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Mushroom-like pileus-shaped wave-absorbing material and preparation method thereof

A wave absorbing material and mushroom technology, applied in the field of wave absorbing agents, can solve the problems of poor impedance matching performance and efficient attenuation of electromagnetic waves, and achieve the effects of excellent wave absorbing performance, strong reflection loss ability and good application prospects.

Inactive Publication Date: 2020-11-17
ZHEJIANG SCI-TECH UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a mushroom-like mushroom-cap-like wave-absorbing material in order to solve the problems of poor impedance matching performance and inability to efficiently attenuate electromagnetic waves in current carbonaceous materials as wave-absorbing materials.

Method used

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  • Mushroom-like pileus-shaped wave-absorbing material and preparation method thereof
  • Mushroom-like pileus-shaped wave-absorbing material and preparation method thereof
  • Mushroom-like pileus-shaped wave-absorbing material and preparation method thereof

Examples

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preparation example Construction

[0040] The preparation method of the mushroom-like cap-shaped wave-absorbing material provided by the application, the steps are as follows:

[0041] Step 1, configuring an aqueous alcohol solution with a pH of 8 to 10;

[0042] Step 2, add tetraethyl orthosilicate, resorcinol and formaldehyde in sequence to the above alcohol aqueous solution as required to obtain a reaction solution, and the interval between additions is 10 to 20 minutes; the alcohols used include methanol, ethanol and acrylic acid. Saturated monohydric alcohol of alcohol; the volume ratio of alcohol aqueous solution water to alcohol is 1:4~8; the molar ratio of tetraethyl orthosilicate, resorcinol and formaldehyde is (3~7):1:(5~8 );

[0043] Step 3, subjecting the above reaction solution to hydrothermal reaction, washing and drying the obtained product; specifically, reacting at 100-120°C for 8-16 hours;

[0044] Step 4, the obtained product is etched with an acidic solution, washed and dried to obtain pre...

Embodiment 1

[0046]Example 1: under stirring conditions, add 83mmol of ammonia water to 80ml of alcohol-water mixed solution; under the condition of constant temperature stirring at 30°C, add 16mmol of tetraethyl orthosilicate and 5mmol of resorcinol to the above mixed solution in sequence And 30mmol of formaldehyde, the addition time is 10min, in order to mix evenly, and stir for 12h to get the reaction solution; the reaction solution is hydrothermally reacted at 100°C for 12h, and the reaction product is centrifugally washed and placed in a constant temperature blast drying oven at 60°C Dry for 8 hours; place the dried product in a hydrofluoric acid solution with a mass fraction of 10% for etching treatment for 4 hours at 25°C, wash the product by centrifugation, and dry it in a constant temperature blast drying oven at 50°C 10h; After grinding the obtained product evenly, place it in a nitrogen atmosphere, raise the temperature up to 600°C at a rate of 5°C / min, and keep it warm for 4h to...

Embodiment 2

[0047] Example 2: under stirring conditions, add 83mmol of ammonia water to 80ml of alcohol-water mixed solution; under the condition of constant temperature stirring at 30°C, add 20mmol of tetraethyl orthosilicate and 6mmol of resorcinol to the above mixed solution in sequence And 35mmol of formaldehyde, adding interval time is 10min, in order to mix evenly, stir for 12h to get the reaction liquid; react the reaction liquid at 100°C for 12h, the reaction product is centrifugally washed and placed in a constant temperature blast drying oven at 60°C Dry for 8 hours; place the dried product in a hydrofluoric acid solution with a mass fraction of 10% for etching treatment for 4 hours at 25°C, wash the product by centrifugation, and dry it in a constant temperature blast drying oven at 50°C 10h; After grinding the obtained product evenly, place it in a nitrogen atmosphere, raise the temperature to 700°C at a rate of 5°C / min, and keep it warm for 4h to obtain a mushroom-like cap-sha...

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Abstract

The invention relates to the technical field of wave-absorbing agents, in particular to a preparation method of a mushroom-like pileus-shaped wave-absorbing material. The method comprises the following steps: preparing an alcohol-water solution with the pH value of 8-10; adding tetraethyl orthosilicate, resorcinol and formaldehyde into the alcohol-water solution as required to obtain a reaction solution; carrying out a hydrothermal reaction on the reaction solution, and washing and drying an obtained product; carrying out etching treatment on the obtained product by adopting an acidic solution, washing and drying to obtain precursor particles; and calcining the precursor particles in a nitrogen atmosphere to obtain the mushroom-like pileus-shaped wave-absorbing material. Compared with a traditional pure carbon wave-absorbing material, the mushroom pileus-shaped wave-absorbing material provided by the invention still has the characteristics of strong reflection loss and wide effective absorption frequency band under the conditions of extremely low filling degree and low thickness, and has excellent wave-absorbing performance; the wave-absorbing material solves the problems that theimpedance matching performance of the existing pure carbon wave-absorbing material is poorer, and realization of high-efficiency attenuation of electromagnetic waves is faster.

Description

technical field [0001] The invention relates to the technical field of wave-absorbing agents, in particular to a method for preparing a mushroom-like cap-shaped wave-absorbing material. Background technique [0002] With the rapid development of electronic information technology, electromagnetic waves, as an important carrier of information transmission, have greatly promoted the development of various industries. This also causes electromagnetic wave radiation to flood our living environment. The application of various electronic devices in various fields in life provides great convenience to our life, but it also inevitably brings serious electromagnetic radiation pollution; electromagnetic radiation will not only affect the normal operation of other electronic instruments and equipment, but also It will cause serious harm to human health. On the other hand, in the military field, in order to improve the survival and penetration capabilities of various military weapons a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B32/05C08G8/28H05K9/00
CPCC08G8/28C01B32/05H05K9/0081
Inventor 朱曜峰杨汶童赵伟焜董余兵傅雅琴
Owner ZHEJIANG SCI-TECH UNIV
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