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Preparation method of direct alcohol fuel cell anode catalytic material

A technology for fuel cells and catalytic materials, applied in battery electrodes, metal material coating processes, circuits, etc., can solve the problems of loss of catalytic effect, high price of precious metal materials, and inability to be widely used in direct alcohol fuel cells, etc. Production efficiency, good contact effect

Inactive Publication Date: 2018-05-01
SHENYANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the high catalytic performance and stability of noble metal materials, Pt, Pd noble metals and their alloys are currently mainly used as anode catalytic materials for direct alcohol fuel cells, but on the one hand, the scarcity and high price of Pt and Pd noble metals make noble metal materials It cannot be widely used in direct alcohol fuel cells. On the other hand, in the process of catalytic oxidation, these anode catalytic materials tend to absorb CO and lose their catalytic effect.

Method used

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  • Preparation method of direct alcohol fuel cell anode catalytic material
  • Preparation method of direct alcohol fuel cell anode catalytic material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] 1) Choose a Si(100) single wafer as the substrate, first cut the large silicon substrate into small square pieces of 20×20mm, clean the substrate with absorbent cotton, wipe off the impurities adsorbed on the surface of the substrate, and then use Ultrasonic cleaning with acetone, alcohol and distilled water for 20 minutes, after drying, put it into a vacuum chamber to prepare for depositing a film;

[0018] 2) The target material is Cu 60 Zr 34 Ti 1 Ni 5 , The bottom of the target is flat and in good contact with the target, which can ensure maximum heat dissipation.

[0019] 3) The deposition film equipment adopts the magnetron sputtering coating system, and the target material is Cu 60 Zr 34 Ti 1 Ni 5 Align the Si substrate at the upper center, and evacuate the vacuum chamber to 3×10 before depositing the film. -4 Pa, and then pass high-purity argon. Precisely control the opening time of the baffle on the target by computer to deposit palladium film and copp...

Embodiment 2

[0022] 1) Choose a Si(100) single wafer as the substrate, first cut the large silicon substrate into small square pieces of 20×20mm, clean the substrate with absorbent cotton, wipe off the impurities adsorbed on the surface of the substrate, and then use Ultrasonic cleaning with acetone, alcohol and distilled water for 20 minutes, after drying, put it into a vacuum chamber to prepare for depositing a film;

[0023] 2) The target material is Cu 60 Zr 34 Ti 3 Ni 3 , The bottom of the target is flat and in good contact with the target, which can ensure maximum heat dissipation.

[0024] 3) The deposition film equipment adopts the magnetron sputtering coating system, and the target material is Cu 60 Zr 34 Ti 3 Ni 3 Align the Si substrate at the upper center, and evacuate the vacuum chamber to 3×10 before depositing the film. -4 Pa, and then pass high-purity argon. Precisely control the opening time of the baffle on the target by computer to deposit palladium film and copp...

Embodiment 3

[0027] 1) Choose a Si(100) single wafer as the substrate, first cut the large silicon substrate into small square pieces of 20×20mm, clean the substrate with absorbent cotton, wipe off the impurities adsorbed on the surface of the substrate, and then use Ultrasonic cleaning with acetone, alcohol and distilled water for 20 minutes, after drying, put it into a vacuum chamber to prepare for depositing a film;

[0028] 2) The target material is Cu 60 Zr 34 Ti 1 Ni 5 , The bottom of the target is flat and in good contact with the target, which can ensure maximum heat dissipation.

[0029] 3) The deposition film equipment adopts the magnetron sputtering coating system, and the target material is Cu 60 Zr 34 Ti 1 Ni 5Align the Si substrate at the upper center, and evacuate the vacuum chamber to 3×10 before depositing the film. -4 Pa, and then pass high-purity argon. Precisely control the opening time of the baffle on the target by computer to deposit palladium film and coppe...

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Abstract

The invention provides a preparation method of a direct alcohol fuel cell anode catalytic material and relates to catalytic material preparation methods. The method comprises the following steps of selecting a Si(100) single crystal wafer as a base body, drying the Si(100) single crystal wafer, and putting the Si(100) single crystal wafer into a vacuum chamber for depositing a film; selecting Cu<60>Zr<34>Ti<x>Ni<6-x>(x=1,2,3,4 and 5) as a target material, wherein the bottom of the target material is smooth, is in good contact with a target position and can guarantee maximum heat dissipation; selecting a magnetron sputtering coating system as a film deposition device, allowing the target material Cu<60>Zr<34>Ti<x>Ni<6-x> to be aligned with the Si base body located at the center above, vacuumizing the vacuum chamber to 3*10<-4> Pa before film deposition and then introducing high-purity argon to obtain a Cu<60>Zr<34>Ti<x>Ni<6-x> amorphous alloy film. The preparation method is used for preparing the high-electrocatalytic-property, high-stability and low-cost through magnetron sputtering deposition. Through the magnetron sputtering coating system, the precision and the working efficiency are both improved, and the preparation method provides the possibility for continuous operation of a production line.

Description

technical field [0001] The invention relates to a catalytic material and a preparation method, in particular to a preparation method of an anode catalytic material of a direct alcohol fuel cell. Background technique [0002] Since the 21st century, human beings have relied on energy more than ever in their lives, so energy issues are a huge challenge facing society today. With the increasing consumption of fossil fuels and decreasing reserves, energy shortages and environmental pollution have become important factors restricting the development of the global economy. Therefore, clean energy with the characteristics of high efficiency, sustainable development and low (zero) emission has become one of the research hotspots of researchers in various countries today. Researchers have made extensive explorations in finding new energy sources, and clean energy sources such as direct alcohol fuel cells, wind power and solar cells have attracted more and more research. [0003] Di...

Claims

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Application Information

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IPC IPC(8): C23C14/16C23C14/35H01M4/88H01M4/90
CPCC23C14/165C23C14/35H01M4/8871H01M4/9041Y02E60/50
Inventor 马国峰张鸿龄贺春林
Owner SHENYANG UNIV
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