Plating device for AZO+SiN laminated protective film of solar cell

A solar cell and protective film technology, which is applied in the direction of plating, coating, and circuit of superimposed layers, can solve the problems of expensive penetrating silver paste and increasing the manufacturing cost of solar cells, so as to improve the utilization rate of sunlight and avoid The turnover of silicon wafer loading and unloading, the effect of reducing equipment cost and labor cost input

Pending Publication Date: 2021-05-14
CHANGZHOU BITAI TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, penetrating silver paste is expensive and greatly increases the manufacturing cost of solar cells

Method used

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  • Plating device for AZO+SiN laminated protective film of solar cell
  • Plating device for AZO+SiN laminated protective film of solar cell

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] refer to figure 1 , the present invention provides a solar cell AZO+SiN laminated protective film coating equipment, including AZO coating area 30 and SiN coating area 50 sequentially arranged in the same coating chamber, between AZO coating area 30 and SiN coating area 50 There is also a transition chamber 40 between them; the feeding end of the AZO coating area 30 is provided with a loading chamber 20, and the discharging end of the SiN coating area 50 is provided with an unloading chamber 60; the feeding end of the loading chamber 20 is provided with a silicon wafer automatic feeding Mechanism 10, the discharge end of the unloading cavity 60 is provided with a silicon wafer automatic unloading mechanism 70; a carrier plate rotary mechanism 80 is also provided between the loading mechanism 10 and the unloading mechanism 70 at both ends of the plating equipment; The feeding mechanism 10, the loading chamber 20, the AZO coating area 30, the transition chamber 40, the Si...

Embodiment 2

[0036] refer to figure 2 , the difference between this embodiment 2 and embodiment 1 is that the loading mechanism 10 and the unloading mechanism 70 are arranged at the same end of the plating equipment, and a carrier plate is provided between the loading mechanism 10 and the unloading mechanism 70. Institution80.

Embodiment 3

[0038] The present invention also provides a solar cell having the AZO+SiN laminated anti-reflection protective film prepared based on the above-mentioned embodiment 1 or 2.

[0039]The solar cell of the present embodiment 3 adopts AZO+SiN lamination to replace the traditional SiN layer on the surface of the passivation layer, which has the same anti-reflection and protective effect compared with the traditional SiN layer; because the doped amorphous silicon film has AZO is an aluminum-doped zinc oxide (ZnO) transparent conductive film, which has good electrical conductivity and light transmission. After the introduction of AZO, the thickness of doped amorphous silicon can be reduced. At the same time of conductivity, more light can enter the bulk silicon, thereby improving the utilization rate of sunlight and increasing the power generation; on the other hand, AZO has good conductivity and can form a good ohmic contact with silver or other metals , so that the contact resista...

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Abstract

The invention discloses a plating device for an AZO+SiN laminated protective film of a solar cell. The device comprises an AZO plating area, an SiN plating area and a chain type transmission mechanism corresponding to the AZO plating area and the SiN plating area, wherein the AZO plating area and the SiN plating area are sequentially arranged, and a carrier plate loaded with a silicon wafer is flatly laid on the chain type transmission mechanism and sequentially passes through the AZO plating area and the SiN plating area. AZO plating and SiN plating are simultaneously realized in the same device, thus the process integration degree is high, the process cycle is short, the equipment and labor cost input is greatly reduced, the production efficiency and product yield are effectively improved, and then the manufacturing cost of the solar cell is effectively reduced; and the AZO+SiN laminated protective film has good conductivity and light transmittance at the same time, the thickness of doped amorphous silicon can be reduced, so that the utilization rate of sunlight can be improved, the generating capacity can be increased, meanwhile, good ohmic contact with silver or other metals can be formed to reduce contact resistance, and further, the efficiency of the cell is improved.

Description

technical field [0001] The invention relates to the technical field of solar cell preparation, in particular to a coating device for AZO+SiN lamination protective film for solar cells. Background technique [0002] In recent years, with the research and development of crystalline silicon solar cells, both theory and practice have proved that surface passivation is the only way to improve cell efficiency. [0003] In crystalline silicon solar cell structures such as PERC and TOPCon, the conversion efficiency is improved by designing one or more layers of passivation structure on the surface of the silicon wafer, such as SiN+Al 2 o 3 For the application of laminated layers on PERC cells, since the aluminum oxide passivation layer deposited on the silicon wafer is thin, it is necessary to deposit SiN on the aluminum oxide film for protection, and at the same time, reduce the reflectivity of the back to achieve better passivation surface. Similarly, in the TOPCon battery stru...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/08C23C14/06C23C16/34C23C16/50C23C14/35C23C28/04H01L31/18
CPCC23C14/0036C23C14/0652C23C14/08C23C14/35C23C14/352C23C16/345C23C16/50C23C28/04H01L31/1876Y02E10/50Y02P70/50
Inventor 闫路上官泉元
Owner CHANGZHOU BITAI TECH
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