Precise virus capturing and extracting method based on silicon nano spiral structure
A helical structure and extraction method technology, applied in the field of biomedicine, can solve the problems of change, vaccine failure, immune failure, etc., and achieve the effect of efficient capture, increased capture probability and stability, and good three-dimensional elastic shape
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Embodiment 1
[0037] This embodiment combines the attached figure 1 The preferred embodiment of the present invention is described in detail, specifically, a precise virus capture and extraction method based on silicon nanohelical structure is provided. It specifically includes the preparation steps of the silicon nanohelical structure and the capture and extraction steps of the virus, wherein the cage helical structure of the silicon nanowire used in this embodiment is cylindrical, and its preparation includes the following steps:
[0038] In the first step, a single layer of polystyrene beads with a diameter of 200 nm is densely packed on a silicon wafer, and the diameter of the balls is reduced to less than 100 nm by ICP oxygen plasma;
[0039] In the second step, the substrate is etched cyclically by using the BOSCH etching process to obtain a silicon pillar structure with parallel channels;
[0040] The third step is wet oxidation at 1000°C for 1 h under nitrogen atmosphere, and then ...
Embodiment 2
[0050] This embodiment provides a precise virus capture and extraction method based on silicon nanohelical structure. Such as figure 1 As shown, it specifically includes the preparation steps of the cylindrical silicon nano-helical structure and the steps of capturing and extracting the virus, wherein the preparation of the silicon nano-wire helical structure includes the following steps:
[0051] The first step is to use ultraviolet lithography to form a circular photoresist array on a silicon substrate, 2 μm, with a pitch of 4 μm; the photoresist is shrunk by ICP oxygen plasma, so that the diameter of the photoresist is reduced to 100 nm;
[0052] In the second step, the substrate is etched cyclically by using the BOSCH etching process to obtain a silicon pillar structure with parallel channels;
[0053] The third step is dry oxidation at 1000°C for 8 h in an oxygen atmosphere;
[0054] In the fourth step, the nanowire helical structure is grown along the side wall of the...
Embodiment 3
[0062] This embodiment combines the attached figure 2 The preferred embodiment of the present invention is described in detail, specifically, a precise virus capture and extraction method based on silicon nanohelical structure is provided. It specifically includes the preparation steps of the silicon nanohelical structure and the capture and extraction steps of the virus, wherein the cage helical structure of the silicon nanowire used in this embodiment is conical, and its preparation includes the following steps:
[0063] The first step is to spin-coat polymethyl methacrylate photoresist on the silicon wafer, and form a circular photoresist area with a diameter of 100 nm on the surface of the silicon wafer through electronic book photolithography technology;
[0064] The second step is to use the BOSCH etching process to etch the silicon substrate cyclically, adjust the etching parameters, and obtain a silicon cone structure with parallel channels;
[0065] The third step i...
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