Fumed silica tail gas treatment system and treatment method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- 宁夏福泰硅业有限公司
- Publication Date
- 2020-08-07
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Figure 1
Abstract
Description
technical field
[0001] The invention relates to the technical field of polysilicon production, in particular to a gas phase white carbon black tail gas treatment system and a treatment method thereof. Background technique
[0002] The current gas-phase silica production process will produce a large amount of tail gas containing hydrogen chloride gas that needs to be treated. In the prior art, the following steps are generally used for the above-mentioned tail gas: 1. The tail gas of gas-phase silica is sprayed with hydrochloric acid to remove the tail gas 2. The absorption of hydrogen chloride in the tail gas is generally divided into a multi-stage packed absorption tower that uses dilute hydrochloric acid to absorb hydrogen chloride; 3. The tail gas is washed with water, and the water washing tower uses water as the absorbent to absorb hydrogen chloride; 4. The alkali washing tower uses hydrogen oxidation Sodium is used as an absorbent to absorb chlorine in the tail gas and...