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Tandem solar cell manufacturing method

A technology for solar cells and substrates, which can be used in final product manufacturing, sustainable manufacturing/processing, semiconductor/solid-state device manufacturing, etc. It can solve the problems of reducing the fill factor characteristics, and it is difficult to form a unit layer in perovskite solar cells, and achieve excellent Fill factor properties and efficiency, effect of excellent surface roughness properties

Pending Publication Date: 2020-11-03
SHANGRAO JINKO SOLAR TECH DEV CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, when there are pyramid-shaped defects on the flat substrate surface, it may be difficult for perovskite solar cells to form unit layers with uniform thickness and composition.
[0016] In addition, the pyramidal defects lead to shunting on the surface of the perovskite cell, thereby reducing the fill factor (FF) characteristics

Method used

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Examples

Experimental program
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Effect test

Embodiment 1

[0095] In contrast to Comparative Example 3 above, in Example 1 of the present disclosure, isotropic etching using an aqueous alkaline acid solution in the above SDE method was performed, and then anisotropic etching using an aqueous alkaline solution was performed.

[0096] Figure 9 A picture showing the microstructure in Example 1, in which the bare wafer was pre-cleaned for 10 minutes at room temperature with nitric acid (HNO 3 ) to hydrofluoric acid (HF) ratio isotropically etched for 10 minutes and anisotropically etched for 5 minutes in 5% by weight aqueous sodium hydroxide (NaOH) solution.

[0097] like Figure 9 As shown, the step portion caused by saw marks on the bare wafer was not significantly reduced by isotropic etching, but no sharp cross-sections or surfaces were observed because isotropic etching was performed in all directions, unlike the wafer surface The crystal orientation on the surface is independent to have a surface rounding effect.

[0098] Subseq...

Embodiment 2

[0102] Compared to Example 1 of the present disclosure, an isotropic etch is added in the last step of the SDE of Example 2 of the present disclosure.

[0103] like Figure 10 As shown, in Example 1, saw marks were removed from the surface of the crystalline silicon substrate subjected to isotropic etching and anisotropic etching, and no pyramidal defects existed.

[0104] In Example 2 after continuing the isotropic etching for 10 minutes thereafter, it can be seen that the final substrate has a surface rounded shape by the final isotropic etching, thereby improving the surface roughness and smoothing the curve.

[0105] Figure 11 The mechanism estimated by the present inventors to form the surface of the crystalline silicon substrate by etching in Examples and Comparative Examples of the present disclosure is shown.

[0106] like Figure 11 As shown, a bare silicon substrate cut by a wire saw has saw marks on the surface of the substrate. If anisotropic etching is perfor...

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Abstract

According to the present invention relating to a tandem solar cell manufacturing method using a method for etching a crystalline silicon substrate, a solar cell may be obtained which does not have a pyramid-shaped defect on the surface of a substrate, inhibits the generation of a shunt through the substrate having excellent surface roughness properties, and may secure fill factor properties, the solar cell being capable of being obtained through the tandem solar cell manufacturing method which comprises the steps of: preparing a crystalline silicon substrate; isotropically etching the substrate; removing saw damage on the surface of the substrate by anisotropically etching the isotropically etched substrate; positioning a second solar cell on the saw damage-removed substrate; positioning amiddle layer on the second solar cell; and positioning a first solar cell on the middle layer.

Description

technical field [0001] The present disclosure relates to methods of fabricating tandem solar cells using methods of etching crystalline silicon substrates. Background technique [0002] Crystalline silicon (c-Si) solar cells are representative single-junction solar cells and are widely used as commercial solar cells. [0003] However, since crystalline silicon solar cells have low photoelectric conversion efficiency, tandem solar cells constituting one solar cell by connecting single-junction solar cells including absorption layers having different band gaps have been actively developed. [0004] figure 1 is a schematic cross-sectional view showing a two-terminal tandem solar cell among tandem solar cells. [0005] refer to figure 1 , the solar cell includes a single-junction solar cell including an absorbing layer having a relatively large band gap and a single-junction solar cell including an absorbing layer having a relatively small band gap, and they are combined thro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18H01L31/0687H01L31/0725H01L31/0376
CPCH01L31/0725H01L31/0687Y02E10/544Y02P70/50Y02E10/549H01L31/1804H01L31/0747H01L21/30604Y02E10/547H10K30/57H10K77/10H10K85/50H01L31/18H01L31/0376Y02E10/50H01G9/20H01L31/186H01L31/208
Inventor 李有真金成卓安世源郑镇元
Owner SHANGRAO JINKO SOLAR TECH DEV CO LTD
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