Transient voltage suppressor (TVS) chip and manufacturing method
A technology of transient voltage suppression and manufacturing method, applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc., can solve problems such as the inability to meet the production requirements of high-voltage chips above 400V, and improve anti-surge capability and reliability.  , Improve the pressure resistance performance, increase the effect of the structure
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[0023] Embodiment 1: with reference to attached figure 1 and 2 A method for manufacturing a transient voltage suppressor (TVS) chip is further described in detail.
[0024] Pre-diffusion treatment: N-type single crystal silicon wafers are used as raw materials, and the surface of the silicon wafers is chemically treated through acid, alkali, deionized water ultrasonic cleaning and other processes.
[0025] Oxidation: grow a layer of oxide layer on the silicon wafer that has been pre-diffused in an oxidation furnace at 1100-1200 °C.
[0026] Photolithography: Apply gluing, exposure, development, and deoxidation to the oxidized silicon wafer, and engrave a diffusion pattern on the front side in one direction.
[0027] Phosphorus deposition in single-sided open tubes. The single-sided open-tube ammonium dihydrogen phosphate aqueous source deposition process is adopted. The high-purity ammonium dihydrogen phosphate powder is dissolved in deionized water to form an aqueous solut...
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