High-throughput preparation method of monodisperse silicon dioxide microspheres

A monodisperse silica microsphere, silica technology, applied in the direction of silica, silicon oxide, nanotechnology, etc., can solve the problems of difficulty in forming monodisperse silica, wide particle size distribution, low mixing efficiency, etc.

Pending Publication Date: 2021-05-18
SHENZHEN INST OF ADVANCED ELECTRONICS MATERIALS
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In the prior art scheme, silica is prepared by the sol-gel method, using a stirred reactor, the reaction space is too large, the mixing efficiency is low, the particle size distribution...

Method used

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  • High-throughput preparation method of monodisperse silicon dioxide microspheres
  • High-throughput preparation method of monodisperse silicon dioxide microspheres
  • High-throughput preparation method of monodisperse silicon dioxide microspheres

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Embodiment 1

[0032] The high-throughput preparation method of monodisperse silica microspheres in this embodiment comprises the following steps:

[0033] Step 1. Disperse 20g of tetraethyl orthosilicate in 100g of isopropanol and stir evenly to obtain the first solution, wherein the mass ratio of tetraethyl orthosilicate to isopropanol is 0.2;

[0034] Step 2. Disperse 10g of 20wt% sodium hydroxide solution in 100g of deionized water and stir evenly to obtain a second solution, wherein the mass ratio of sodium hydroxide to deionized water is 0.1;

[0035] Step 3. the first solution is imported from one inlet port of the reaction chamber with 2ml / min, and the second solution is imported from the other inlet port of the reaction chamber with 3ml / min, and mixed rapidly;

[0036] Step 4. The above mixed solution passes through two spiral tubes, which are 120m long, 0.7mm internal diameter and 70m long, 1.2mm internal diameter spiral tubes. The spiral tubes are placed in a square tank at 40°C f...

Embodiment 2

[0040] The high-throughput preparation method of monodisperse silica microspheres in this embodiment comprises the following steps:

[0041] Step 1. Disperse 20g of methyl orthosilicate in 100g of ethanol, stir evenly to obtain the first solution, wherein the mass ratio of tetramethyl orthosilicate to ethanol is 0.2;

[0042] Step 2. Disperse 15g of 30wt% ammonia solution in 100g of deionized water and stir evenly to obtain a second solution, wherein the mass ratio of ammonia to deionized water is 0.15;

[0043]Step 3. The first solution is input from one inlet port of the reaction chamber with 1ml / min, and the second solution is imported from the other inlet port of the reaction chamber with 2ml / min, and mixed rapidly;

[0044] Step 4. The above mixed solution is carried out through two spiral tubes, which are 150m in length, 0.5mm in inner diameter and 90m in length, 1.0mm in inner diameter. The spiral tube is placed in a square tank at 30°C for reaction, and the reaction ti...

Embodiment 3

[0048] The high-throughput preparation method of monodisperse silica microspheres in this embodiment comprises the following steps:

[0049] Step 1. Disperse 10g of tetraethyl orthosilicate in 60g of ethanol, stir evenly to obtain the first solution, the mass ratio of tetraethyl orthosilicate to ethanol is 0.17;

[0050] Step 2. Disperse 10g of 20wt% ammonia solution in 100g of deionized water and stir evenly to obtain a second solution, wherein the mass ratio of ammonia to deionized water is 0.1;

[0051] Step 3. The first solution is imported from one inlet port of the reaction chamber at 0.5ml / min, and the second solution is imported from the other inlet port of the reaction chamber at 2ml / min, and mixed rapidly;

[0052] Step 4. The above mixed solution is carried out through two spiral tubes, which are 150m long, 0.5mm inner diameter and 30m long, 1.5mm inner diameter spiral tubes. The spiral tubes are placed in a square tank at 50°C for reaction, and the reaction time is...

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Abstract

The invention relates to the technical field of preparation of nano powder materials, and discloses a high-flux preparation method of monodisperse silicon dioxide microspheres, the silicon dioxide microspheres are prepared based on a microfluidic reactor, the microfluidic reactor comprises a reaction chamber, the reaction chamber is internally provided with a multi-channel spiral tube comprising at least one spiral tube, The preparation method comprises the following steps: 1) dispersing a silicon source in a solvent to obtain a first solution; 2) dispersing a catalyst in deionized water to obtain a second solution; 3) simultaneously inputting the first solution and the second solution from an inlet channel of the reaction chamber, and mixing to obtain a mixed solution; and 4) reacting the mixed solution in each spiral tube of a multi-channel spiral tube, and separating and purifying to obtain the silicon dioxide with different particle sizes. According to the invention, a multi-flux microfluidic reaction system is adopted, so that the particle size distribution of the synthesized silicon dioxide is uniform, the production capacity of different particle sizes is greatly increased, and the production efficiency is improved.

Description

technical field [0001] The invention relates to the technical field of preparation of nanometer powder materials, in particular to a high-throughput preparation method of monodisperse silica microspheres. Background technique [0002] Silica is one of the extremely important high-tech inorganic new materials. Due to its good performance in terms of dispersibility, thermal stability, and insulation, it plays an irreplaceable role in the field of electronic packaging. In particular, silicon dioxide with different sizes exhibits different optical and chemical properties. Therefore, the controllable synthesis of silicon dioxide with different sizes is of great significance. [0003] At present, there are three main methods for preparing silica in industry: gas phase method, precipitation method and sol-gel method. Gas-phase method to silicon-containing halides (such as SiCl 4 ) as raw material, silicon dioxide particles are generated by high temperature in a hydrogen-oxygen fl...

Claims

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Application Information

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IPC IPC(8): C01B33/18B82Y30/00
CPCC01B33/18B82Y30/00C01P2004/03C01P2004/62C01P2004/52
Inventor 杜晓蒙王宁朱朋莉孙蓉赵涛杜明勇张磊聪
Owner SHENZHEN INST OF ADVANCED ELECTRONICS MATERIALS
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