Electrode and preparation method thereof
An electrode and active layer technology, applied in the field of electrochemical electrode preparation, can solve the problems of lack of electrical activity and stability, complex preparation process, high equipment and energy consumption requirements, and achieve good oxidation resistance, catalytic activity, and processing efficiency. High, low equipment and energy consumption requirements
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Embodiment 1
[0047] Select the TA1 type titanium plate as the titanium substrate, and make sure that the surface of the plate is smooth and smooth without deep scratches and defects. The above substrate is annealed at 500°C and kept for 60 minutes and then cooled naturally; then mechanically It is polished to make its surface have the metallic luster of titanium; after polishing, it is placed in a 5% oxalic acid solution for microboiling treatment for 5 hours, so that the surface oxide layer is etched into the surface of titanium hydride; the preparation of the precursor solution: use isopropyl The volume ratio of alcohol and 30wt.% hydrochloric acid is 4:1 to prepare a mixed solution. According to the mass percentage, add 60% ruthenium and 40% iridium, and ensure that the total concentration of chloroiridic acid and ruthenium trichloride is 5%. , magnetically stirred and dispersed at room temperature for 2 hours, and the stirring speed was 1500rpm to obtain the precursor solution; the prec...
Embodiment 2
[0049] Choose TA1 type titanium mesh as the titanium substrate, anneal the above substrate at 600°C, keep it for 15 minutes and then cool it naturally; then grind it mechanically to make its surface have the metallic luster of titanium; after grinding Put it in a 15% oxalic acid solution and treat it with slight boiling for 5 hours, so that the surface oxide layer is etched into the surface of titanium hydride; prepare the precursor solution: prepare the volume ratio of isopropanol and 40wt.% hydrochloric acid at a ratio of 8:1 The mixed solution, according to the mass percentage, added ruthenium as 90%, iridium as 10%, and ensured that the total concentration of chloroiridic acid and ruthenium trichloride was 15%, magnetically stirred and dispersed for 5h under room temperature, and the stirring speed was 800rpm, The precursor solution was obtained; the precursor solution was coated on the titanium substrate, and after natural drying, it was sintered at 600°C for 10 minutes, a...
Embodiment 3
[0051] Choose TA1 type titanium rod as the titanium substrate, anneal the above substrate at 550°C, keep it for 40 minutes and then cool it naturally; then grind it mechanically to make the surface have the metallic luster of titanium; after grinding Put it in a 10% oxalic acid solution and boil it for 5 hours to make the surface oxide layer etched into the surface of titanium hydride; prepare the precursor solution: prepare the volume ratio of isopropanol and 36wt.% hydrochloric acid at a ratio of 6:1 The mixed solution, according to the mass percentage, added 80% ruthenium, 20% iridium, and ensured that the total concentration of chloroiridic acid and ruthenium trichloride was 10%, magnetically stirred and dispersed at room temperature for 3.5h, and the stirring speed was 1000rpm , to obtain the precursor solution; apply the precursor solution on the titanium substrate, dry it naturally, sinter at 500°C for 20min, and then cool it naturally; repeat the operation 20 times in t...
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