaning, and then dry it with nitrogen gas for later use.

[0061] Put the cleaned and dried silicon wafer into a 20% NaOH solution by mass, corrode it at 85°C for 1 min, remove the surface damage layer, wash it with deionized water and dry it with nitrogen gas for later use.

[0062] The polished silicon wafer was etched with a mixed solution of 1.8% NaOH and 4.8% isopropanol at 83° C. for 35 min to form a silicon wafer with a disordered pyramid structure.

[0063] Deposit silver nanoparticles on a silicon wafer with a disordered pyramid structure, and then use a mixed solution of 10% hydrogen fluoride and 2% hydrogen peroxide to etch the silicon wafer at r...

Embodiment 2

[0071] The preparation method adopted in this embodiment 2 is basically the same as that of embodiment 1, the difference is that the mixed solution of sodium hydroxide and isopropanol used is a mass fraction of 1% sodium hydroxide and 4% isopropanol solution mix. Further, etching is performed by using the mixed solution of 15% hydrogen fluoride and 3% hydrogen peroxide, and the etching time is 1 min.

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Abstract

The invention provides a preparation method for a black silicon solar cell, and the method comprises the following steps: preparing a black silicon substrate; sequentially depositing a BiFeO3 film and an ITO film on the black silicon substrate. According to the invention, the black silicon substrate is higher in light absorption performances after the BiFeO3 / ITO composite film is deposited. The deposition of the BiFeO3 / ITO composite film improves the effective separation of photon-generated carriers of the cell, thereby improving the spectrum response in a short-wave region of the black silicon cell, and improving the comprehensive performances of the cell.

Description

technical field [0001] The invention relates to the field of solar cells, in particular to a black silicon solar cell and a preparation method thereof. Background technique [0002] At present, the photovoltaic industry is still dominated by crystalline silicon solar cells. In order to improve the absorption of incident light by solar cells, commercial monocrystalline and polycrystalline silicon wafers generally use surface texture treatment, and their light absorption rates in the visible light range can reach 88%. And about 80%, but the reflectivity of the battery surface is still high, especially in the ultraviolet and infrared bands. The researchers found that the surface treatment of crystalline silicon can further reduce the reflectivity of light, and the surface of the obtained silicon wafer is black, also known as "black silicon (black silicon)". For visible light, black silicon can basically absorb all of it. In view of the good absorption properties of black sili...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18H01L31/0216
CPCH01L31/02167H01L31/1868Y02E10/50Y02P70/50
Inventor 檀满林刘荣跃周丹丹田勇王沚舟
Owner RESEARCH INSTITUTE OF TSINGHUA UNIVERSITY IN SHENZHEN
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