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Preparation method of novel water-based light-cured resin

A light-curable resin, water-based technology, applied in the field of preparation of new water-based light-curable resin, can solve the problems that polymer chains cannot be chemically cross-linked, reduce the drying rate of water-based resin, limit the cross-linking density of cured film, etc., and achieve high hardness , good reactivity, anti-polymerization effect

Active Publication Date: 2018-07-27
JIANGSU KUANGSHUN PHOTOSENSITIVITY NEW MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method uses N-methylpyrrolidone or N-ethylpyrrolidone, a high-boiling point organic solvent, which will not only reduce the drying rate of the water-based resin, but also have a greater toxic effect on the human body.
[0006] In addition, these methods usually introduce acrylate groups at the end of the molecular chain, and the middle of the polymer chain cannot be chemically cross-linked, thereby limiting the cross-linking density of the cured film and limiting the improvement of mechanical properties.

Method used

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  • Preparation method of novel water-based light-cured resin
  • Preparation method of novel water-based light-cured resin

Examples

Experimental program
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Embodiment 1

[0037] The preparation method of novel aqueous photocurable resin in the present embodiment is as follows:

[0038] 1. Synthesis of diacrylate-monomethacrylate monomer

[0039] Weigh and mix 71.1g of glycidyl methacrylate and 36g of acrylic acid, add 0.21g of N,N-dimethylbenzylamine, slowly raise the temperature to 95°C until the acid value drops below 5mg KOH / g; Add 70mL of dichloromethane and 55.7g of triethylamine, add 49.8g of acryloyl chloride dropwise under a nitrogen atmosphere and an ice-water bath, the dropwise addition is completed within 1 hour, and then react at room temperature for 12 hours; remove the generated hydrochloride by filtration, and use Washed three times with saturated sodium bicarbonate solution, dried over anhydrous magnesium sulfate, filtered, and evaporated to dryness to obtain diacrylate-monomethacrylate monomer, 3-(methacryloyloxy)propyl-1,2- Diacrylate.

[0040] 2. Synthesis of thiourethane acrylate prepolymer

[0041] Under nitrogen atmospher...

Embodiment 2

[0048] The preparation method of novel aqueous photocurable resin in the present embodiment is as follows:

[0049] 1. Synthesis of diacrylate-monomethacrylate monomer

[0050] Weigh 85.7g of 4-glycidyloxybutyl methacrylate and 28.8g of acrylic acid and mix them, add 0.55g of triethylamine, slowly heat up to 95°C and react until the acid value drops below 5mg KOH / g; Add 60mL of dichloromethane and 81.5g of tri-n-decanine amine, dropwise add 39.8g of acryloyl chloride under nitrogen atmosphere and ice-water bath, dropwise add within 1 hour, then react at room temperature for 12 hours; remove the formed hydrochloride by filtration, Washed three times with saturated sodium bicarbonate solution, dried over anhydrous magnesium sulfate, filtered, and evaporated to dryness to obtain diacrylate-monomethacrylate monomer, 3-(methacryloyloxybutoxy)propyl- 1,2-Diacrylate.

[0051] 2. Synthesis of thiourethane acrylate prepolymer

[0052] Under a nitrogen atmosphere and an ice-water bat...

Embodiment 3

[0056] The preparation method of novel aqueous photocurable resin in the present embodiment is as follows:

[0057] 1. Synthesis of diacrylate-monomethacrylate monomer

[0058] Weigh 78.5g of 3,4-epoxycyclohexylmethyl methacrylate and 28.8g of acrylic acid and mix them, add 0.31g of tri-n-butylamine, slowly heat up to 95°C and react until the acid value drops below 5mg KOH / g; Add 60mL of dichloromethane and 44.5g of triethylamine to the reaction solution, add 39.8g of acryloyl chloride dropwise under a nitrogen atmosphere and an ice-water bath, and the dropwise addition is completed within 1 hour, and then react at room temperature for 12 hours; remove the generated hydrochloric acid by filtration salt, washed three times with saturated sodium bicarbonate solution, dried over anhydrous magnesium sulfate, filtered, and evaporated to dryness to obtain a diacrylate-monomethacrylate monomer, 3,4-diacryloyloxycyclohexyl methacrylate methyl ester.

[0059] 2. Synthesis of thiouret...

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Abstract

The invention discloses a preparation method of novel water-based light-cured resin. Firstly, metacrylic acid ester containing epoxy groups respectively reacts with acrylic acid and acryloyl chlorideto synthetize diacrylate-monomethyl acrylic ester monomers; then, polyisocyanates react with dithiols at room temperature to obtain a sulfo-polyurethane prepolymer with sulfydryl at the tail end; then, the prepolymer reacts with the diacrylate-monomethyl acrylic ester monomers and the dithiols; finally, hydrophilic groups are introduced by mercaptan carboxylic acid; a sulfo-polyurethane acrylic ester prepolymer is obtained; after a neutralizing agent is used for neutralization, deionized water is added for high-speed dispersion; a water-based light-cured resin dispersoid is obtained. The preparation method has the advantages that the reaction conditions are mild; the conversion rate is high; the gelling reaction of acrylic ester double bonds can be effectively prevented; a large number ofpolymerizable groups exist on the macromolecular chain lateral group, so that the crosslinking density can be effectively improved; a curing membrane with excellent performance is obtained.

Description

technical field [0001] The invention relates to a preparation method of a novel water-based photocurable resin, which uses the addition reaction of mercapto groups, isocyanates and double bonds to prepare photocurable resins that are dispersible in water, and belongs to the field of water-based photocurable resins. Background technique [0002] Water-based resin uses water as a solvent, avoiding the use of organic solvents, eliminating the risk of fire during construction and reducing air pollution; coating tools can be cleaned with water, greatly reducing the consumption of cleaning solvents. Due to the advantages of low content of volatile organic compounds (VOC) and environmental protection, water-based resins are more and more widely used in the fields of coatings and inks. [0003] Water-based photocurable resin is a kind of resin that can undergo chemical crosslinking under ultraviolet light irradiation obtained by using water-based resin synthesis technology. This typ...

Claims

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Application Information

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IPC IPC(8): C08G18/67C08G18/32
CPCC08G18/3876C08G18/673
Inventor 谢寒李有明刘文成温名辉
Owner JIANGSU KUANGSHUN PHOTOSENSITIVITY NEW MATERIAL
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