Method for forming amorphous carbon film on surface of plastic substrate
A plastic substrate, amorphous carbon film technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of easy failure of a-C film, poor plastic surface adhesion, peeling, etc., to improve the function The effect of chemical protection applications
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Embodiment 1
[0029] (1) The plastic matrix material is low-density polyethylene (LDPE). Grind and polish the purchased disc-shaped LDPE substrate with a diameter of 12mm and a thickness of 2mm with sandpaper, remove the burrs around the sample, and pre-clean it with a detergent, dry it naturally, and then ultrasonically clean it with absolute ethanol for 5-15 minutes, and dry it naturally stand-by;
[0030] (2) Fix the cleaned and dried LDPE substrate sample on the turret in the vacuum deposition chamber of the deposition equipment; use an ohmmeter to detect the insulation between the turret and the base surface of the vacuum chamber, and the carbon target and the base surface of the vacuum chamber; The vacuum degree of the inner foundation is less than 5.0×10 -3 Pa;
[0031] (3) Turn on the turret to rotate counterclockwise, pass in argon gas of 30-60 sccm, turn on the anode layer ion beam source, its working voltage is 500-1500V, argon plasma is generated by argon glow discharge, turn ...
Embodiment 2
[0035] (1) The plastic matrix material is ultra-high molecular weight polyethylene (UHMWPE). The disc-shaped UHMWPE plastic substrate with a diameter of 12mm and a thickness of 2mm was polished with sandpaper to remove the burrs around the sample, and pre-cleaned with a detergent. dry and ready to use;
[0036] (2) Fix the cleaned and dried UHMWPE substrate sample on the turret in the vacuum deposition chamber of the deposition equipment; use an ohmmeter to test the insulation between the turret and the base surface of the vacuum chamber, and the carbon target and the base surface of the vacuum chamber; The vacuum degree of the inner foundation is less than 5.0×10 -3 Pa;
[0037] (3) Turn on the turret to rotate counterclockwise, pass in argon gas of 30-60 sccm, turn on the anode layer ion beam source, its working voltage is 500-1500V, argon plasma is generated by argon glow discharge, turn on the bias power supply, the bias voltage 300~1200V, argon plasma pretreats the sur...
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