Method for low-temperature reactive sputtering deposition of nanometer alpha-Al2O3 coating

A technology of sputtering deposition and low-temperature reaction, which is applied in coating, sputtering coating, metal material coating process, etc., can solve the problems of coating deposition and film cracking, and achieve low deposition temperature, low cutting heat, The effect of low cutting resistance

Inactive Publication Date: 2018-08-17
SOUTH CHINA UNIV OF TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the physical vapor deposition (PVD) method can deposit alumina coating at low temperature, it is difficult to use amorphous, γ-Al 2 o 3 A series of metastable phases are dominant, and a series of crystal transformations occur at high temperatures until finally sta

Method used

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  • Method for low-temperature reactive sputtering deposition of nanometer alpha-Al2O3 coating
  • Method for low-temperature reactive sputtering deposition of nanometer alpha-Al2O3 coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] (1) α-Al 2 o 3 15wt.% Al / α-Al 2 o 3 The composite material is cut into the target size required by RF magnetron sputtering, and installed in the corresponding target station in the RF magnetron sputtering system;

[0032] (2) Choose Si(100) as the substrate, cut it into 10×10mm size, grind and polish the coating surface to the mirror surface, and put it in absolute alcohol solution for ultrasonic cleaning for 15min to remove oil, dry it and put it on the sample stage , adjust the distance between the target and the sample to 100mm;

[0033] (3) After pre-pumping the vacuum to below 10Pa, turn on the vacuum heating and baking system, set the baking temperature at 120°C, and then pump to the background vacuum of 5×10 -4 Pa, fill the deposition chamber with Ar gas and adjust the throttle valve until the vacuum degree returns to 10-20 Pa, open the throttle valve after stabilizing for 10 minutes, and then pump to 5×10 -4 Pa background vacuum;

[0034] (4) Turn off the ...

Embodiment 2

[0039] (1) α-Al 2 o 3 20wt.% Al / α-Al 2 o 3 The composite material is cut into the target size required by radio frequency magnetron sputtering, and installed in the corresponding target station of radio frequency magnetron sputtering;

[0040] (2) Choose W6Mo5Cr4V2 high-speed steel as the substrate, cut it into Φ10×5mm size, after conventional quenching + 560°C (3 times) tempering, grind and polish the coating surface, and put it in anhydrous alcohol solution for ultrasonic cleaning for 15min After degreasing, put it on the sample stage after drying, and adjust the distance between the target and the sample to be 100mm;

[0041] (3) After pre-pumping the vacuum to below 10Pa, turn on the vacuum heating and baking system, set the baking temperature at 120°C, and then pump to the background vacuum of 5×10 -4 Pa, fill the deposition chamber with Ar gas and adjust the throttle valve until the vacuum degree returns to 10-20 Pa, open the throttle valve after stabilizing for 10 m...

Embodiment 3

[0047] (1) α-Al 2 o 3 20wt.% Al / α-Al 2 o 3 The composite material is cut into the target size required by radio frequency magnetron sputtering, and installed in the corresponding target station of radio frequency magnetron sputtering;

[0048] (2) Choose W6Mo5Cr4V2 high-speed steel as the substrate, cut it into Φ10×5mm size, after conventional quenching + 560°C (3 times) tempering, grind and polish the coating surface, and put it in anhydrous alcohol solution for ultrasonic cleaning for 15min Remove the oil, put it on the sample stage after drying, and adjust the distance between the target and the sample to be 100mm;

[0049] (3) After pre-pumping the vacuum to below 10Pa, turn on the vacuum heating and baking system, set the baking temperature at 120°C, and then pump to the background vacuum of 5×10 -4 Pa, fill the deposition chamber with Ar gas and adjust the throttle valve until the vacuum degree returns to 10-20 Pa, open the throttle valve after stabilizing for 10 min...

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Abstract

The invention belongs to the technical field of metal oxide coatings and discloses a method for low-temperature reactive sputtering deposition of a nanometer alpha-Al2O3 coating. The method comprisesthe following steps: manufacturing Al powder and alpha-Al2O3 powder into a composite material through a powder metallurgy method; after cutting the composite material to reach the size required for equipment, mounting the composite material of the required size on a target station for radio frequency magnetron sputtering as a deposition target material, and mounting a workpiece substrate on a sample table in a deposition cavity; after removing residual steam in the deposition cavity, vacuumizing to achieve base pressure, and then injecting a gas mixture of Ar and O2 for pre-oxidation treatment; and adjusting the partial pressure of O2 in the gas mixture of Ar and O2 to reach the range of 15% to 25%, adjusting the temperature of the workpiece substrate to reach the range of 550 DEG C to 750DEG C, starting a radio frequency magnetron sputtering film coating system, and starting reactive deposition so as to obtain the nanometer alpha-Al2O3 coating. The nanometer alpha-Al2O3 coating obtained through the method disclosed by the invention is of a nanocrystalline structure, is high in toughness, can be firmly combined with the workpiece substrate, and has a stable alpha-phase structure at relatively low temperature.

Description

technical field [0001] The invention belongs to the technical field of metal oxide coatings, in particular to a low-temperature reactive sputtering deposition of nano-α-Al 2 o 3 Coating method. Background technique [0002] The rapid development of the machining industry in the direction of high speed, automation, and precision has put forward higher and higher requirements for the cutting tools used in processing. More than 90% of the cutting tools used in today's high-precision machine tools are coated tools, and the tool coating materials are mostly carbides of transition metals (such as high-speed steel, hard alloys, etc.) and nitrides (such as titanium nitride, carbon carbide, etc.) Titanium nitride, etc.), although the hardness is very high, but in high-speed machining, the high temperature generated by the friction between the tool and the workpiece can reach 700-1000 ° C, and the carbon and nitrogen coating on the blade is easy to oxidize, and the material to be pr...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/08
CPCC23C14/0036C23C14/081C23C14/3414C23C14/35
Inventor 邱万奇程奕天杨宇王书林周克崧代明江
Owner SOUTH CHINA UNIV OF TECH
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