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a ws x /me/a-c/me nanometer multilayer structure solid lubricating film and preparation method thereof

A nano-multilayer, solid lubrication technology, applied in coating, metal material coating process, vacuum evaporation plating, etc., can solve the problem of low friction coefficient and wear rate, insufficient anti-oxidation and wear resistance, hardness and bonding force Low friction factor, improved anti-oxidation performance, and low cost

Active Publication Date: 2020-05-22
ZHEJIANG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The present invention is in order to overcome existing WS x / a-C multilayer film has low hardness and bonding force, insufficient oxidation resistance and wear resistance in humid atmosphere, and provides a WS with excellent oxidation resistance, high bearing capacity, low friction coefficient and wear rate x / Me / a-C / Me nano multi-layer structure film material

Method used

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  • a ws <sub>x</sub> /me/a-c/me nanometer multilayer structure solid lubricating film and preparation method thereof
  • a ws <sub>x</sub> /me/a-c/me nanometer multilayer structure solid lubricating film and preparation method thereof
  • a ws <sub>x</sub> /me/a-c/me nanometer multilayer structure solid lubricating film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1W

[0045] Embodiment 1WS x Preparation of / Ti / a-C / Ti nano-layer solid lubricating film

[0046] (1) Pretreatment of the substrate: Soak the polished single-crystal silicon wafer (with an orientation of ) in a hydrofluoric acid solution with a volume fraction of 10% for 10 minutes, then ultrasonically clean it with acetone and absolute ethanol for 15 minutes each , then dry it and quickly put it into the sputtering chamber;

[0047] (2) Experiment preparation: the WS 2 The target, Ti target and graphite target are fixed on the corresponding target stage, and the base distance of the target is adjusted to 70mm. After the inspection is correct, close the sputtering chamber and pump the background vacuum to 1.0×10 -3 Below Pa, heat the substrate to 200°C and keep it warm, then pass in argon gas, adjust the deposition pressure to 1.0Pa, add a DC bias voltage to -100V, and start the autorotation motor;

[0048] (3) Preparation of Ti transition layer: first keep the substrate away fr...

Embodiment 2W

[0050] Embodiment 2WS x Preparation of / Cr / a-C / Cr Nano Multilayer Structure Solid Lubricating Film

[0051] (1) Substrate pretreatment: After the polished low-carbon steel sheet is degreased and the oxide layer is removed, it is placed in distilled water for ultrasonic cleaning for 10 minutes, then air-dried and placed in the sputtering chamber;

[0052] (2) Experiment preparation: the WS 2 The target, Cr target and graphite target are fixed on the corresponding target stage, and the base distance of the target is adjusted to 70mm. After the inspection is correct, close the sputtering chamber and evacuate the background vacuum to 1.0×10 -3 Below Pa, heat the substrate to 200°C and keep it warm, then pass in argon gas, adjust the deposition pressure to 1.0Pa, add a DC bias voltage to -100V, and start the autorotation motor;

[0053] (3) Preparation of the Cr transition layer: first keep the substrate away from the Cr target, turn on the sputtering power of the Cr target, then...

Embodiment 3W

[0055] Embodiment 3WS x Preparation of / Ti / a-C / W nano-layered solid lubricating film

[0056] (1) substrate pretreatment: with the step (1) in the embodiment 1;

[0057] (2) Experiment preparation: the WS 2 The target, Ti target, W target and graphite target are fixed on the corresponding target stage, and the target base distance is adjusted to 70mm. After checking, close the sputtering chamber and pump the background vacuum to 1.0×10 -3 Below Pa, heat the substrate to 200°C and keep it warm, then pass in argon gas, adjust the deposition pressure to 1.0Pa, add a DC bias voltage to -100V, and start the autorotation motor;

[0058] (3) Preparation of Ti transition layer: with step (3) in embodiment 1;

[0059] (4)WS x / Ti / a-C / W multilayer films: During transition layer deposition, ignition of WS 2 target and graphite target. After the deposition of the transition layer is completed, start the program and control the substrate to stay in the WS 2 Directly above the target...

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Abstract

The invention relates to the technical field of material frictional wear and solid lubrication, in particular to a WSx / Me / a-C / Me nanometer multi-layer structure solid lubricating film and a preparation method thereof. The solid lubricating film comprises a matrix (1), a metal transition layer (2) and a nanometer multi-layer film (3); the nanometer multi-layer film is of a layered structure formedby a plurality of nanometer composite units; each nanometer composite unit comprises a WSx layer (4), a metal layer (5), an amorphous carbon film layer (6) and a metal sublayer (7); and the materialsof the metal layer and the metal sublayer are identical or different. The solid lubricating film provided by the invention has excellent oxidation resistance, is relatively low in friction coefficient, excellent in carrying capacity and wear resistance, relatively good in combination state with the matrix, long in service life, simple in preparation technology, liable to control deposition process, low in cost and safe in preparation process without pollution, can be applied to lubrication protective films on the surfaces of components and parts in the machinery field and has a wide application prospect.

Description

technical field [0001] The invention relates to the technical field of material friction and wear and solid lubrication, in particular to a WS x / Me / a-C / Me (Metal, abbreviated as Me) nanometer multilayer structure solid lubricating film and its preparation method. Background technique [0002] Under vacuum and dry atmospheric conditions, WS 2 The film can form a transfer film with a small friction coefficient under the action of a weak shear force, so as to achieve the effect of friction reduction and lubrication, so it is widely used in low temperature and aerospace and other fields. However, pure WS 2 The film has low hardness, loose structure, internal porosity, O 2 and H 2 O is easy to diffuse into the interior of the film, causing it to quickly absorb moisture and oxidize to fail. [0003] To improve WS 2 Thin Film Properties, Researcher at WS 2 Doping non-metal elements (such as C, N) or metal elements (such as Ag, Cr, Ni, Ti, etc.) in the film can improve the m...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/06C23C14/18C23C14/34
CPCC23C14/0605C23C14/0623C23C14/185C23C14/3464
Inventor 杨芳儿王贡启郑晓华龚润泽杨烁妍刘涛
Owner ZHEJIANG UNIV OF TECH
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