Heterojunction of perovskite nanowires and preparation method of heterojunction
A nanowire and heterojunction technology, applied in the field of new semiconductor optoelectronic materials, can solve the problems of cumbersome template etching preparation process and large-scale preparation limitations
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Embodiment 1
[0032] Step 1: cleaning treatment of FTO glass substrate. First use detergent to wipe the surface of the FTO glass substrate, and then put the wiped FTO glass substrate in de-acetone, isopropanol, and deionized water for 10 min, respectively, for ultrasonic cleaning.
[0033] Step 2: Using anti-solvent vapor-assisted liquid phase recrystallization method to prepare high-quality CsPbBr grown at a certain angle to the substrate on the surface of the FTO glass substrate 3 Single crystal nanowires, specifically:
[0034] 2.1) Combine CsBr and PbBr 2 Dissolve in 1 mL of DMF, where 0.05 mmol of CsBr and 0.05 mmol of PbBr are added per 1 mL of DMF 2 . At room temperature, stir on a magnetic stirrer for 2 h to obtain a precursor solution with a concentration of 0.05M.
[0035] 2.2) Place the FTO glass substrate obtained in step 1 in a beaker containing isopropanol in advance, wherein the FTO glass substrate does not contact the anti-solvent liquid isopropanol, which is a volatile ...
Embodiment 2
[0040] Step 1: cleaning treatment of FTO glass substrate. First use detergent to wipe the surface of the FTO glass substrate, and then put the wiped FTO glass substrate in order to remove acetone, isopropanol, and deionized water for ultrasonic cleaning for 20 minutes respectively.
[0041] Step 2: Using anti-solvent vapor-assisted liquid phase recrystallization method to prepare high-quality CsPbBr grown at a certain angle to the substrate on the surface of the FTO glass substrate 3 Single crystal nanowires, specifically:
[0042] 2.1) Combine CsBr and PbBr 2 Dissolve in 1 mL of DMF, where 0.05 mmol of CsBr and 0.05 mmol of PbBr are added per 1 mL of DMF 2 . At room temperature, stir on a magnetic stirrer for 3 h to obtain a precursor solution with a concentration of 0.05M.
[0043] 2.2) Place the FTO glass substrate obtained in step 1 in a beaker containing isopropanol in advance, wherein the FTO glass substrate does not contact the anti-solvent liquid isopropanol, which...
Embodiment 3
[0047] Step 1: cleaning treatment of FTO glass substrate. First use detergent to wipe the surface of the FTO glass substrate, and then put the wiped FTO glass substrate in order to remove acetone, isopropanol, and deionized water for ultrasonic cleaning for 30 minutes respectively.
[0048] Step 2: Using anti-solvent vapor-assisted liquid phase recrystallization method to prepare high-quality CsPbBr grown at a certain angle to the substrate on the surface of the FTO glass substrate 3 Single crystal nanowires, specifically:
[0049] 2.1) Combine CsBr and PbBr 2 Dissolve in 1 mL of DMF, where 0.05 mmol of CsBr and 0.05 mmol of PbBr are added per 1 mL of DMF 2 . At room temperature, stir on a magnetic stirrer for 4 h to obtain a precursor solution with a concentration of 0.05M.
[0050] 2.2) Place the FTO glass substrate obtained in step 1 in a beaker containing isopropanol in advance, wherein the FTO glass substrate does not contact the anti-solvent liquid isopropanol, which...
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