Supercharge Your Innovation With Domain-Expert AI Agents!

Method for preparing column spacer

一种间隔物、柱状的技术，应用在制备柱状间隔物领域，能够解决间隔物部分临界尺寸增加、光屏蔽效应缓和等问题，达到简单且高效制造、临界尺寸减小的效果

Inactive Publication Date: 2018-07-31
ROHM & HAAS ELECTRONICS MATERIALS KOREA LTD
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the case of using the colored photosensitive resin composition to manufacture a columnar spacer having a height difference (a black columnar spacer in which the columnar spacer and a black matrix are integrated into one module), the boundary of the stepped portion having the height difference therebetween The light-shielding effect of the cone angle due to the light-shielding material may be moderated, resulting in an increase in the critical dimension of the spacer part

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing column spacer
  • Method for preparing column spacer
  • Method for preparing column spacer

Examples

Experimental program
Comparison scheme
Effect test

preparation example 1

[0156] Preparation Example 1: Preparation of Copolymer

[0157] Into a 500 mL round bottom flask equipped with a reflux condenser and stirrer was charged 100 g of a monomer mixture having the following component ratios: 51 mol % N-phenylmaleimide, 4 mol % styrene , 10 mole % of 4-hydroxybutyl acrylate glycidyl ether and 35 mole % of methacrylic acid, 300 g of PGMEA as solvent and 2 g of 2,2'-azobis(2,4- Dimethylvaleronitrile). Then, the reaction temperature was raised to 70° C., and the reaction mixture was stirred for 5 hours to obtain a copolymer having a solid content of 31% by weight. The copolymer thus prepared had an acid value of 100 mgKOH / g and a polystyrene reference weight average molecular weight (Mw) of 20,000 as measured by gel permeation chromatography.

preparation Embodiment 2

[0158] Preparation Example 2: Compounds Derived from Epoxy Resin Compounds Having a Cardo Main Chain Structure

[0159]

[0160] Step (1): Preparation of 9,9-bis[4-(glycidyloxy)phenyl]fluorene

[0161] Add 200 g of toluene, 125.4 g of 4,4'-(9-fluorenylidene)diphenol and 78.6 g of epichlorohydrin into a 3000 mL three-necked round bottom flask, and raise the temperature to 40° C. under stirring to obtain a solution. 0.1386 g of tert-butylammonium bromide and 50% aqueous NaOH (3 equiv) were mixed in a vessel, and the mixture was slowly added to the resulting solution with stirring.

[0162] The reaction mixture thus obtained was heated to 90° C. for 1 hour to completely remove 4,4′-(9-fluorenylene)diphenol, which was confirmed by HPLC or TLC. The reaction mixture was cooled to 30°C, and 400 mL of dichloromethane and 300 mL of 1N HCl were added thereto with stirring. Then, the organic layer was separated, washed with 300 mL of distilled water two or three times, dried over ...

preparation example 3

[0167] Preparation Example 3: Preparation of Colored Dispersion Liquid

[0168] 8 g of the copolymer obtained in Preparation Example 1 above, 8 g of a polymer dispersant (DISPERBYK-2000, BYK Co.), 12 g of carbon black, 53 g of lactam black as organic black (Black 582, BASF Co.), 16 g of C.I pigment Blue 15:6 and 384 g of PGMEA as solvent were dispersed at room temperature for 6 hours using a paint shaker. This dispersion step was performed with 0.3 mm zirconia beads. After the dispersion step was completed, the beads were separated from the dispersion using a filter, thereby yielding a colored dispersion having a solids content of 23% by weight.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
visible light transmittanceaaaaaaaaaa
wavelengthaaaaaaaaaa
acid valueaaaaaaaaaa
Login to View More

Abstract

The present invention relates to a method for preparing a column spacer, and is characterized in using a mask including first, second, and third patterns having different light transmittance. In addition, according to the method for preparing a column spacer of the present invention, a taper angle between a matrix part and a spacer part may increase during manufacturing a column spacer in which the matrix part and the spacer part are continuously connected, and critical dimension of the spacer part may decrease. Therefore, a column spacer with fine patterns may be simply and efficiently manufactured.

Description

technical field [0001] The present invention relates to a method for the preparation of a columnar spacer by increasing the taper angle between the matrix portion and the spacer portion and by reducing the spacer The critical dimension can easily obtain fine patterns. Background technique [0002] Recently, in order to always maintain a gap between upper and lower transparent substrates, a spacer formed using a photosensitive resin composition is used in a liquid crystal cell of a liquid crystal display (LCD). LCDs are electro-optical devices driven by applying a voltage to a liquid crystal material injected into a constant gap between two transparent substrates, where it is very critical to maintain the gap between the two substrates constantly. If the gap between the transparent substrates is not constant, the voltage applied to the portion where the gap is not constant and the transmittance of light passing through the portion may vary, resulting in a defect of spatially...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1339G02F1/13
CPCG02F1/13394G02F1/1303G03F7/0007G03F7/027G03F7/0388G03F1/50G02F1/13398G02F1/1339G02F2202/022
Inventor 金莲玉朴锡凤崔庆植李秀敏
Owner ROHM & HAAS ELECTRONICS MATERIALS KOREA LTD
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com