Ceramic circuit cyanide-free copper plating solution, preparation method and electroplating process
A cyanide-free copper plating and solution technology is applied in the field of electroplating process and ceramic circuit cyanide-free copper plating solution, which can solve problems such as toxicity and environmental pollution, and achieve the effects of low porosity, good plating solution stability and low preparation cost.
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Embodiment 1
[0032] This embodiment is aimed at the copper plating of alumina ceramic circuit, and the electroplating process includes the following contents:
[0033] Degreasing: remove oil stains, fingerprints, stains and other pollutants on the surface of ceramic circuits;
[0034] Washing with tap water: remove the solution remaining in the degreasing process;
[0035] Hydrochloric acid activation: use 50% hydrochloric acid to remove the oxide layer existing on the substrate material, exposing the fresh substrate to be plated;
[0036] Washing with pure water: remove the residual solution during the activation process, and avoid the possibility of bringing chloride ions into the plating solution after washing with tap water;
[0037] Pre-plating copper: high-current impact copper plating to improve the bonding force between the substrate and the subsequent copper plating layer.
[0038] Washing with pure water: remove the solution remaining in the pre-plating process, avoiding the po...
Embodiment 2
[0041] This embodiment copper-plates aluminum nitride ceramic circuit, electroplating process, comprises the following contents:
[0042] Degreasing: remove oil stains, fingerprints, stains and other pollutants on the surface of ceramic circuits;
[0043] Washing with tap water: remove the solution remaining in the degreasing process;
[0044] Hydrochloric acid activation: use 50% hydrochloric acid to remove the oxide layer existing on the substrate material, exposing the fresh substrate to be plated;
[0045] Washing with pure water: remove the residual solution during the activation process, and avoid the possibility of bringing chloride ions into the plating solution after washing with tap water;
[0046] Pre-plating copper: high-current impact copper plating to improve the bonding force between the substrate and the subsequent copper plating layer.
[0047] Washing with pure water: remove the solution remaining in the pre-plating process, avoiding the possibility of brin...
Embodiment 3
[0050] This embodiment includes the following contents to the printed circuit-PCB copper plating and electroplating process:
[0051] Degreasing: remove oil stains, fingerprints, stains and other pollutants on the surface of ceramic circuits;
[0052] Washing with tap water: remove the solution remaining in the degreasing process;
[0053] Hydrochloric acid activation: use 50% hydrochloric acid to remove the oxide layer existing on the substrate material, exposing the fresh substrate to be plated;
[0054]Washing with pure water: remove the residual solution during the activation process, and avoid the possibility of bringing chloride ions into the plating solution after washing with tap water;
[0055] Pre-plating copper: high-current impact copper plating to improve the bonding force between the substrate and the subsequent copper plating layer.
[0056] Washing with pure water: remove the solution remaining in the pre-plating process, avoiding the possibility of bringing ...
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