Application of umbelliferone in preparing composition for resisting skin photoaging

A technology of umbelliferone and skin photoaging, applied in skin care preparations, active ingredients of heterocyclic compounds, skin diseases, etc., can solve the problems of anti-skin photoaging that have not been reported, and achieve anti-skin photoaging, Stable properties, anti-secretion effect

Inactive Publication Date: 2021-08-13
北京温适宝科技有限公司
View PDF4 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Umbelliferone exists in the roots of Umbelliferae carrot (Daucus carota L.var.sativa DC), the seeds of legumes Coronilla varia L., the Rutaceae Rutaceae (Ruta graveolens L. ) in the whole plant has multiple effects

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Application of umbelliferone in preparing composition for resisting skin photoaging
  • Application of umbelliferone in preparing composition for resisting skin photoaging
  • Application of umbelliferone in preparing composition for resisting skin photoaging

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0051] The present invention also provides a preparation method of the above-mentioned anti-skin photoaging composition, which includes the following steps: mixing the components uniformly in proportion.

[0052] In a specific embodiment of the present invention, after the auxiliary material and water are uniformly mixed, they are uniformly mixed with umbelliferolide at 35-40° C., cooled and discharged.

[0053] The rest of the materials are mixed with umbelliferone at a relatively low temperature to avoid the impact of high temperature on the stability of the active ingredient umbelliferide and ensure the effectiveness of the composition.

[0054] In order to further improve the uniformity of dispersion and the stability of properties of each dosage form, the present invention provides the preparation method of different dosage forms, specifically as follows:

[0055] In a specific embodiment of the present invention, the preparation method of the water preparation comprises ...

Embodiment 1

[0061] Anti-photoaging Effect of Umbelliferone

[0062] (1) Culture of human immortalized keratinocytes (HaCaT) cells

[0063] Experimental method: According to the instructions of HaCaT cells (article number: CL-0090, company: Wuhan Puruosai Life Technology Co., Ltd.), the cells were resuscitated, and the DMEM complete medium was prepared: 89% DMEM medium (Gibco), 10% fetal bovine serum (FBS) (Gibco) and 1% penicillin-streptomycin mixed solution (Gibco), the cells were transferred to DMEM complete medium at 95% humidity and 5% CO 2 cultured in a 37°C incubator.

[0064] (2) UVB irradiation

[0065] Experimental method: when the HaCaT cells grow to 60%-70% abundance (the appropriate time for culturing, the same below), UVB irradiation is given.

[0066] The cells were taken out from the incubator, the medium was discarded, and washed twice with phosphate buffered saline (PBS).

[0067] Add an equal amount of thin layer PBS to each well, and then use 50mJ / cm 2 dose of UVB ...

Embodiment 2

[0119] This example provides an aqua containing umbelliferone and a preparation method thereof, and the prescription dosage of the aqua is shown in Table 7.

[0120] Table 7 Contains the consumption of each component of the aqua of umbelliferone

[0121]

[0122] The preparation method of the described aqua containing umbelliferone, comprises the steps:

[0123] (1) Weigh each component of phase A according to the proportion, stir at a stirring rate of 25r / min and heat to 85°C, homogenize at 2000r / min for 3min, add the components of phase B, stir at 25r / min and keep warm for 20min;

[0124] (2) Cool the material obtained in step (1) to 50°C, add phase C, stir at a stirring rate of 25r / min for 10min, then cool down to 40°C, add phase D, stir at a stirring rate of 25r / min for 10min, and cool down to Discharge below 35°C.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to the technical field of application of umbelliferone, and in particular relates to application of umbelliferone in preparing a composition for resisting skin photoaging. The invention discloses application of umbelliferone in preparing the composition for resisting skin photoaging. According to the invention, experiments prove that the umbelliferone can significantly improve the cell activity after UVB irradiation; cell apoptosis induced by UVB and secretion of cell inflammatory factors are inhibited; the expression of MMP-1 and MMP-9 induced by the UVB is reduced; and inhibition of apoptosis and activation of NF-kappa B and MAPK signal channels proves that umbelliferone is an effective substance for resisting skin photoaging.

Description

technical field [0001] The present invention relates to the technical field of application of umbelliferin, in particular to the application of umbelliferide in the preparation of an anti-skin photoaging composition. Background technique [0002] Photoaging accounts for approximately 80% of skin aging. One of the main causes of photoaging is skin exposure to sunlight (wavelength 290-320nm). Exposure to UV rays may cause skin damage by changing the composition of skin cells or by causing loss of the extracellular matrix (ECM). Ultraviolet rays are divided into UVA (315-400nm), UVB (280-315nm), and UVC (200-280nm) according to wavelength. Since most UVC can be absorbed by the ozone layer without reaching the earth, UVA and UVB are the two main UV radiations that damage the skin (the skin is the main organ exposed to UV light). Especially UVB has stronger genotoxicity and has about 1000 times higher sunburning ability than UVA. Chronic skin exposure to UVB can lead to eryth...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A61K31/37A61K8/49A61P17/18A61P17/16A61Q19/08A61Q19/00
CPCA61K31/37A61K8/498A61P17/18A61P17/16A61Q19/08A61Q19/00
Inventor 孙涛
Owner 北京温适宝科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products