Cleaning liquid used for surface treatment of black silicon battery sheet

A surface treatment and cell technology, applied in the field of cleaning solution, can solve the problem of ineffective cleaning of black silicon cells, and achieve the effects of increasing cleanliness, reducing enterprise costs, and improving product yield.

Inactive Publication Date: 2018-09-21
JIANGSU RONGMA NEW ENERGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a cleaning solution for the surface treatment of black silicon

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] A cleaning solution for the surface treatment of black silicon cells, which is prepared by mixing perfluorocarboxylic acid, ethylene glycol, 8-hydroxyquinoline, sodium hexametaphosphate, cationic polyacrylamide and deionized water. The mass percentages are: perfluorocarboxylic acid 20%, ethylene glycol 25%, 8-hydroxyquinoline 3%, sodium hexametaphosphate 5%, cationic polyacrylamide 7%, deionized water 40%.

[0027] Add the cleaning solution prepared by the above formula into the ultrasonic cleaning machine, put the black silicon cell into the ultrasonic cleaning tank and soak for 20 minutes, then ultrasonically clean for 15-20 minutes, after cleaning, wash it with deionized water 2-3 times, hot air dry.

Embodiment 2

[0029] A cleaning solution for the surface treatment of black silicon cells, which is prepared by mixing tetrafluoroethylene, ethanol, triethanolamine, carboxymethyl cellulose, hexadecyl trimethyl quaternary ammonium bromide and deionized water. The mass percent of each raw material is: tetrafluoroethylene 25%, ethanol 20%, triethanolamine 5%, carboxymethyl cellulose 4%, cetyl trimethyl quaternary ammonium bromide 8%, deionized water 38%.

[0030] Add the cleaning solution prepared by the above formula into the ultrasonic cleaning machine, put the black silicon cell into the ultrasonic cleaning tank and soak for 20 minutes, then ultrasonically clean for 15-20 minutes, after cleaning, wash it with deionized water 2-3 times, hot air dry.

Embodiment 3

[0032] A cleaning solution for the surface treatment of black silicon cells, consisting of hydrofluoric acid, benzyl alcohol, n-butanol, sodium sulfide, copper reagent, carboxymethyl cellulose, hexadecyl trimethyl quaternary ammonium bromide, It is prepared by mixing octadecyl dimethyl benzyl quaternary ammonium chloride and deionized water. The mass percentage of each raw material is: hydrofluoric acid 25%, benzyl alcohol 12%, n-butanol 15%, sodium sulfide 3% , copper reagent 3%, carboxymethyl cellulose 5%, cetyl trimethyl quaternary ammonium bromide 6%, octadecyl dimethyl benzyl quaternary ammonium chloride 8%, deionized water 23%.

[0033] Add the cleaning solution prepared by the above formula into the ultrasonic cleaning machine, put the black silicon cell into the ultrasonic cleaning tank and soak for 20 minutes, then ultrasonically clean for 15-20 minutes, after cleaning, wash it with deionized water 2-3 times, hot air dry.

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PUM

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Abstract

The invention discloses cleaning liquid used for surface treatment of a black silicon battery sheet. The cleaning liquid is prepared from, by mass, 8-25% of fluorine compound, 5-30% of alcohol additive, 2-6% of complexing agent, 4-15% of dispersant, 5-10% of surfactant and 14-76% of deionized water, and made by mixing the materials. According to the provided cleaning liquid used for surface treatment of the black silicon cell sheet, metal contaminants on the surface of the black silicon battery sheet are rapidly decomposed, spots on the surface of the silicon sheet can be efficiently removed,the cleanliness of the surface of the black silicon battery sheet is greatly improved, correspondingly the yield of texture surface making of the black silicon battery sheet is increased, and the quality of texture surface making of the black silicon battery sheet is improved. At the same time, the product yield of an enterprise is increased, and the cost of the enterprise is reduced.

Description

technical field [0001] The invention relates to a cleaning solution, in particular to a cleaning solution for surface treatment of black silicon cells. Background technique [0002] In layman's terms, the black silicon cell is to make the silicon wafer black, and the silicon wafer is still the original silicon wafer. A layer of paint is applied on the surface to greatly reduce the reflection, so that the silicon wafer looks black. The method of making is to brush the coating to make the surface have bumps one by one. The main component of the coating is silicon dioxide. We look at the existing silicon cells, they are all blue, and there are grids on them. Such silicon cells have been passivated. The purpose of passivation is to reduce reflection and remove dangling bonds, but we still look blue. Color, bright, so black silicon is much better than the existing passivation. Existing passivations require stringent temperature requirements, as well as vacuum. [0003] This bl...

Claims

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Application Information

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IPC IPC(8): C11D1/52C11D1/62C11D1/645C11D3/04C11D3/06C11D3/20C11D3/22C11D3/24C11D3/28C11D3/30C11D3/60
CPCC11D1/52C11D1/008C11D1/62C11D1/645C11D3/042C11D3/046C11D3/06C11D3/201C11D3/2017C11D3/2034C11D3/2044C11D3/225C11D3/226C11D3/245C11D3/28C11D3/30C11D11/0047
Inventor 朱姚培蒋健唐磊王磊赵江华
Owner JIANGSU RONGMA NEW ENERGY
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