Method for low-temperature reactive sputtering deposition of nanometer alpha-Al2O3 coating
A technology of sputtering deposition and low-temperature reaction, which is applied in coating, sputtering coating, metal material coating process, etc., can solve the problems of coating deposition and film cracking, and achieve low deposition temperature, low cutting heat, The effect of low cutting resistance
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Embodiment 1
[0031] (1) α-Al 2 o 3 15wt.% Al / α-Al 2 o 3 The composite material is cut into the target size required by RF magnetron sputtering, and installed in the corresponding target station in the RF magnetron sputtering system;
[0032] (2) Choose Si(100) as the substrate, cut it into 10×10mm size, grind and polish the coating surface to the mirror surface, and put it in absolute alcohol solution for ultrasonic cleaning for 15min to remove oil, dry it and put it on the sample stage , adjust the distance between the target and the sample to 100mm;
[0033] (3) After pre-pumping the vacuum to below 10Pa, turn on the vacuum heating and baking system, set the baking temperature at 120°C, and then pump to the background vacuum of 5×10 -4 Pa, fill the deposition chamber with Ar gas and adjust the throttle valve until the vacuum degree returns to 10-20 Pa, open the throttle valve after stabilizing for 10 minutes, and then pump to 5×10 -4 Pa background vacuum;
[0034] (4) Turn off the ...
Embodiment 2
[0039] (1) α-Al 2 o 3 20wt.% Al / α-Al 2 o 3 The composite material is cut into the target size required by radio frequency magnetron sputtering, and installed in the corresponding target station of radio frequency magnetron sputtering;
[0040] (2) Choose W6Mo5Cr4V2 high-speed steel as the substrate, cut it into Φ10×5mm size, after conventional quenching + 560°C (3 times) tempering, grind and polish the coating surface, and put it in anhydrous alcohol solution for ultrasonic cleaning for 15min After degreasing, put it on the sample stage after drying, and adjust the distance between the target and the sample to be 100mm;
[0041] (3) After pre-pumping the vacuum to below 10Pa, turn on the vacuum heating and baking system, set the baking temperature at 120°C, and then pump to the background vacuum of 5×10 -4 Pa, fill the deposition chamber with Ar gas and adjust the throttle valve until the vacuum degree returns to 10-20 Pa, open the throttle valve after stabilizing for 10 m...
Embodiment 3
[0047] (1) α-Al 2 o 3 20wt.% Al / α-Al 2 o 3 The composite material is cut into the target size required by radio frequency magnetron sputtering, and installed in the corresponding target station of radio frequency magnetron sputtering;
[0048] (2) Choose W6Mo5Cr4V2 high-speed steel as the substrate, cut it into Φ10×5mm size, after conventional quenching + 560°C (3 times) tempering, grind and polish the coating surface, and put it in anhydrous alcohol solution for ultrasonic cleaning for 15min Remove the oil, put it on the sample stage after drying, and adjust the distance between the target and the sample to be 100mm;
[0049] (3) After pre-pumping the vacuum to below 10Pa, turn on the vacuum heating and baking system, set the baking temperature at 120°C, and then pump to the background vacuum of 5×10 -4 Pa, fill the deposition chamber with Ar gas and adjust the throttle valve until the vacuum degree returns to 10-20 Pa, open the throttle valve after stabilizing for 10 min...
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