Collagen nano instant facial mask of yeast recombinant collagen and preparation method of facial mask

A technology for recombining collagen and collagen nano-technology, which is applied in skin care preparations, pharmaceutical formulas, cosmetic preparations, etc., can solve the problem of unsolved problems such as the similarity between effective nursing ingredients and human collagen sequences, and achieve small pore size and high porosity. High, large specific surface area effect

Pending Publication Date: 2020-01-10
NOX BELLCOW COSMETICS CO LTD
View PDF8 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] So far, the problem of the similarity between effective care ingredients and

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Collagen nano instant facial mask of yeast recombinant collagen and preparation method of facial mask
  • Collagen nano instant facial mask of yeast recombinant collagen and preparation method of facial mask
  • Collagen nano instant facial mask of yeast recombinant collagen and preparation method of facial mask

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0099] Example 1

[0100] Prepare facial mask of the present invention as follows:

[0101] (1) Preparation of spinning solution: use pure water as solvent, add yeast recombinant collagen (purchased from Jiangsu Yuezhi Biomedical Co., Ltd.), sodium hyaluronate, maltooligosaccharide glucoside, hydrogenated starch hydrolyzate, PEG- 7M, PEG-180, polyglyceryl-10 myristate, pullulanase polysaccharide, preservative, stirred in a constant temperature water bath at 20°C-50°C for 2-6 hours until the solution is uniform and free of particles, and the following Component spinning solution: 18wt% yeast recombinant collagen, 0.2wt% sodium hyaluronate, 2.0wt% pullulanase polysaccharide, 2.4wt% maltooligoglucoside, 1.4wt% hydrogenated starch Hydrolyzate, 0.5wt% of PEG-7M, 0.3wt% of PEG-180, 0.1wt% of polyglycerol-10 myristate, and 1.0wt% of preservatives, wherein the average sodium hyaluronate used The molecular weight is about 30,000, the average molecular weight of the yeast recombinant ...

Example Embodiment

[0103] Example 2

[0104] The facial mask is prepared in the same steps and manner as in Example 1, but the prepared spinning solution comprises the following components: 10wt% yeast recombinant collagen, 3wt% sodium hyaluronate, 1.0wt% pullulanase polysaccharide, 0.5wt% maltooligosaccharide glucoside, 0.5wt% hydrogenated starch hydrolyzate, 0.5wt% PEG with high degree of polymerization, 5wt% PEG with low degree of polymerization, 5.0wt% polysorbate-20, and 0.1wt% preservative, wherein the average molecular weight of the yeast recombinant collagen used is about 40-80Kda, the average molecular weight of the sodium hyaluronate used is about 25000, the molecular weight of the pullulanase polysaccharide used is 250000, and the used The average molecular weight of the PEG with a high degree of polymerization is about 250,000, and the average molecular weight of the PEG with a low degree of polymerization is about 10,000.

Example Embodiment

[0105] Example 3

[0106] The facial mask is prepared in the same steps and manner as in Example 1, but the prepared spinning solution comprises the following components: 5wt% yeast recombinant collagen, 5wt% sodium hyaluronate, 5.0wt% pullulanase polysaccharide, 3wt% of maltooligosaccharide glucoside, 1.7wt% of hydrogenated starch hydrolyzate, 1wt% of PEG with high degree of polymerization, 2wt% of PEG with low degree of polymerization, 0.2wt% of sucrose laurate, and 2.0wt% of Preservatives, wherein the average molecular weight of the yeast recombinant collagen used is about 40-80Kda, the average molecular weight of the sodium hyaluronate used is about 50,000, the molecular weight of the pullulanase polysaccharide used is 150,000, and the high degree of polymerization used The average molecular weight of the PEG used is about 350,000, and the average molecular weight of the PEG with a low degree of polymerization used is about 9,000.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Average molecular weightaaaaaaaaaa
Average molecular weightaaaaaaaaaa
Login to view more

Abstract

The invention discloses a collagen nano instant facial mask containing a yeast recombinant collagen and a preparation method of the collagen nano instant facial mask. The facial mask comprises a non-woven fabric base material layer and a nanofiber layer, the nanofiber layer is formed on the non-woven fabric base material layer through an electrostatic spinning method, and the nanofiber layer comprises the following components: 1-30 parts by weight of the yeast recombinant collagen and 0.1-5 parts by weight of surface active substances. The facial mask disclosed by the invention can remarkablyimprove wrinkles of canthus skin, remarkably improve skin elasticity, remarkably improve the whiteness and glossiness of the canthus skin and remarkably improve the moisture content of a canthus cuticle, and has the effects of fading fine lines and canthus tail lines, smoothing and refining the skin, tightening the skin, brightening the skin, replenishing water and preserving moisture.

Description

technical field [0001] The invention relates to a facial mask and a preparation method thereof. More specifically, the invention relates to a collagen nano instant facial mask containing yeast recombinant collagen and a preparation method thereof. Background technique [0002] In the cosmetics market, most of the facial mask products used for personal care are in the form of relying on non-woven fabrics for essence, but there are various shortcomings in the use of such products. People are always developing new facial masks to meet the ever-changing consumer demand in the market. [0003] For example, Chinese patent application 201310403704.9 discloses a nanofiber whitening and freckle-removing facial mask, which includes spinning solution and cotton cloth, and the active ingredients of spinning solution are reduced glutathione and antioxidant auxiliary materials; Chinese patent 201310366143. A composite nanofiber membrane and its preparation method and application, which c...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A61K8/02A61K8/60A61K8/65A61K8/73A61K8/86A61Q19/00A61Q19/02A61Q19/08
CPCA61K8/0212A61K8/65A61K8/602A61K8/732A61K8/86A61Q19/02A61Q19/08A61Q19/00A61K8/735A61K8/73A61K2800/86A61K2800/596
Inventor 彭心宇林小峰邱晓锋范展华
Owner NOX BELLCOW COSMETICS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap