Cleaning liquid used for surface treatment of black silicon battery sheet
A surface treatment and cell technology, applied in the field of cleaning solution, can solve the problem of ineffective cleaning of black silicon cells, and achieve the effects of increasing cleanliness, reducing enterprise costs, and improving product yield.
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Embodiment 1
[0026] A cleaning solution for the surface treatment of black silicon cells, which is prepared by mixing perfluorocarboxylic acid, ethylene glycol, 8-hydroxyquinoline, sodium hexametaphosphate, cationic polyacrylamide and deionized water. The mass percentages are: perfluorocarboxylic acid 20%, ethylene glycol 25%, 8-hydroxyquinoline 3%, sodium hexametaphosphate 5%, cationic polyacrylamide 7%, deionized water 40%.
[0027] Add the cleaning solution prepared by the above formula into the ultrasonic cleaning machine, put the black silicon cell into the ultrasonic cleaning tank and soak for 20 minutes, then ultrasonically clean for 15-20 minutes, after cleaning, wash it with deionized water 2-3 times, hot air dry.
Embodiment 2
[0029] A cleaning solution for the surface treatment of black silicon cells, which is prepared by mixing tetrafluoroethylene, ethanol, triethanolamine, carboxymethyl cellulose, hexadecyl trimethyl quaternary ammonium bromide and deionized water. The mass percent of each raw material is: tetrafluoroethylene 25%, ethanol 20%, triethanolamine 5%, carboxymethyl cellulose 4%, cetyl trimethyl quaternary ammonium bromide 8%, deionized water 38%.
[0030] Add the cleaning solution prepared by the above formula into the ultrasonic cleaning machine, put the black silicon cell into the ultrasonic cleaning tank and soak for 20 minutes, then ultrasonically clean for 15-20 minutes, after cleaning, wash it with deionized water 2-3 times, hot air dry.
Embodiment 3
[0032] A cleaning solution for the surface treatment of black silicon cells, consisting of hydrofluoric acid, benzyl alcohol, n-butanol, sodium sulfide, copper reagent, carboxymethyl cellulose, hexadecyl trimethyl quaternary ammonium bromide, It is prepared by mixing octadecyl dimethyl benzyl quaternary ammonium chloride and deionized water. The mass percentage of each raw material is: hydrofluoric acid 25%, benzyl alcohol 12%, n-butanol 15%, sodium sulfide 3% , copper reagent 3%, carboxymethyl cellulose 5%, cetyl trimethyl quaternary ammonium bromide 6%, octadecyl dimethyl benzyl quaternary ammonium chloride 8%, deionized water 23%.
[0033] Add the cleaning solution prepared by the above formula into the ultrasonic cleaning machine, put the black silicon cell into the ultrasonic cleaning tank and soak for 20 minutes, then ultrasonically clean for 15-20 minutes, after cleaning, wash it with deionized water 2-3 times, hot air dry.
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