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A chain wet etching equipment for topcon battery

A wet etching and chain-type technology, which is applied in the direction of circuits, electrical components, sustainable manufacturing/processing, etc., can solve the problems of complicated process switching procedures, inability to implement continuous equipment, and damage battery performance, so as to achieve continuous production , low cost, and the effect of improving conversion efficiency

Active Publication Date: 2021-02-26
CHANGZHOU SHICHUANG ENERGY CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

TOPCon cells passivate the back of the silicon wafer with a tunneling oxide layer and a doped polysilicon layer, which can greatly improve the performance of the battery. However, when making doped polysilicon, a wrap-around polysilicon will be formed on the front of the silicon wafer, and leakage will be formed on the side of the silicon wafer. area, greatly impairing battery performance
[0004] At present, in the production process of TOPCon cells, multi-step wet chemical treatment methods are usually used to remove the polysilicon plating and isolate the edge of the silicon wafer. The process switching procedure is complicated and cannot be realized continuously by a single device, and the degree of automation is low.

Method used

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  • A chain wet etching equipment for topcon battery
  • A chain wet etching equipment for topcon battery
  • A chain wet etching equipment for topcon battery

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Embodiment Construction

[0028] The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0029] like image 3 and Figure 4 , in the TOPCon cell fabrication process, boron-doped layer 102 is formed after boron is diffused on the front side of silicon substrate 101, a mask layer 103 with a thickness of about 10-300 nm is deposited on the surface of boron-doped layer 102, and a layer with a thickness of about 0.5 nm is deposited on the back side. ~3nm tunneling oxide layer 105, on which an intrinsic amorphous silicon layer is deposited, and then the intrinsic amorphous silicon layer is crystallized into a phosphorus-doped polysilicon layer 106 by phosphorus diffusion annealing, and at the same time, the phosphorus-doped polysilicon layer 106 A PSG (phosphosilicate glass) layer 107 with a thickness of about 1-40 nm is formed on the surface. During this process, the tunneling oxide layer 105 will form a wrap-around ...

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Abstract

The invention discloses a chain type wet etching equipment for TOPCon batteries, comprising five functional areas and a conveying device running through each functional area; the five functional areas are the first pickling area, the first alkali Washing area, the second pickling area, the second alkaline washing area and the third pickling area; the solution in the first pickling area, the second pickling area and the third pickling area is hydrofluoric acid solution; The solution in the first alkaline cleaning zone and the second alkaline cleaning zone is sodium hydroxide or potassium hydroxide solution; the silicon wafer to be etched passes through the first pickling zone, the first alkaline cleaning zone, and the second pickling zone in sequence using a conveying device , The second alkaline washing area and the third acid washing area. The chain-type wet etching equipment of the present invention removes and isolates the edge while surrounding the polysilicon, realizes the production continuity of the TOPCon battery, and improves the conversion efficiency of the battery at the same time; the equipment has a high degree of automation and high production capacity, and is suitable for large-scale production requirements ; The device is easy to implement and low in cost.

Description

technical field [0001] The invention relates to a chain type wet etching equipment, in particular to a chain type wet etching equipment used for TOPCon batteries. Background technique [0002] In the field of crystalline silicon solar cell manufacturing, chain-type wet-process equipment is widely used due to the advantages of low equipment manufacturing cost, high output, and stable process effect. Common chain-type wet-processing equipment includes chain-type texturing equipment, chain-type acid etching equipment, chain-type phosphorus-silicate glass (PSG) equipment, etc. Chain texturing equipment is usually used for single-sided texturing of silicon wafers, chain acid etching equipment is usually used for back polishing of battery semi-finished products, and chain-type dephosphorous silicon glass equipment is usually used for single-sided phosphorus removal of battery semi-finished products. Removal of silica glass. [0003] With the update and development of crystalline...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67H01L31/18
CPCH01L21/67075H01L21/67086H01L31/18Y02P70/50
Inventor 沈梦超顾振华张胜军绪欣许佳平曹育红符黎明
Owner CHANGZHOU SHICHUANG ENERGY CO LTD
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