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Preparation method of titanium dioxide nanorod array film

A nanorod array and titanium dioxide technology, which is applied in the field of hydrophobic surface preparation, can solve the problems of cumbersome preparation and achieve the effects of shortened preparation process, low shape and size requirements, and simple materials

Inactive Publication Date: 2018-10-19
XI AN JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the preparation of self-cleaning surfaces is often cumbersome, usually through a series of preparation methods to construct a rough micro-nano composite structure and then through chemical modification.

Method used

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  • Preparation method of titanium dioxide nanorod array film

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preparation example Construction

[0023] See figure 1 , A method for preparing titanium dioxide nanorod array film, including the following steps:

[0024] Step 1. Chemical cleaning is performed on the surface of the substrate material to be processed;

[0025] Step 2: Use radio frequency plasma to clean the surface of the substrate material;

[0026] Step 3: Deposit a layer of titanium film on the surface of the substrate using vacuum magnetron sputtering deposition technology;

[0027] Step 4: Heat the plated titanium film layer in a vacuum tube high-temperature sintering furnace to complete the preparation of the titanium dioxide nanorod array film with self-cleaning and hydrophobic properties.

[0028] When performing RF plasma cleaning on the surface of the substrate material in step 2, the background vacuum of the magnetron sputtering chamber is 5×10 -4 Pa~7×10 -4 Pa, access to H 2 And Ar 2 Mixed gas, H in the mixed gas 2 And Ar 2 The volume ratio is 4 to 96; the airflow is 20sccm~40sccm, the air pressure is 1Pa~...

Embodiment 1

[0033] Such as figure 1 As shown, a preparation of the surface of titanium dioxide nanorods with self-cleaning and hydrophobic properties includes the following steps: Step 1, cleaning the surface of the aluminum nitride ceramic plate, first soaking in absolute ethanol for 2 hours, and then placing it in an oven at 120°C for drying Bake for 5 minutes, then in an acetone solution at 50Hz ultrasonic cleaning for 10min, then in absolute ethanol at 50Hz ultrasonic cleaning for 10min, and finally put it in an oven at 120°C for 30min;

[0034] Step 2. Put the cleaned sample into the magnetron sputtering chamber, the vacuum of the chamber -4 At Pa; pass the mixed gas (4%H 2 ,96% Ar 2 ), the airflow is 30sccm, the pressure in the chamber is adjusted to 2Pa, the radio frequency power is 80W, and the radio frequency plasma sputtering is 30min;

[0035] Step 3. Use the chamber sample baffle to shield the aluminum nitride ceramic substrate, adjust the pressure in the chamber to 0.3Pa, and use ...

Embodiment 2

[0038] Such as figure 1 As shown, the preparation of a titanium dioxide nanorod array film with self-cleaning and hydrophobic properties includes the following steps: Step 1, cleaning the surface of the aluminum nitride ceramic plate, first soaking in absolute ethanol for 2 hours, and then placing it in an oven at 120°C Bake for 5 minutes, then in an acetone solution at 50Hz ultrasonic cleaning for 10min, then in anhydrous ethanol at 50Hz ultrasonic cleaning for 10min, and finally put it in an oven at 120°C for 30min;

[0039] Step 2. Put the cleaned sample into the magnetron sputtering chamber, the vacuum of the chamber -4 At Pa; pass the mixed gas (4%H 2 ,96% Ar 2 ), the airflow is 30sccm, the pressure in the chamber is adjusted to 2Pa, the radio frequency power is 80W, and the radio frequency plasma sputtering is 30min;

[0040] Step 3. Use the chamber sample baffle to shield the aluminum nitride ceramic substrate, adjust the pressure in the chamber to 0.3Pa, and use a DC power ...

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Abstract

The invention discloses a preparation method of a titanium dioxide nanorod array film. The preparation method comprises the following steps of: chemically cleaning a substrate material, then cleaningthe substrate material by using radio frequency plasmas, afterwards, depositing a titanium film layer on the substrate by using a magnetron sputtering technology, and carrying out heat treatment to obtain the titanium dioxide nanorod array film with the self-cleaning hydrophobic property. Compared with the prior art, the preparation method greatly simplifies the preparation flow of the titanium dioxide nanorod array film with the hydrophobic property, is low in cost, short in preparation cycle, is energy-saving and environmental-protection and widens the application range of the titanium dioxide film.

Description

Technical field [0001] The invention belongs to the field of hydrophobic surface preparation, and particularly relates to a method for preparing a titanium dioxide nanorod array film. Background technique [0002] Titanium dioxide nanomaterials have the advantages of high chemical stability, excellent photoelectric performance, long service life, and high refractive index. They have huge application prospects in the fields of biological materials, photosensitive sensors, and solar cells. At present, the main methods for preparing titanium dioxide nanomaterials are liquid-phase chemical methods, including water / solvothermal methods, sol-gel methods, and sonochemical methods. The application number is CN200810118107.0 provides a kind of substrate coated with seed crystals is immersed in a titanium salt solution containing inorganic salt, and a titanium dioxide nanorod array is grown on the surface of the substrate at a constant temperature of 30-100°C, and then the substrate is tak...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/18C23C14/02C23C14/58B82Y40/00
Inventor 宋忠孝张宏凯李雁淮
Owner XI AN JIAOTONG UNIV
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