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Flexible nitride thin film solar cell and manufacturing method thereof

A solar cell and manufacturing method technology, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of heavy device structure, product damage, and complicated processes, and achieve high energy conversion efficiency, light weight, and high absorption coefficient. Effect

Pending Publication Date: 2019-12-10
紫石能源有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] In the prior art, the existing nitride thin-film solar cells usually use the inorganic crystal substrate as the substrate, and keep the inorganic crystal substrate with high weight in use, but the device structure produced in this way has the disadvantages of heavy weight, The shortcomings of being unable to bend and stretch. In addition, in order to meet the requirements of the electrode, it is usually necessary to remove the excess part during the manufacturing process, resulting in a cumbersome process and easy to cause unnecessary damage to the product.

Method used

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  • Flexible nitride thin film solar cell and manufacturing method thereof
  • Flexible nitride thin film solar cell and manufacturing method thereof
  • Flexible nitride thin film solar cell and manufacturing method thereof

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Experimental program
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Embodiment 1

[0094] The flexible nitride thin film solar cell described in the first embodiment is composed of a support substrate 600, a back electrode 500, a dielectric reflection layer 400, a nitride epitaxial layer 330, a front electrode 200 and an antireflection layer 100 from bottom to top, And the via structure 510 penetrates through the supporting substrate and reaches the inside of the back electrode 500 . Wherein, the supporting substrate 600 is made of polyethylene terephthalate (PET); the dielectric reflection layer 400 is made of insulating ink.

[0095] Further, the back electrode 500 is an ohmic contact electrode composed of multi-layer metal thin film functional layers, and according to the direction from the nitride epitaxial layer 330 to the support substrate 600, it includes: an adhesion layer 520, an electrode reflective layer 530, a first preliminary Stress layer 540 , barrier layer 550 and conductive layer 560 . Wherein, the adhesive layer 520 is made of metal Ni thi...

Embodiment 2

[0101] The second embodiment discloses a method for making the flexible nitride thin film solar cell as described in the first embodiment, which further refines the above-mentioned preparation method into the following steps:

[0102]Step 1, such as Figure 4 As shown, a graphene sacrificial layer 320 is prepared on a 4H-SiC substrate wafer 310;

[0103] Step 2, such as Figure 5 As shown, on the sacrificial layer 320, a nitride epitaxial layer 330 having a thin-film solar cell structure as described in Embodiment 1 or Embodiment 2 is grown;

[0104] Step 3, such as Figure 6 As shown, a dielectric reflective layer 400 is formed on the nitride epitaxial layer 330;

[0105] Step 4, such as Figure 7 As shown, the back electrode 500 is made on the dielectric reflective layer 400 and the nitride epitaxial layer 330, and at the same time, the back electrode 500 is used as the first prestressed layer;

[0106] Step 5, such as Figure 8 As shown, the second prestressed layer 7...

Embodiment 3

[0121] Embodiment 3 discloses another method for manufacturing the flexible nitride thin-film solar cell as described in Embodiment 1. It should be noted that, in the manufacturing method described in the third embodiment, the same parts as the method described in the second embodiment will not be repeated, and only the different parts will be described in detail.

[0122] Specifically, the method further refines the preparation method into the following steps:

[0123] Step 1, such as Figure 4 As shown, a graphene sacrificial layer 320 is prepared on a 6H-SiC substrate wafer 310;

[0124] Step 2, such as Figure 5 As shown, on the sacrificial layer 320, a nitride epitaxial layer 330 having a thin-film solar cell structure as described in Embodiment 1 or Embodiment 2 is grown;

[0125] Step 3, such as Figure 6 As shown, a dielectric reflective layer 400 is formed on the nitride epitaxial layer 330;

[0126] Step 4, such as Figure 7 As shown, the back electrode 500 is ...

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Abstract

The invention relates to the technical field of photovoltaic cells and manufacturing thereof, in particular to a flexible nitride thin film solar cell and a manufacturing method thereof. The cell comprises a support substrate, a back electrode, a nitride epitaxial layer and a front electrode which are sequentially arranged from bottom to top. The back electrode comprises a first pre-stress layer.According to the manufacturing method, the back electrode with the first pre-stress layer is prepared on the upper surface of a substrate wafer, wherein the back electrode is provided with the first pre-stress layer; then the support substrate is fixed on the upper surface of the back electrode; and the nitride epitaxial layer and the sacrificial layer are separated by mechanical stripping and thefront electrode and an anti-reflection layer are sequentially prepared on the separated nitride epitaxial layer. The cell has high absorption coefficient and energy conversion rate and light weight and can be bent and can extend. The back electrode of the cell can be used as a pre-stress strengthening layer which can reinforce the battery structure and provide sufficient stripping stress during preparation without removing the pre-stress strengthening layer after the cell is manufactured.

Description

technical field [0001] The invention relates to the field of photovoltaic cells and manufacturing technology, in particular to a flexible nitride thin-film solar cell and a manufacturing method. Background technique [0002] In recent years, on the one hand, indium gallium nitride (In x Ga 1-x N,0≤x≤1), indium aluminum nitrogen (In y Al 1-y N, 0≤y≤1) represented by nitride semiconductor materials are widely used in the manufacture of solar cells because of their almost perfect match between the band gap and the solar spectrum, or completely covering the energy range of solar spectrum radiation. On the other hand, flexible thin-film solar cells have the advantages of light weight, bendability, and stretchability, and their applications are more extensive. From a variety of medium and large power consuming equipment (such as electric vehicles, ships, unmanned aircraft, buildings, etc.), to small wearable consumer electronics equipment, flexible thin film solar cells can be...

Claims

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Application Information

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IPC IPC(8): H01L31/0445H01L31/18
CPCH01L31/0445H01L31/1848H01L31/0304H01L31/18Y02E10/544Y02P70/50
Inventor 马亮
Owner 紫石能源有限公司
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