6 results about "Reactive deposition" patented technology

This invention discloses a multiphase reactive deposition apparatus and a method for analyzing gallium oxide growth behavior. The method includes: meshing a pre-constructed three-dimensional geometric model of a horizontal reaction chamber to obtain a mesh file; importing the mesh file into fluid dynamics simulation software, setting boundary conditions, and obtaining a physical model; constructing a computational model based on the flow motion of gallium acetylacetonate droplets, vaporization phase transition, gas-phase oxidation reaction, and the deposition process of reaction products on the substrate surface; selecting a multiphase flow solver based on the physical and computational models; inputting material and control parameters into the multiphase flow solver to obtain simulation results; and obtaining α-Ga₂O₃ growth behavior analysis results based on the constructed multiphase reaction coupling model and simulation results. The multiphase reaction coupling model is used to calculate the mutual influence between physical fields. The method provided by this invention can predict gallium oxide growth behavior, providing support for optimizing deposition process parameters and improving thin film growth uniformity.

Methods of modifying properties of a cellulosic material include depositing an additive onto the cellulosic material, the additive being in a vapor phase and configured to modify one or more properties of the cellulosic material and adsorbing the additive into the cellulosic material, wherein the additive reacts with one or more functional groups of the cellulosic material. The depositing can be an atomic layer deposition of the additive onto the cellulosic material. The additive can be configured to react with a nucleophile in the cellulosic material. One or more properties of the cellulosic material can include hydrophobicity, thermal conductivity, thermal diffusivity, fungo-toxicity, toxicity, wettability, tensile strength, corrosiveness, biodegradability, bio-toxicity, or swelling.

This invention discloses a superhydrophobic composite passivation film and its preparation method, belonging to the field of coating preparation technology. The invention involves sequentially forming a zirconium-based chemical conversion film and a fluorinated functionalized silica layer on a substrate surface to obtain the superhydrophobic composite passivation film. The zirconium-based chemical conversion film and the fluorinated functionalized silica layer are connected by Si-O-Zr or Si-O-Al covalent bonds. The zirconium-based chemical conversion film is obtained by deposition through dissociation coordination and interfacial redox reactions using fluorozirconate, fluoride, vanadate, and manganese nitrate as raw materials; the fluorinated functionalized silica layer is obtained by spraying nano-silica after fluorination and functionalization with perfluorosilane. This invention organically couples an inorganic passivation film with a superhydrophobic micro / nano structure, resulting in a superhydrophobic composite passivation film with a static water contact angle ≥150° and a static oil contact angle ≥150°, achieving dual repulsion of water and oil, and reducing the emission of volatile organic compounds during the preparation process.

The application relates to the technical field of chemical vapor deposition, and discloses a device for forming a silicon carbide coating on the surface of a graphite product, which comprises a gas feeding assembly, and the gas feeding assembly comprises an outer shell, the inside of the outer shell is coaxially sleeved with an inner shell, two protection assemblies are arranged on the outer shell, one end of each of the two protection assemblies is communicated with the space between the outer shell and the inner shell, and a movable assembly is movably sleeved between the outer shell and the inner shell. When the device works, reaction gas is transported into the inner shell through a gas feeding pipe, and protective gas is transported into the outer shell through the first protection assembly, so that the reaction gas discharged from the inner shell is surrounded and protected by the protective gas discharged from the outer shell, the contact between the reaction gas just discharged from the gas feeding assembly and the hot gas in the outer shell is reduced, the instantaneous heating effect of the reaction gas is weakened, the reaction deposition phenomenon of the exhaust port of the inner shell is reduced, and the plugging probability of the exhaust port of the inner shell is reduced.

This invention discloses the preparation of phase change microcapsules with energy storage and photothermal conversion properties and their application in thermal insulation coatings. It relates to the field of microencapsulated phase change materials technology, including core-shell structured microcapsules prepared with organic phase change materials as the core and copper silicate as the shell, with a core-to-shell mass ratio of 1:0.5–1.5. This invention employs an in-situ interfacial reaction deposition method, constructing an oil-water two-phase emulsion template, and with the assistance of an emulsifier, allowing inorganic precursors to undergo a chemical precipitation reaction at the interface to form a continuous and dense inorganic copper silicate shell. These microcapsules not only utilize phase change materials such as paraffin to achieve high-density thermal energy storage, but also leverage the efficient photothermal conversion and photocatalytic degradation characteristics of the copper silicate shell to achieve an integrated design of photothermal conversion, anti-pollution, and thermal energy storage. These phase change microcapsules exhibit excellent temperature buffering and energy storage performance, demonstrating a good thermal barrier effect and active thermal regulation capability in coatings, and have broad application prospects in building energy conservation, solar thermal collection, and thermal protection.

A method for the reactive deposition of crystalline, aluminum-polar or nitrogen-polar layers containing or consisting of AlN onto a foreign substrate is provided. In this method, a magnetron sputtering unit is provided, the foreign substrate is heated to a temperature of < 800 °C, a pulsed electrical voltage with a duty cycle of <1 is applied between a magnetron and the foreign substrate, and the magnitude of the applied pulsed electrical voltage, the duty cycle, and / or the amount of nitrogenous gas supplied to the vacuum chamber from a gas source are regulated based on the concentration of aluminum and nitrogen atoms in the vacuum chamber, determined by a detector, such that a metallic operating point or a reactive operating point is established.Furthermore, a system is provided that is configured for the reactive deposition of crystalline, aluminium-polar or nitrogen-polar layers containing or consisting of AlN onto a foreign substrate.