A low-temperature reactive sputtering deposition of nano-α-al 2 o 3 coating method

A technology of sputtering deposition and low-temperature reaction, which is applied in coating, sputtering coating, metal material coating process, etc., can solve the problems of coating deposition and film cracking, and achieve low deposition temperature, low cutting heat, Effective control of thermal stress

Inactive Publication Date: 2020-09-25
SOUTH CHINA UNIV OF TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the physical vapor deposition (PVD) method can deposit alumina coating at low temperature, it is difficult to use amorphous, γ-Al 2 o 3 A series of metastable phases are dominant, and a series of crystal transformations occur at high temperatures until finally stable α-Al is formed. 2 o 3 , accompanied by a large volume change and leading to film cracking
At present, it is difficult to deposit single-phase α-Al on the surface of substrates such as high-speed steel and cemented carbide by PVD method at low temperature. 2 o 3 coating

Method used

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  • A low-temperature reactive sputtering deposition of nano-α-al <sub>2</sub> o <sub>3</sub> coating method
  • A low-temperature reactive sputtering deposition of nano-α-al <sub>2</sub> o <sub>3</sub> coating method

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] (1) α-Al 2 O 3 15wt.% Al / α-Al 2 O 3 The composite material is cut into the target size required for RF magnetron sputtering, and installed in the corresponding target station in the RF magnetron sputtering system;

[0032] (2) Select Si(100) as the substrate, cut it into a size of 10×10mm, grind and polish the coating surface to a mirror surface, and place it in an anhydrous alcohol solution for ultrasonic cleaning for 15 minutes to remove oil, and place it on the sample table after drying. , adjust the distance between the target and the sample to 100mm;

[0033] (3) After pre-pumping the low vacuum to below 10Pa, turn on the vacuum heating and baking system, set the baking temperature at 120℃, and then pump to the background vacuum of 5×10 -4 Pa, charge Ar gas into the deposition chamber and adjust the throttle valve until the vacuum degree returns to 10~20Pa, after stabilizing for 10min, open the throttle valve, and then pump it to 5×10 -4 The background vacuum ...

Embodiment 2

[0039] (1) α-Al 2 O 3 20wt.% Al / α-Al 2 O 3 The composite material is cut into the target size required for RF magnetron sputtering, and installed in the corresponding target station of RF magnetron sputtering;

[0040] (2) Select W6Mo5Cr4V2 high-speed steel as the substrate, cut it into Φ10×5mm size, after conventional quenching + 560℃ (3 times) tempering, grind and polish the coating surface, and place it in anhydrous alcohol solution for ultrasonic cleaning for 15min Remove oil, place it on the sample table after drying, and adjust the distance between the target and the sample to be 100mm;

[0041] (3) After pre-pumping the low vacuum to below 10Pa, turn on the vacuum heating and baking system, set the baking temperature at 120℃, and then pump to the background vacuum of 5×10 -4 Pa, charge Ar gas into the deposition chamber and adjust the throttle valve until the vacuum degree returns to 10~20Pa, after stabilizing for 10min, open the throttle valve, and then pump it to ...

Embodiment 3

[0047] (1) α-Al 2 O 3 20wt.% Al / α-Al 2 O 3 The composite material is cut into the target size required for RF magnetron sputtering, and installed in the corresponding target station of RF magnetron sputtering;

[0048] (2) Select W6Mo5Cr4V2 high-speed steel as the substrate, cut it into Φ10×5mm size, after conventional quenching + 560℃ (3 times) tempering, grind and polish the coating surface, and place it in anhydrous alcohol solution for ultrasonic cleaning for 15min Remove oil, put it on the sample table after drying, and adjust the distance between the target and the sample to be 100mm;

[0049] (3) After pre-pumping the low vacuum to below 10Pa, turn on the vacuum heating and baking system, set the baking temperature at 120℃, and then pump to the background vacuum of 5×10 -4 Pa, charge Ar gas into the deposition chamber and adjust the throttle valve until the vacuum degree returns to 10~20Pa, after stabilizing for 10min, open the throttle valve, and then pump it to 5×...

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Abstract

The invention belongs to the technical field of metal oxide coatings and discloses a method for low-temperature reactive sputtering deposition of a nanometer alpha-Al2O3 coating. The method comprisesthe following steps: manufacturing Al powder and alpha-Al2O3 powder into a composite material through a powder metallurgy method; after cutting the composite material to reach the size required for equipment, mounting the composite material of the required size on a target station for radio frequency magnetron sputtering as a deposition target material, and mounting a workpiece substrate on a sample table in a deposition cavity; after removing residual steam in the deposition cavity, vacuumizing to achieve base pressure, and then injecting a gas mixture of Ar and O2 for pre-oxidation treatment; and adjusting the partial pressure of O2 in the gas mixture of Ar and O2 to reach the range of 15% to 25%, adjusting the temperature of the workpiece substrate to reach the range of 550 DEG C to 750DEG C, starting a radio frequency magnetron sputtering film coating system, and starting reactive deposition so as to obtain the nanometer alpha-Al2O3 coating. The nanometer alpha-Al2O3 coating obtained through the method disclosed by the invention is of a nanocrystalline structure, is high in toughness, can be firmly combined with the workpiece substrate, and has a stable alpha-phase structure at relatively low temperature.

Description

technical field [0001] The invention belongs to the technical field of metal oxide coatings, and in particular relates to a low-temperature reactive sputtering deposition nano-α-Al 2 O 3 method of coating. Background technique [0002] The machining industry is developing rapidly in the direction of high-speed, automation and precision, which puts forward higher and higher requirements for machining tools. More than 90% of the cutting tools used in today's high-precision machine tools are coated tools, and most of the tool coating materials are carbides of transition metals (such as high-speed steel, cemented carbide, etc.) and nitrides (such as titanium nitride, carbon, etc.). Titanium nitride, etc.), although the hardness is very high, in high-speed machining, the high temperature caused by friction between the tool and the workpiece can reach 700-1000 ° C, the carbon and nitrogen coatings on the cutting edge are easily oxidized, and the material to be processed is easil...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/08
CPCC23C14/0036C23C14/081C23C14/3414C23C14/35
Inventor 邱万奇程奕天杨宇王书林周克崧代明江
Owner SOUTH CHINA UNIV OF TECH
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