Antireflection coating liquid, preparation method thereof, antireflection coated glass, and photovoltaic module
A coating glass and anti-reflection technology, applied in photovoltaic power generation, electrical components, semiconductor devices, etc., can solve the problems of complicated coating liquid steps and high energy consumption, and achieve the effect of reducing types, simple preparation and cost saving.
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[0064] The preparation method of the resin pore-forming agent in the present embodiment comprises the following steps:
[0065] a. In a 500ml four-necked flask equipped with a stirrer, a condenser and a dropping funnel, add weighed 103.44g of propylene glycol methyl ether acetate (PMA) and 83.44g of ethanol mixed solvent, start stirring, and stir evenly , start heating;
[0066] b. After the temperature rises to 80°C and the temperature is kept for 0.5h, start adding dropwise 70g of methyl methacrylate, 43.58g of butyl acrylate, 17.22g of methacrylic acid, 7.11 g acrylamide and 2.07g azobisisobutyl cyanide (AIBN), dripped in 2h;
[0067] c. After dripping, keep the temperature for 30min, add 0.69g AIBN and 20gPMA with uniform stirring; drip in 15min;
[0068] d. Continue to keep the temperature for 2h after dripping, cool down and filter out the material to obtain a resin pore-forming agent.
Embodiment 2
[0069] Embodiment 2 Silica sol and its preparation method
[0070] The silica sol in this embodiment includes the following raw material components:
[0071]
[0072] In this embodiment, the silane coupling agents are methyltriethoxysilane and vinyltrimethoxysilane, and the catalyst is concentrated hydrochloric acid. In some other embodiments, the mass percentages of isopropanol, ethyl orthosilicate, silane coupling agent, pure water, and catalyst are 52%-58%, 3.3%-4%, 30%-33%, 9.5% %-11.5%, 0.005%-0.015%; silane coupling agent is selected from methyltrimethoxysilane, methyltriethoxysilane, dimethyldiethoxysilane, vinyltriethoxysilane, γ ―(2,3-glycidoxy)propyltrimethoxysilane (KH-560), γ-methacryloyloxypropyltrimethoxysilane (KH-570), phenyltrimethoxysilane, Two or more of phenyltriethoxysilane; the catalyst is hydrochloric acid or acetic acid.
[0073] The preparation method of the silica sol in this embodiment comprises the following steps:
[0074] 1) 718.6g of isopr...
Embodiment 3
[0076] Embodiment 3 Anti-reflection coating solution and preparation method thereof
[0077] The anti-reflection coating solution in this embodiment includes the following components:
[0078]
[0079] In this example, the carrier solvent is isopropanol, the film-forming substance is the silica sol prepared in Example 2, and the pH adjusting agent is triethanolamine. The dispersing solvent is selected; the pH adjusting agent is selected from one of triethylamine, triethanolamine and diethanolamine.
[0080] The resin diluent includes the resin pore-forming agent and the diluent prepared in Example 1, and the mass ratio of the resin pore-forming agent and the diluent is resin pore-forming agent: diluent=1:3-8. In this embodiment, the mass ratio of resin pore-forming agent and diluent is 1:4, and the resin diluent in this embodiment is obtained by diluting resin pore-forming agent: isopropyl alcohol: PMA=1:2:2 according to the mass ratio of.
[0081] The preparation method...
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